JP6709820B2 - エピラム処理剤およびそのようなエピラム処理剤を用いたエピラム処理方法 - Google Patents
エピラム処理剤およびそのようなエピラム処理剤を用いたエピラム処理方法 Download PDFInfo
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- JP6709820B2 JP6709820B2 JP2018081181A JP2018081181A JP6709820B2 JP 6709820 B2 JP6709820 B2 JP 6709820B2 JP 2018081181 A JP2018081181 A JP 2018081181A JP 2018081181 A JP2018081181 A JP 2018081181A JP 6709820 B2 JP6709820 B2 JP 6709820B2
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
- C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
- C08F230/085—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon the monomer being a polymerisable silane, e.g. (meth)acryloyloxy trialkoxy silanes or vinyl trialkoxysilanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D143/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Coating compositions based on derivatives of such polymers
- C09D143/04—Homopolymers or copolymers of monomers containing silicon
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
- B05D1/185—Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/14—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to metal, e.g. car bodies
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
- C08F220/24—Esters containing halogen containing perhaloalkyl radicals
-
- C—CHEMISTRY; METALLURGY
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Description
Mは
[式中、
R1、R2、R3は、同一であってもよくまたは異なっていてもよく、H、C1−C10アルキル基、C1−C10アルケニル基、好ましくは、H、CH3であり;
W、Xは、同一であってもよくまたは異なっていてもよく、ヘテロ原子からまたは少なくとも1つの炭素原子を含んでなりかつ少なくとも1つのヘテロ原子を含んでよい直鎖状または分岐状の炭化水素鎖から形成されたスペーサーアームであり;
Yは、同一であってもよくまたは異なっていてもよく、少なくとも1つの切断可能な基を含んでなる部分であり;
Aは、同一であってもよくまたは異なっていてもよく、該コポリマーを水性媒体に可溶性にするように配置された親水性部分であり;
Lは、同一であってもよくまたは異なっていてもよく、ハロゲン化された、好ましくは、フッ素化された、C1−C20炭素部分であり;
Qは、同一であってもよくまたは異なっていてもよく、H、CH3、少なくとも1つの炭素原子を含んでなりかつ少なくとも1つのヘテロ原子を含んでよい、好ましくは、Aとは異なる、直鎖状または分岐状の、飽和または不飽和の炭化水素鎖である]
コポリマーも含んでなる。
a)少なくとも50容量%の水を含む溶液中に、上記で定義した少なくとも1つのエピラム処理剤を可溶化するかまたは上記で定義した少なくとも1つのコポリマーを含めることにより、エピラム処理浴を調製する工程、
b)任意選択により、基体表面を調製する工程、
c)その基体表面を前記エピラム処理浴中で前記エピラム処理剤と接触させる工程、
d)任意選択により、乾燥させる工程、
e)開裂により前記エピラム処理剤から前記親水性部分を分離する工程、
f)前記基体表面を洗い流す工程、
g)乾燥させる工程
を含む方法に関する。
−ニトロベンジルエステルから誘導されるUV切断可能な部分、
−熱切断可能なディールス・アルダー付加物、
−機械的刺激(例えば、超音波)により切断可能な基、
−酵素切断可能な基、例えば、エステラーゼ酵素、
−および化学的トリガーにより切断可能なジチオ官能基を含んでなる部分、
となるようなもの
を含む群から選択される。
Mは
[式中、
R1、R2、R3は、同一であってもよくまたは異なっていてもよく、H、C1−C10アルキル基、C1−C10アルケニル基、好ましくは、H、CH3であり;
W、Xは、同一であってもよくまたは異なっていてもよく、ヘテロ原子からまたは少なくとも1つの炭素原子を含んでなりかつ少なくとも1つのヘテロ原子を含んでよい直鎖状または分岐状の炭化水素鎖から形成されたスペーサーアームであり;
Yは、同一であってもよくまたは異なっていてもよく、少なくとも1つの切断可能な基を含んでなる部分であり;
Aは、同一であってもよくまたは異なっていてもよく、該コポリマーを水性媒体に可溶性にするように配置された親水性部分であり;
Lは、同一であってもよくまたは異なっていてもよく、ハロゲン化された、好ましくは、フッ素化された、C1−C20炭素部分であり;
Qは、同一であってもよくまたは異なっていてもよく、H、CH3、少なくとも1つの炭素原子を含んでなりかつ少なくとも1つのヘテロ原子を含んでよい、好ましくは、Aとは異なる、直鎖状または分岐状の、飽和または不飽和の炭化水素鎖である]
コポリマーも含んでなる。
ここで、Gは
R4は、同一であってもよくまたは異なっていてもよく、C1−C10アルキル、C1−C10アルケニル基、好ましくは、H、CH3であり;
Zは、同一であってもよくまたは異なっていてもよく、ヘテロ原子からまたは少なくとも1つの炭素原子を含んでなりかつ少なくとも1つのヘテロ原子を含んでよい直鎖状または分岐状の炭化水素鎖から形成されたスペーサーアームであり;
Aは、上記で定義した通りである]
である。
a)少なくとも50容量%の水、好ましくは少なくとも75容量%の水、より選好的には、100容量%の水を含む溶液中に、上記で定義した少なくとも1つのエピラム処理剤を可溶化するかまたは上記で定義した少なくとも1つのコポリマーを含めることにより、エピラム処理浴を調製する工程、
b)任意選択により、特に、標準的な時計製造業者の方法に従って洗浄することにより基体表面を調製する工程、
c)その基体表面を前記エピラム処理浴中で前記エピラム処理剤と接触させる工程、
d)任意選択により、乾燥させる工程
e)例えば、以下に記載するような少なくとも1つの個別、連続または同時の切断処理によって、前記切断可能な基を切断することにより前記エピラム処理剤から前記親水性部分を分離する工程、
f)前記基体表面を洗い流す工程
g)乾燥させる工程
を含む、方法に関する。
−M単位からなる少なくとも1つのブロックを形成することが可能なモノマーと、
−N単位からなる少なくとも1つのブロックを形成することが可能なモノマー、および任意選択により、少なくとも1つのP単位を形成することが可能なモノマーと
の制御された逐次共重合である。
Claims (37)
- 少なくとも1つの化合物を含有する、エピラム処理剤であって、
該化合物にエピラム特性を付与するように配置された、同一であってもよくまたは異なっていてもよく、ハロゲン化されたC 1 −C 20 炭素部分を含む、少なくとも疎水性および疎油性の部分と、該化合物を水性媒体に可溶性にするように配置された、グリコールエーテルから誘導される少なくとも1つの親水性部分とを含んでなり、該親水性部分は、UV処理、熱処理、機械的刺激処理、および、化学的トリガー処理を含む群から選択される処理により切断され得る少なくとも1つの切断可能な基によって該化合物と結合しており、該切断可能な基は、ニトロベンジルエステルおよびその誘導体から誘導される部分、ディールス・アルダー付加物、およびジチオ官能基を含んでなる部分を含む群から選択される、エピラム処理剤。 - 前記疎水性および疎油性の部分は、同一であってもよくまたは異なっていてもよく、フッ素化されたC1−C20炭素部分を含むことを特徴とする、請求項1に記載のエピラム処理剤。
- グリコールエーテルから誘導される前記部分は、ポリエーテルから誘導される部分の形態をとることを特徴とする、請求項1または2に記載のエピラム処理剤。
- ポリエーテルから誘導される前記部分は、ポリエチレングリコール(PEG)から誘導される部分であることを特徴とする、請求項3に記載のエピラム処理剤。
- ポリエーテルから誘導される前記部分は、ポリプロピレングリコール(PPG)から誘導される部分であることを特徴とする、請求項3に記載のエピラム処理剤。
- 前記関連親水性部分を有する前記切断可能な基は、前記化合物と直鎖状または分岐状の構造を形成することを特徴とする、請求項1から請求項5のいずれかに記載のエピラム処理剤。
- 前記疎水性および疎油性の部分は、前記化合物と直鎖状または分岐状の構造を形成することを特徴とする、請求項1から請求項6のいずれかに記載のエピラム処理剤。
- それらの主鎖による共有結合によって連結された、M単位と、N単位と、任意選択により、少なくとも1つのP単位とを含んでなるコポリマーであって、ここで、
Mは
[式中、
R1、R2、R3は、同一であってもよくまたは異なっていてもよく、H、C1−C10アルキル基、C1−C10アルケニル基であり;
W、Xは、同一であってもよくまたは異なっていてもよく、ヘテロ原子からまたは少なくとも1つの炭素原子を含んでなりかつ少なくとも1つのヘテロ原子を含んでよい直鎖状または分岐状の炭化水素鎖から形成されたスペーサーアームであり;
Yは、同一であってもよくまたは異なっていてもよく、UV処理、熱処理、機械的刺激処理、および、化学的トリガー処理を含む群から選択される処理により切断され得る少なくとも1つの切断可能な基を含んでなる部分であり、該切断可能な基は、ニトロベンジルエステルおよびその誘導体から誘導される部分、ディールス・アルダー付加物、およびジチオ官能基を含んでなる部分を含む群から選択され;
Aは、同一であってもよくまたは異なっていてもよく、該コポリマーを水性媒体に可溶性にするように配置された、グリコールエーテルから誘導される親水性部分であり;
Lは、同一であってもよくまたは異なっていてもよく、ハロゲン化されたC1−C20炭素部分であり;
Qは、同一であってもよくまたは異なっていてもよく、H、CH3、少なくとも1つの炭素原子を含んでなりかつ少なくとも1つのヘテロ原子を含んでよい直鎖状または分岐状の、飽和または不飽和の炭化水素鎖である]
、コポリマー。 - R1、R2、R3は、同一であってもよくまたは異なっていてもよく、HまたはCH3であることを特徴とする、請求項8に記載のコポリマー。
- Lは、同一であってもよくまたは異なっていてもよく、フッ素化されたC1−C20炭素部分であることを特徴とする、請求項8に記載のコポリマー。
- それらの主鎖による共有結合によって連結された、少なくとも1つのP単位を任意選択により含んでなる、N単位からなる少なくとも1つのブロックと、該コポリマーを水性媒体に可溶性にするように配置された、グリコールエーテルから誘導される少なくとも1つの親水性部分を含んでなる少なくとも1つのブロックとを含んでなり、該ブロックは、少なくとも1つの切断可能な基Yにより共有結合によって互いに結合している(ここで、N、PおよびYは上記請求項8で定義した通りである)、ブロックコポリマー。
- グリコールエーテルから誘導される前記A’部分は、ポリエーテルから誘導される部分の形態をとることを特徴とする、請求項12に記載のブロックコポリマー。
- ポリエーテルから誘導される前記A’部分は、ポリエチレングリコール(PEG)から誘導される部分であることを特徴とする、請求項13に記載のブロックコポリマー。
- ポリエーテルから誘導される前記A’部分は、ポリプロピレングリコール(PPG)から誘導される部分であることを特徴とする、請求項13に記載のブロックコポリマー。
- R4は、同一であってもよくまたは異なっていてもよく、H、CH3であることを特徴とする、請求項16に記載のブロックコポリマー。
- W、X、Zは、同一であってもよくまたは異なっていてもよく、C1−C20エステル基、アミド基、およびスチレンから誘導される基を含む群から選択されることを特徴とする、請求項8から請求項17のいずれかに記載のコポリマー。
- W、X、Zは、同一であってもよくまたは異なっていてもよく、C2−C10エステル基であることを特徴とする、請求項18に記載のコポリマー。
- グリコールエーテルから誘導される前記A部分は、ポリエーテルから誘導される部分の形態をとることを特徴とする、請求項8〜19のいずれかに記載のコポリマー。
- ポリエーテルから誘導される前記A部分は、ポリエチレングリコール(PEG)から誘導される部分であることを特徴とする、請求項20に記載のコポリマー。
- ポリエーテルから誘導される前記A部分は、ポリプロピレングリコール(PPG)から誘導される部分であることを特徴とする、請求項20に記載のコポリマー。
- LはC2−C20炭素部分であることを特徴とする、請求項8から請求項22のいずれかに記載のコポリマー。
- LはC4−C10炭素部分であることを特徴とする、請求項23に記載のコポリマー。
- Lは少なくとも部分的にフッ素化された部分であることを特徴とする、請求項8から請求項24のいずれかに記載のコポリマー。
- Lは完全にフッ素化された部分であることを特徴とする、請求項25に記載のコポリマー。
- Qは、同一であってもよくまたは異なっていてもよく、アンカー部分を形成し、かつチオール、チオエーテル、チオエステル、スルフィド、チオアミド、シラノール、アルコキシシラン、ハロゲン化シラン、ヒドロキシル、ホスフェート、保護または非保護のホスホン酸、保護または非保護のホスホネート、アミン、アンモニウム、含窒素複素環、カルボン酸、無水物、カテコールを含む群から選択されることを特徴とする、請求項8から請求項26のいずれかに記載のコポリマー。
- 前記化合物は請求項8から請求項27のいずれかに記載のコポリマーである、請求項1に記載のエピラム処理剤。
- 少なくとも50容量%の水と、請求項1から請求項7または請求項28のいずれかに記載の可溶化されるエピラム処理剤とを含んでなる、エピラム処理浴。
- 基体表面の少なくとも一部分をエピラムでコーティングするための方法であって:
a)少なくとも50容量%の水を含む溶液中に、請求項1から請求項7のいずれかに記載の少なくとも1つのエピラム処理剤を可溶化するかまたは請求項8から請求項27に記載の少なくとも1つのコポリマーを含めることにより、エピラム処理浴を調製する工程、
b)任意選択により、基体表面を調製する工程、
c)その基体表面を前記エピラム処理浴中で前記エピラム処理剤と接触させる工程、
d)任意選択により、乾燥させる工程、
e)開裂により前記エピラム処理剤から前記親水性部分を分離する工程、
f)前記基体表面を洗い流す工程、
g)乾燥させる工程
を含む、方法。 - 前記親水性部分から前記親水性残基がなくなるまで工程e)およびf)を繰り返すことを特徴とする、請求項30に記載のエピラム処理方法。
- 工程f)は、少なくとも50%の水を含む溶液中で行われることを特徴とする、請求項30および請求項31のいずれかに記載のエピラム処理方法。
- その少なくとも一部がエピラムでコーティングされた表面を有する基体であって、該エピラムは、請求項1から請求項7のいずれかに記載のエピラム処理剤を開裂させるかまたは請求項8から請求項27に記載の少なくとも1つのコポリマーを含めることにより得られ、該エピラムは、少なくとも疎水性および疎油性の部分と、少なくとも1つの親水性部分を前記化合物に連結するために使用された切断可能な基の少なくとも1つの残部とを含む少なくとも1つの化合物を含有することを特徴とする、基体。
- 前記エピラムは、それらの主鎖による共有結合によって連結された、N単位、および任意選択により、少なくとも1つのP単位と、切断可能な基の少なくとも1つの残部とを含んでなるコポリマー(ここで、NおよびPは上記で定義した通りである)の形態の少なくとも1つの化合物を含んでなることを特徴とする、請求項33に記載の基体。
- 前記切断可能な基の残部は、前記コポリマーの主鎖の末端または前記コポリマーの側鎖の末端にあることを特徴とする、請求項34に記載の基体。
- その少なくとも一部が前記エピラムでコーティングされたその表面は、金属、金属酸化物、金属窒化物、金属ホウ化物、金属炭化物、ポリマー、ダイヤモンド、サファイア、ルビー、石英、ケイ素、酸化ケイ素、窒化ケイ素、炭化ケイ素、DLC(ダイヤモンドライクカーボン)、およびそれらの合金を含む群から選択される材料から作られていることを特徴とする、請求項33から請求項35のいずれかに記載の基体。
- 請求項33から請求項36のいずれかに記載の基体を含んでなる要素を含んでなる時計または宝飾品部品。
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