JP6836601B2 - 容器をプラズマ処理するための方法および装置 - Google Patents

容器をプラズマ処理するための方法および装置 Download PDF

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JP6836601B2
JP6836601B2 JP2018549488A JP2018549488A JP6836601B2 JP 6836601 B2 JP6836601 B2 JP 6836601B2 JP 2018549488 A JP2018549488 A JP 2018549488A JP 2018549488 A JP2018549488 A JP 2018549488A JP 6836601 B2 JP6836601 B2 JP 6836601B2
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plasma
process gas
container
malfunction
station
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JP2019510881A5 (enExample
JP2019510881A (ja
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アレクサンダー ディスタホフ
アレクサンダー ディスタホフ
ミヒャエル ヘルボルト
ミヒャエル ヘルボルト
セバスティアン キッツィア
セバスティアン キッツィア
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カーハーエス コーポプラスト ゲーエムベーハー
カーハーエス コーポプラスト ゲーエムベーハー
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3288—Maintenance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32899—Multiple chambers, e.g. cluster tools
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3321—CVD [Chemical Vapor Deposition]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32201—Generating means

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
JP2018549488A 2016-03-24 2017-03-16 容器をプラズマ処理するための方法および装置 Active JP6836601B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102016105548.4A DE102016105548A1 (de) 2016-03-24 2016-03-24 Verfahren und Vorrichtung zur Plasmabehandlung von Behältern
DE102016105548.4 2016-03-24
PCT/EP2017/056223 WO2017162509A1 (de) 2016-03-24 2017-03-16 Verfahren und vorrichtung zur plasmabehandlung von behältern

Publications (3)

Publication Number Publication Date
JP2019510881A JP2019510881A (ja) 2019-04-18
JP2019510881A5 JP2019510881A5 (enExample) 2020-03-12
JP6836601B2 true JP6836601B2 (ja) 2021-03-03

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JP2018549488A Active JP6836601B2 (ja) 2016-03-24 2017-03-16 容器をプラズマ処理するための方法および装置

Country Status (5)

Country Link
US (2) US10619237B2 (enExample)
EP (1) EP3433395B1 (enExample)
JP (1) JP6836601B2 (enExample)
DE (1) DE102016105548A1 (enExample)
WO (1) WO2017162509A1 (enExample)

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DE102018114776A1 (de) 2018-06-20 2019-12-24 Khs Corpoplast Gmbh Vorrichtung zum Beschichten von Behältern mit einer Barriereschicht und Verfahren zur Heizung eines Behälters
DE102018129694A1 (de) * 2018-11-26 2020-05-28 Khs Corpoplast Gmbh Vorrichtung und Verfahren zur Plasmabehandlung von Behältern
DE102019126291A1 (de) * 2019-09-30 2021-04-01 Krones Ag Vorrichtung zum Beschichten von Behältnissen mit Bypass und Verfahren zum Betreiben einer solchen Vorrichtung
DE102019130303A1 (de) 2019-11-11 2021-05-12 Khs Corpoplast Gmbh Vorrichtung und Verfahren zur Plasmabehandlung von Behältern
DE102020105000A1 (de) 2020-02-26 2021-08-26 Khs Corpoplast Gmbh Verfahren zur Beschichtung von Behältern sowie beschichteter Behälter
DE102020130917A1 (de) 2020-11-23 2022-05-25 Khs Corpoplast Gmbh Mehrweg-Kunststoffbehälter, Verfahren zum Waschen von solchen Behältern, Verfahren zum Beschichten von solchen Behältern und Behälterbehandlungsmaschine für die Getränkeindustrie
DE102023107505A1 (de) * 2023-03-24 2024-09-26 Khs Gmbh Behälterbeschichtungsanlage, insbesondere zum Beschichten von Getränkebehältern
DE102023112963A1 (de) 2023-05-17 2024-11-21 Khs Gmbh Ventileinsatz für eine Behälterbeschichtungsanlage, Ventilanordnung und Behälterbeschichtungsanlage
DE102023112998A1 (de) 2023-05-17 2024-11-21 Khs Gmbh Ventileinsatz für eine Behälterbeschichtungsanlage, Ventilanordnung und Behälterbeschichtungsanlage
DE102023112961A1 (de) 2023-05-17 2024-11-21 Khs Gmbh Ventileinsatz für eine Behälterbeschichtungsanlage, Ventilanordnung und Behälterbeschichtungsanlage
DE102023113416A1 (de) 2023-05-23 2024-11-28 Khs Gmbh Beschichtungsanlage sowie Verfahren zum Beschichten von Behältern
DE102023132995A1 (de) 2023-11-27 2025-05-28 Khs Gmbh Verfahren zum Beschichten von Mehrwegbehältern, nach diesem Verfahren hergestellte Behälter und Behälterbeschichtungsmaschine zum Beschichten von Mehrweg-Kunststoffbehältern
DE102024102398B3 (de) 2024-01-29 2025-01-23 Khs Gmbh Verfahren zur Produktion und Qualitätsprüfung von mittels Plasma beschichteten Kunststoffflaschen
DE102024109778A1 (de) 2024-04-09 2025-10-09 Khs Gmbh Plasmabehandlungsanlage für Behälter und Verfahren zur Plasmabehandlung von Behältern

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FR2791598B1 (fr) 1999-03-30 2001-06-22 Sidel Sa Machine a carrousel pour le traitement de corps creux comportant un circuit de distribution de pression perfectionne et distributeur pour une telle machine
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JP2002129337A (ja) * 2000-10-24 2002-05-09 Applied Materials Inc 気相堆積方法及び装置
DE10225609A1 (de) * 2002-06-07 2003-12-24 Sig Technology Ltd Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken
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Also Published As

Publication number Publication date
US20200263292A1 (en) 2020-08-20
EP3433395B1 (de) 2020-04-29
US10619237B2 (en) 2020-04-14
US20190032200A1 (en) 2019-01-31
JP2019510881A (ja) 2019-04-18
DE102016105548A1 (de) 2017-09-28
WO2017162509A1 (de) 2017-09-28
EP3433395A1 (de) 2019-01-30
DE102016105548A8 (de) 2017-11-23

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