JP6727554B2 - 露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び露光方法 - Google Patents

露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び露光方法 Download PDF

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JP6727554B2
JP6727554B2 JP2017510221A JP2017510221A JP6727554B2 JP 6727554 B2 JP6727554 B2 JP 6727554B2 JP 2017510221 A JP2017510221 A JP 2017510221A JP 2017510221 A JP2017510221 A JP 2017510221A JP 6727554 B2 JP6727554 B2 JP 6727554B2
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Japan
Prior art keywords
mark
exposure
projection optical
optical system
scanning direction
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Japanese (ja)
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JPWO2016159295A1 (ja
Inventor
一夫 内藤
一夫 内藤
青木　保夫
保夫 青木
雅幸 長島
雅幸 長島
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2017510221A 2015-03-31 2016-03-31 露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び露光方法 Active JP6727554B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015071007 2015-03-31
JP2015071007 2015-03-31
PCT/JP2016/060787 WO2016159295A1 (ja) 2015-03-31 2016-03-31 露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び露光方法

Publications (2)

Publication Number Publication Date
JPWO2016159295A1 JPWO2016159295A1 (ja) 2018-02-01
JP6727554B2 true JP6727554B2 (ja) 2020-07-22

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JP2017510221A Active JP6727554B2 (ja) 2015-03-31 2016-03-31 露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び露光方法

Country Status (5)

Country Link
JP (1) JP6727554B2 (zh)
KR (1) KR102558072B1 (zh)
CN (1) CN107430357B (zh)
TW (2) TW201704892A (zh)
WO (1) WO2016159295A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102595405B1 (ko) * 2017-03-31 2023-10-27 가부시키가이샤 니콘 이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 디바이스 제조 방법, 및 이동체의 구동 방법
WO2020100446A1 (ja) * 2018-11-15 2020-05-22 インスペック株式会社 キャリブレーションシステム及び描画装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09244255A (ja) * 1996-03-13 1997-09-19 Nikon Corp 液晶用露光装置
JP2000012422A (ja) 1998-06-18 2000-01-14 Nikon Corp 露光装置
JP4635364B2 (ja) * 2001-04-03 2011-02-23 株式会社ニコン 露光装置及び露光方法
JP4137521B2 (ja) * 2002-05-27 2008-08-20 株式会社ニコンシステム 装置管理方法及び露光方法、リソグラフィシステム及びプログラム
TWI607292B (zh) * 2003-06-13 2017-12-01 Nikon Corp Exposure device, exposure method, and device manufacturing method
KR101148811B1 (ko) * 2003-06-19 2012-05-24 가부시키가이샤 니콘 노광 장치 및 디바이스 제조방법
KR101211570B1 (ko) * 2005-02-10 2012-12-12 에이에스엠엘 네델란즈 비.브이. 침지 액체, 노광 장치, 및 노광 프로세스
CN102749813B (zh) * 2006-09-01 2014-12-03 株式会社尼康 曝光方法及装置、以及组件制造方法
JP5190860B2 (ja) * 2007-01-22 2013-04-24 学校法人東京電機大学 投影露光装置および投影露光方法
US8508735B2 (en) * 2008-09-22 2013-08-13 Nikon Corporation Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method
US8514395B2 (en) * 2009-08-25 2013-08-20 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
JP2012058388A (ja) * 2010-09-07 2012-03-22 V Technology Co Ltd 露光装置
JP6286813B2 (ja) * 2012-03-26 2018-03-07 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
JP2013242488A (ja) * 2012-05-22 2013-12-05 Nikon Corp 露光装置、露光方法及びデバイス製造方法

Also Published As

Publication number Publication date
CN107430357B (zh) 2021-02-05
WO2016159295A1 (ja) 2016-10-06
KR20170128599A (ko) 2017-11-22
TW202041977A (zh) 2020-11-16
TWI741654B (zh) 2021-10-01
CN107430357A (zh) 2017-12-01
TW201704892A (zh) 2017-02-01
JPWO2016159295A1 (ja) 2018-02-01
KR102558072B1 (ko) 2023-07-20

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