JP6743728B2 - 半導体パワーモジュール及び電力変換装置 - Google Patents
半導体パワーモジュール及び電力変換装置 Download PDFInfo
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- JP6743728B2 JP6743728B2 JP2017039396A JP2017039396A JP6743728B2 JP 6743728 B2 JP6743728 B2 JP 6743728B2 JP 2017039396 A JP2017039396 A JP 2017039396A JP 2017039396 A JP2017039396 A JP 2017039396A JP 6743728 B2 JP6743728 B2 JP 6743728B2
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- 239000004065 semiconductor Substances 0.000 title claims description 61
- 239000000758 substrate Substances 0.000 claims description 79
- 238000006243 chemical reaction Methods 0.000 claims description 38
- 239000011347 resin Substances 0.000 claims description 25
- 229920005989 resin Polymers 0.000 claims description 25
- 229910000679 solder Inorganic materials 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 239000004962 Polyamide-imide Substances 0.000 claims description 3
- 239000004642 Polyimide Substances 0.000 claims description 3
- 238000005219 brazing Methods 0.000 claims description 3
- 229920002312 polyamide-imide Polymers 0.000 claims description 3
- 229920001721 polyimide Polymers 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 description 12
- 230000015556 catabolic process Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 230000002159 abnormal effect Effects 0.000 description 3
- 238000004382 potting Methods 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 230000008602 contraction Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910002601 GaN Inorganic materials 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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Description
部に埋め込まれ、前記凹部の底面にはんだ又はろう材で接合された基板電極と、前記基板電極の上に接合された半導体素子と、前記基板電極の上端部を覆い、前記基板電極の上面の前記上端部よりも内側の領域及び前記半導体素子を覆わない絶縁樹脂とを備えることを特徴とする。
図1は、本発明の実施の形態1に係る半導体パワーモジュールを示す断面図である。セラミックなどの絶縁基板1の上面に凹部2が形成されている。基板電極3がはんだ4を介して凹部2に埋め込まれている。図2は、本発明の実施の形態1に係る絶縁基板と基板電極を拡大した断面図である。基板電極3の厚みhは200μm〜800μmであり、凹部2の深さd以下である。
図10は、本発明の実施の形態2に係る半導体パワーモジュールを示す断面図である。図11は、本発明の実施の形態2に係る絶縁基板と基板電極を拡大した断面図である。実施の形態1とは異なり、基板電極3の幅w2が凹部2の幅w1よりも小さい。絶縁樹脂7は基板電極3の上端部及び側面も覆う。絶縁樹脂7の厚みは(w1−w2)/2よりも小さい。その他の構成は実施の形態1と同様である。
本実施の形態は、上述した実施の形態1又は2に係る半導体パワーモジュールを電力変換装置に適用したものである。本発明は特定の電力変換装置に限定されるものではないが、以下、実施の形態3として、三相のインバータに本発明を適用した場合について説明する。
Claims (6)
- 上面に凹部が形成された絶縁基板と、
前記凹部に埋め込まれ、前記凹部の底面にはんだ又はろう材で接合された基板電極と、
前記基板電極の上に接合された半導体素子と、
前記基板電極の上端部を覆い、前記基板電極の上面の前記上端部よりも内側の領域及び
前記半導体素子を覆わない絶縁樹脂とを備えることを特徴とする半導体パワーモジュール
。 - 前記絶縁樹脂はポリイミド系又はポリアミドイミド系の材料からなることを特徴とする
請求項1に記載の半導体パワーモジュール。 - 前記基板電極及び前記半導体素子を覆うシリコンゲルを更に備えることを特徴とする請
求項1又は2に記載の半導体パワーモジュール。 - 前記基板電極の上面の高さは前記絶縁基板の前記上面の高さ以下であることを特徴とす
る請求項1〜3の何れか1項に記載の半導体パワーモジュール。 - 上面に凹部が形成された絶縁基板と、
前記凹部に埋め込まれた基板電極と、
前記基板電極の上に接合された半導体素子と、
前記基板電極の上端部を覆い、前記基板電極の上面の前記上端部よりも内側の領域及び
前記半導体素子を覆わない絶縁樹脂とを備え、
前記基板電極の幅は前記凹部の幅よりも小さく、
前記絶縁樹脂は前記基板電極の側面も覆うことを特徴とする半導体パワーモジュール。 - 請求項1〜5の何れか1項に記載の半導体パワーモジュールを有し、入力される電力を
変換して出力する主変換回路と、
前記主変換回路を制御する制御信号を前記主変換回路に出力する制御回路とを備えるこ
とを特徴とする電力変換装置。
Priority Applications (4)
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DE102017221961.0A DE102017221961B4 (de) | 2017-03-02 | 2017-12-05 | Halbleiterleistungsmodul und leistungsumrichtervorrichtung |
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JP7034105B2 (ja) * | 2019-01-18 | 2022-03-11 | 三菱電機株式会社 | 電力用半導体装置の製造方法、電力用半導体装置および電力変換装置 |
US10796998B1 (en) * | 2019-04-10 | 2020-10-06 | Gan Systems Inc. | Embedded packaging for high voltage, high temperature operation of power semiconductor devices |
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JP2001057409A (ja) * | 1999-08-17 | 2001-02-27 | Hitachi Ltd | 半導体装置 |
JP4319591B2 (ja) | 2004-07-15 | 2009-08-26 | 株式会社日立製作所 | 半導体パワーモジュール |
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US10468314B2 (en) | 2019-11-05 |
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