JP6862916B2 - シリコン単結晶インゴットの製造方法およびシリコン単結晶育成装置 - Google Patents

シリコン単結晶インゴットの製造方法およびシリコン単結晶育成装置 Download PDF

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JP6862916B2
JP6862916B2 JP2017037613A JP2017037613A JP6862916B2 JP 6862916 B2 JP6862916 B2 JP 6862916B2 JP 2017037613 A JP2017037613 A JP 2017037613A JP 2017037613 A JP2017037613 A JP 2017037613A JP 6862916 B2 JP6862916 B2 JP 6862916B2
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gas
single crystal
silicon single
silicon
dopant
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JP2018140915A5 (https=
JP2018140915A (ja
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渉 杉村
渉 杉村
宝来　正隆
正隆 宝来
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Sumco Corp
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Sumco Corp
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Priority to JP2017037613A priority Critical patent/JP6862916B2/ja
Application filed by Sumco Corp filed Critical Sumco Corp
Priority to US16/487,957 priority patent/US20200040480A1/en
Priority to CN201880013134.3A priority patent/CN110678585B/zh
Priority to DE112018001046.5T priority patent/DE112018001046B4/de
Priority to KR1020197024913A priority patent/KR102253587B1/ko
Priority to PCT/JP2018/000518 priority patent/WO2018159109A1/ja
Publication of JP2018140915A publication Critical patent/JP2018140915A/ja
Publication of JP2018140915A5 publication Critical patent/JP2018140915A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/20—Controlling or regulating
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/02—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
    • C30B15/04—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt adding doping materials, e.g. for n-p-junction
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10—Crucibles or containers for supporting the melt
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP2017037613A 2017-02-28 2017-02-28 シリコン単結晶インゴットの製造方法およびシリコン単結晶育成装置 Active JP6862916B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2017037613A JP6862916B2 (ja) 2017-02-28 2017-02-28 シリコン単結晶インゴットの製造方法およびシリコン単結晶育成装置
CN201880013134.3A CN110678585B (zh) 2017-02-28 2018-01-11 单晶硅锭的制造方法及单晶硅培育装置
DE112018001046.5T DE112018001046B4 (de) 2017-02-28 2018-01-11 Verfahren zur Herstellung eines Siliziumeinkristall-Ingots und Siliziumeinkristall-Wachstumsvorrichtung
KR1020197024913A KR102253587B1 (ko) 2017-02-28 2018-01-11 실리콘 단결정 잉곳 제조 방법 및 실리콘 단결정 육성 장치
US16/487,957 US20200040480A1 (en) 2017-02-28 2018-01-11 Method of producing silicon single crystal ingot and silicon single crystal growth apparatus
PCT/JP2018/000518 WO2018159109A1 (ja) 2017-02-28 2018-01-11 シリコン単結晶インゴットの製造方法およびシリコン単結晶育成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017037613A JP6862916B2 (ja) 2017-02-28 2017-02-28 シリコン単結晶インゴットの製造方法およびシリコン単結晶育成装置

Publications (3)

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JP2018140915A JP2018140915A (ja) 2018-09-13
JP2018140915A5 JP2018140915A5 (https=) 2019-11-14
JP6862916B2 true JP6862916B2 (ja) 2021-04-21

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JP2017037613A Active JP6862916B2 (ja) 2017-02-28 2017-02-28 シリコン単結晶インゴットの製造方法およびシリコン単結晶育成装置

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US (1) US20200040480A1 (https=)
JP (1) JP6862916B2 (https=)
KR (1) KR102253587B1 (https=)
CN (1) CN110678585B (https=)
DE (1) DE112018001046B4 (https=)
WO (1) WO2018159109A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6922870B2 (ja) * 2018-09-27 2021-08-18 株式会社Sumco シリコン単結晶の製造方法
TWI784689B (zh) * 2020-09-29 2022-11-21 日商Ｓｕｍｃｏ股份有限公司 矽單結晶的製造方法
CN113564693B (zh) * 2021-08-02 2022-09-27 宁夏中欣晶圆半导体科技有限公司 低电阻率重掺砷硅单晶生产方法
JP7359241B2 (ja) * 2022-03-15 2023-10-11 株式会社Sumco シリコン単結晶の製造方法
CN117712204A (zh) * 2023-02-23 2024-03-15 隆基绿能科技股份有限公司 一种低氧硅片及其制备方法
CN119416539B (zh) * 2025-01-03 2025-05-27 高景太阳能股份有限公司 拉晶工艺的控制方法、装置和拉晶系统

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55121994A (en) 1979-03-07 1980-09-19 Hitachi Ltd Preparing semiconductor single crystal
JPS61227986A (ja) * 1985-03-30 1986-10-11 Shin Etsu Handotai Co Ltd 単結晶シリコン棒の製造方法
JPS62113789A (ja) * 1985-11-11 1987-05-25 Nec Corp 単結晶引上装置
JPH0777995B2 (ja) 1989-11-16 1995-08-23 信越半導体株式会社 単結晶の比抵抗コントロール方法
JPH04221782A (ja) * 1990-12-25 1992-08-12 Nissan Motor Co Ltd 超音波ドップラ方式対地速度計
JP2816625B2 (ja) * 1991-12-18 1998-10-27 コマツ電子金属株式会社 単結晶製造装置およびその制御方法
EP0625595B1 (en) * 1993-03-29 2001-09-19 Research Development Corporation Of Japan Control of oxygen concentration in single crystal pulled up from melt containing group-V element
US7132091B2 (en) * 2001-09-28 2006-11-07 Memc Electronic Materials, Inc. Single crystal silicon ingot having a high arsenic concentration
DE102005023992A1 (de) * 2005-05-20 2006-11-23 TRüTZSCHLER GMBH & CO. KG Vorrichtung an einer Spinnereivorbereitungsmaschine, z.B. Karde, Krempel, Strecke, Kämmmaschine o.dgl., zum Ermitteln der Masse und/oder Masseschwankungen eines Fasermaterials, z.B. mindestens ein Faserband, Faservlies o.dgl., aus Baumwolle, Chemiefasern o. dgl.
JP5453749B2 (ja) 2008-09-05 2014-03-26 株式会社Ｓｕｍｃｏ 垂直シリコンデバイス用シリコンウェーハの製造方法及び垂直シリコンデバイス用シリコン単結晶引き上げ装置
KR101254998B1 (ko) 2008-11-25 2013-04-16 에스케이텔레콤 주식회사 호처리 메시지의 우회전송 제공 시스템 및 방법
US8535439B2 (en) * 2009-01-14 2013-09-17 Sumco Techxiv Corporation Manufacturing method for silicon single crystal
CN201926623U (zh) * 2010-12-14 2011-08-10 深圳市赛宝伦计算机技术有限公司 一种红外气体分析仪
JP5595318B2 (ja) 2011-03-29 2014-09-24 グローバルウェーハズ・ジャパン株式会社 単結晶引上装置及び単結晶引き上げ方法
US20150333193A1 (en) * 2012-12-31 2015-11-19 Memc Electronic Matrials S.P.A. Indium-doped silicon wafer and solar cell using the same
US20180291524A1 (en) * 2015-05-01 2018-10-11 Corner Star Limited Methods for producing single crystal ingots doped with volatile dopants

Also Published As

Publication number Publication date
KR20190109490A (ko) 2019-09-25
KR102253587B1 (ko) 2021-05-18
JP2018140915A (ja) 2018-09-13
CN110678585A (zh) 2020-01-10
DE112018001046B4 (de) 2022-05-19
WO2018159109A1 (ja) 2018-09-07
CN110678585B (zh) 2021-08-24
DE112018001046T5 (de) 2019-11-14
US20200040480A1 (en) 2020-02-06

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