JP6792448B2 - ポリマーゲルの膨張によるポーラス材料の製造 - Google Patents
ポリマーゲルの膨張によるポーラス材料の製造 Download PDFInfo
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- JP6792448B2 JP6792448B2 JP2016530983A JP2016530983A JP6792448B2 JP 6792448 B2 JP6792448 B2 JP 6792448B2 JP 2016530983 A JP2016530983 A JP 2016530983A JP 2016530983 A JP2016530983 A JP 2016530983A JP 6792448 B2 JP6792448 B2 JP 6792448B2
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Description
(1)マイクロポーラスおよびナノポーラスポリマー材料を製造するための方法であって、
(a)所定の温度でポリマー出発物質を可塑剤で膨潤させ、それによってポリマー出発物質が粘弾性に成形可能(visco-elastic formable)な(特に、変形可能な(deformable))状態に変化し、
(b)その後に膨潤したポリマーを高圧下で起泡剤と接触させ、
(c)圧力を下げることによって、マイクロポーラスおよびナノポーラス材料が固化する、方法ならびに
(2)本発明の態様(1)による方法により得られるマイクロポーラスまたはナノポーラスポリマー材料
に関する。
− 架橋剤、調整剤およびコポリマーおよびこれらの濃度
− ラジカル開始剤の種類および使用量
− 重合反応の温度および持続時間
− 重合中の均質化
− ポリマーの後処理(精製、押出し成形、アニーリング等)
− 可塑剤および固体ポリマーと可塑剤との間の比
− ポリマーゲル中の可塑剤の曝露の持続時間
− 飽和したポリマーゲルまたは規定された可塑剤濃度
− 起泡剤の種類
− 圧力、温度、時間
− 膨張速度
λ=mゲル化剤/(mゲル化剤+mポリマー)。
υ=n架橋剤/(n架橋剤+nモノマー)・100
により与えられる。
ポリメチルメタクリレート(PMMA)ナノフォーム
[実施例1.1]
NF−GAFFEL法によるPMMAナノフォームの製造。
従来のアクリルガラスの試料にアセトンを加えることによって、PMMAゲルを調製し、続いてCO2で発泡させた。最初の圧力p=250バールから1バールの常圧までの膨張時間texpは、約1秒であった。ポリマーゲル中のPMMAとアセトンの質量比は、1:3であった(λアセトン=0.75)。ゲルをp=250バール、T=55℃およびt=15minで高圧セル内でCO2と接触させて、その後に膨張させた。図1は、2つの異なる倍率におけるフォーム構造を示す。
NF−GAFFEL法によるPMMAナノフォームの製造。
モノマーのメチルメタクリレート(MMA)からなるPMMAおよび架橋剤のN,N’−メチレンビスアクリルアミド(MBAA)を、ラジカル開始剤アゾビスイソブチロニトリル(AIBN)を使用して、T=95℃で2hの期間重合させた。実施例1.2は、得られるフォーム構造に対する2つの異なる架橋剤濃度の異なる影響を例示する。アセトンで飽和したポリマーを調製し、CO2と接触させ、実施例1のようにp=250バール、T=55℃およびt=15minで発泡させた。この実施例は、正確に既知の組成を有するPMMA試料を使用したNF−GAFFEL法の成功裏の適用を実証している。
NF−GAFFEL法によるPMMAナノフォームの製造。
実施例1.2のように、モノマーのメチルメタクリレート(MMA)からなるPMMAおよび架橋剤N,N’−メチレンビスアクリルアミド(MBAA)を、ラジカル開始剤アゾビスイソブチロニトリル(AIBN)を使用して、T=95℃で2hの期間重合させた。実施例1.3は、フォーム構造に対する発泡温度の影響を例示する。この目的のために、PMMAゲルを実施例2のように製造し、CO2と接触させ、p=250バール、t=15minで発泡させた。CO2接触温度およびしたがって膨張温度も変更させた。図3の左側部は、T=35℃で生じたフォーム構造を示し、中央部では温度はT=55℃であり、右側部では、温度はT=75℃であった。
NF−GAFFEL法によるPMMAナノフォームの製造。
実施例2および3のように、モノマーのメチルメタクリレート(MMA)からなるPMMAおよび架橋剤N,N’−メチレンビスアクリルアミド(MBAA)を、ラジカル開始剤アゾビスイソブチロニトリル(AIBN)を使用して、T=95℃で2hの期間重合させた。実施例4は、フォーム構造に対するCO2雰囲気中のゲルの滞留時間の影響を例示する。この目的のために、PMMAゲルを実施例2のように製造し、p=250バールで発泡させた。すべての実験で、架橋剤濃度はν=0.7mol%であり、発泡温度はT=55℃であった。
NF−GAFFEL法によるPMMAナノフォームの製造。
モノマーのメチルメタクリレート(MMA)からなるPMMA、架橋剤N,N’−メチレンビスアクリルアミド(MBAA)および調整剤2−エチルヘキシルチオグリコレート(EHTG)を、ラジカル開始剤アゾビスイソブチロニトリル(AIBN)を使用して、T=95℃で2hの期間重合させた。実施例5は、異なる架橋剤濃度の2種のポリマーのフォーム構造に対する調整剤の影響を例示する。この目的のために、ポリマーをアセトンで飽和させ、CO2と接触させ、上記実施例のようにp=250バール、T=55℃およびt=15minで発泡させた。ρ=0.50mol%の調整剤濃度は、両方のフォームで同じであった。
ポリスチレン(PS)ナノフォーム
[実施例2.1]
NF−GAFFEL法による異なる細孔径をもつPSナノフォームの製造。
モノマーのスチレンからなるPSおよび架橋剤ジビニルベンゼン(DVB)を、ラジカル開始剤アゾビスイソブチロニトリル(AIBN)を使用して、T=90℃で2hの期間重合させた。
NF−GAFFEL法によるPSナノフォームの製造。
PSゲルを実施例2.1のように製造し、p=250バール、T=55℃およびt=15minでCO2と接触させ、その後に膨張させた。架橋剤濃度(DVB)は、ν=1mol%であった。3つの発泡実験を異なる温度で行った。図7の左側部におけるフォームは、T=35℃の温度で得られ、中央部におけるフォームは、T=65℃で、右側部におけるフォームはT=75℃で得られた。
NF−GAFFEL法によるPSナノフォームの製造。
PSゲルを実施例2.1のように製造し、続いて異なるCO2圧と接触させ、t=15min後にT=65℃で発泡させた。架橋剤濃度(DVB)は、ν=1mol%であった。図8において、左のフォームはp=250バールのCO2圧から得られ、一方、右のフォームはp=150バールのCO2圧で得られた。
NF−GAFFEL法によるPSナノフォームの製造。
PSゲルを実施例2.1のように製造し、p=250バール、T=60℃およびt=15minでCO2と接触させ、その後に膨張させた。架橋剤濃度(DVB)は、ν=2mol%であった。すべての前の発泡実験との決定的な違いは、250から1バールまでの膨張プロセスの持続時間であった。図9は、texp≒20sの発泡時間で得られたフォームを示す。
ポリ塩化ビニル(PVC)ナノフォーム;NF−GAFFEL法によるPVCナノフォームの製造。
飽和PVCゲルを、従来のPVCポリマーの試料にアセトンを加えることによって調製し、続いてCO2で発泡させた。ゲルをp=250バール、T=70℃およびt=10minで高圧セル内でCO2と接触させ、その後に膨張させた。図10は2つの異なる倍率におけるフォーム構造を示す。
ポリエチレン(PE)ナノフォーム;NF−GAFFEL法によるPEナノフォームの製造。
飽和PEゲルを、従来のPEポリマーの試料に60℃でシクロヘキサンを加えることによって調製し、その後にCO2で発泡させた。ゲルをp=250バール、T=70℃およびt=15minで高圧セル内でCO2と接触させ、その後に膨張させた。図11は、2つの異なる倍率におけるフォーム構造を示す。
10gのナノポーラスポリスチレン粒子の調製。
10グラムの架橋ポリスチレン粒子(平均直径≒1mm、架橋剤として1mol%のDVB)を、密閉容器内で、室温および常圧下で180分間、20gのアセトンと接触させる。ポリマーとポリマーゲルとの屈折率が異なるので、膨潤を視覚的に追跡して、ポリスチレン粒子が完全にポリマーゲルに変換されたときを決定し得る。ポリスチレンゲル粒子は、寸法的に安定であり、球形を有したが、出発ポリマーとは対照的に、わずかな機械的衝撃によっても変形可能であった。次いで、膨潤したポリスチレン粒子を200バールおよび70℃で90分間、CO2雰囲気に曝した。圧力を除去することにより、2mmの平均直径および0.30g/cm3未満の密度および500nm未満の平均ナノ細孔径を有するナノポーラスポリスチレン粒子が得られた(図12参照)。
ナノポーラス材料の構造の決定。
製造したナノポーラス材料の構造を画像化するために、まず新たな破断端を作成した。続いて、破断端を上向きにして、試料を試料板に固定した。測定中に生じた電荷を放散させるために、導電性銀ラッカーを固定に使用した。画像化の前に、局所的帯電効果を避けるために、試料を金でコーティングした。この目的のために、EMITECH製のK350スパッタアタッチメント付きのK950Xコーティングシステムを使用した。すべての場合に、30秒間常に30mAの電流を印加しながら、およそ10−2mbarのアルゴン圧力下で金スパッタリングを行った。このようにコーティングした金層の層厚さは、およそ5から15nmの間であった。電子顕微鏡写真をZEISS製のSUPRA 40 VP型の装置で撮影した。30kVまでの加速電圧および1.3nmの最大分解能がこの装置で可能である。顕微鏡写真を、5kVの加速電圧で、InLens検出器で記録した。ナノポーラスおよびマイクロポーラスフォームの平均細孔径および平均ウェブ厚さを決定するために、記載の走査型電子顕微鏡で撮影した顕微鏡写真を選択し、少なくとも300個の細孔またはウェブをDatinf Measureコンピュータプログラムで測定し、十分に良好な統計を確保した。各走査型電子顕微鏡写真はごく限られた数の細孔およびウェブを含むので、平均細孔およびウェブ直径を決定するために、いくつかの走査型電子顕微鏡写真を使用した。ここで、長さ決定における誤差が可能な限り小さく保たれるように、倍率が選択されることが確実にされるべきである。例を添付書類の図13に示す。
Claims (17)
- マイクロポーラスおよびナノポーラスのポリマー材料を、ポリマーゲルの膨張により製造する方法であって、
(a)所定の温度でポリマー出発物質を可塑剤で膨潤させ、それによって前記ポリマー出発物質を粘弾性に変形可能な状態に変化させ、
(b)その後に前記膨潤したポリマー出発材料を、高圧下で起泡剤と接触させ、
(c)前記圧力を下げることによって、前記起泡剤と接触させた前記膨潤したポリマー出発材料を膨張させ、マイクロポーラスおよびナノポーラス材料として固化させ、
(i)前記ポリマー出発物質が、1種または複数の熱可塑性ポリマーである方法。 - (i)前記1種または複数の熱可塑性ポリマーが、ポリメチルメタクリレート(PMMA)、ポリスチレン(PS)、ポリ塩化ビニル(PVC)、ポリラクチド(PL)、ポリエチレン(PE)、ポリプロピレン(PP)、ポリカーボネート(PC)およびセロファンの群のポリマーから選択され、及び/又は
(ii)前記可塑剤が、アセトンおよび他の極性非プロトン性溶媒ならびに短鎖アルカンの群から選択され、及び/又は
(iii)ポリマー出発物質と可塑剤との質量比は、10:0.5から1:3であり、及び/又は
(iv)膨潤時間は、0.1sから100hである
請求項1に記載の方法。 - ステップ(a)および(b)における前記所定の温度は、互いに独立して、0から100℃の範囲内である請求項1または2に記載の方法。
- ステップ(a)における前記膨潤によって、マイクロメートルおよびナノメートル範囲の平均粒子径を有するポリマーラテックスの密な充填をもたらす請求項1から3のいずれか1項に記載の方法。
- ステップ(a)が押出成形機内で行われる請求項1から4のいずれか1項に記載の方法。
- ステップ(b)において
(i)前記起泡剤が、CO2および高圧下で前記可塑剤と完全に混和性である他の起泡剤から選択され、及び/又は
(ii)10から300バールの範囲内で接触が行われる
請求項1から5のいずれか1項に記載の方法。 - ステップ(c)における前記圧力降下が、0.1sから60sの範囲内で起こり、この時間内に前記ポリマー材料が冷却し固化する請求項1および6のいずれか1項に記載の方法。
- 前記得られたマイクロポーラスおよびナノポーラスのポリマー材料が、前記ポリマー出発物質の密度の0.5%から50%の密度および/または0.01から10μmの平均細孔径を有する請求項1から7のいずれか1項に記載の方法。
- 請求項1から8のいずれか1項に記載の方法により得られるマイクロポーラスまたはナノポーラスポリマー材料であって、前記ポリマー材料中の架橋剤の含有量が、前記ポリマー材料を生じるモノマーに対して、0.01から10mol%であり、30〜200kg/m3の範囲内の密度を有するマイクロポーラスまたはナノポーラスポリマー材料。
- 0.01から10μmの範囲内の平均細孔径を有する請求項9に記載のマイクロポーラスまたはナノポーラスポリマー材料。
- 前記ポリマー材料および/または前記出発物質が部分的に架橋しており、前記マイクロポーラスまたはナノポーラスポリマー材料が0.05から0.5μmの範囲内の平均細孔径を有する請求項9または10に記載のマイクロポーラスまたはナノポーラスポリマー材料。
- 細孔間のウェブの厚さの算術平均が、5から50nmの範囲内であることを特徴とする請求項9から11のいずれか1項に記載のマイクロポーラスまたはナノポーラスポリマー材料。
- 前記マイクロポーラスまたはナノポーラスポリマー材料が、そのモノマーに不溶であることを特徴とする請求項9から12のいずれか1項に記載のマイクロポーラスまたはナノポーラスポリマー材料。
- 部分的にクローズドセル型であることを特徴とする請求項9から13のいずれか1項に記載のマイクロポーラスまたはナノポーラスポリマー材料。
- 請求項9から14のいずれか1項に記載のマイクロポーラスまたはナノポーラス材料で作製された成形体。
- 密封されていることを特徴とする請求項15に記載の成形体。
- 1から30mW/(m・K)の範囲内の熱伝導率を有することを特徴とする請求項15または16に記載の成形体。
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DE102013223391.4A DE102013223391A1 (de) | 2013-11-15 | 2013-11-15 | Herstellung von porösen Materialien durch Expansion von Polymergelen |
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US10246568B2 (en) | 2019-04-02 |
ES2816705T3 (es) | 2021-04-05 |
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KR20160086833A (ko) | 2016-07-20 |
US20190292344A1 (en) | 2019-09-26 |
DE102013223391A1 (de) | 2015-05-21 |
US20160280876A1 (en) | 2016-09-29 |
CN105705560A (zh) | 2016-06-22 |
BR112016010662B1 (pt) | 2021-07-20 |
PL3068825T3 (pl) | 2020-12-28 |
JP2016540850A (ja) | 2016-12-28 |
BR112016010662B8 (pt) | 2021-09-21 |
CN105705560B (zh) | 2020-04-03 |
JP6792448B6 (ja) | 2020-12-23 |
EP3068825A2 (de) | 2016-09-21 |
WO2015071463A3 (de) | 2015-07-09 |
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