JP6666105B2 - 半導体装置および選択回路 - Google Patents
半導体装置および選択回路 Download PDFInfo
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- JP6666105B2 JP6666105B2 JP2015202223A JP2015202223A JP6666105B2 JP 6666105 B2 JP6666105 B2 JP 6666105B2 JP 2015202223 A JP2015202223 A JP 2015202223A JP 2015202223 A JP2015202223 A JP 2015202223A JP 6666105 B2 JP6666105 B2 JP 6666105B2
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- level shift
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- 239000004065 semiconductor Substances 0.000 title claims description 11
- 102100036285 25-hydroxyvitamin D-1 alpha hydroxylase, mitochondrial Human genes 0.000 description 40
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Images
Classifications
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/0175—Coupling arrangements; Interface arrangements
- H03K19/0185—Coupling arrangements; Interface arrangements using field effect transistors only
- H03K19/018507—Interface arrangements
- H03K19/018521—Interface arrangements of complementary type, e.g. CMOS
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/0175—Coupling arrangements; Interface arrangements
- H03K19/0185—Coupling arrangements; Interface arrangements using field effect transistors only
- H03K19/018507—Interface arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
- H01L27/092—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/22—Modifications for ensuring a predetermined initial state when the supply voltage has been applied
- H03K17/223—Modifications for ensuring a predetermined initial state when the supply voltage has been applied in field-effect transistor switches
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/353—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of field-effect transistors with internal or external positive feedback
- H03K3/356—Bistable circuits
- H03K3/356104—Bistable circuits using complementary field-effect transistors
- H03K3/356113—Bistable circuits using complementary field-effect transistors using additional transistors in the input circuit
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/353—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of field-effect transistors with internal or external positive feedback
- H03K3/356—Bistable circuits
- H03K3/356104—Bistable circuits using complementary field-effect transistors
- H03K3/356165—Bistable circuits using complementary field-effect transistors using additional transistors in the feedback circuit
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/36—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of semiconductors, not otherwise provided for
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0684—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions
Description
Claims (4)
- 予め定めた電圧を出力する第1の電源で駆動される第1のインバータおよび第2のインバータによってデータを保持するラッチ部と、太陽光の照射量に応じて出力する電圧値が変動する太陽光パネルを用いた第2の電源の電圧レベルに基づいてオンオフ状態が切り替えられ、オン状態になった場合に、基準電位に対応したデータを前記ラッチ部に設定する第1のトランジスタと、を有する設定回路と、
前記第1のインバータの出力および前記第2のインバータの入力に接続され、前記第2の電源の電圧値が予め定めた電圧値以下に低下した場合に、前記基準電位に対応したデータを前記ラッチ部に設定するN型の第2のトランジスタを含むリセット回路と、
を備えた半導体装置。 - 前記第1のトランジスタの大きさが前記第1のインバータに含まれるP型トランジスタの大きさより大きい
請求項1記載の半導体装置。 - 前記第2のトランジスタの大きさが前記第1のトランジスタの大きさより大きい
請求項1または請求項2に記載の半導体装置。 - 請求項1〜請求項3の何れか1項に記載した半導体装置と、
前記第1の電源および前記第2の電源、並びに、前記ラッチ部に設定されたデータに対応する信号を出力する前記半導体装置の出力端子に接続され、前記出力端子から出力される信号に基づいて、前記第1の電源および前記第2の電源のうち、何れの電源を使用するか選択する選択部と、
前記選択部によって選択された電源の電圧を出力する出力端子と、
を備えた選択回路。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015202223A JP6666105B2 (ja) | 2015-10-13 | 2015-10-13 | 半導体装置および選択回路 |
US15/291,677 US9831878B2 (en) | 2015-10-13 | 2016-10-12 | Semiconductor device and selector circuit |
CN201610892794.6A CN107017874B (zh) | 2015-10-13 | 2016-10-13 | 半导体装置以及选择电路 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015202223A JP6666105B2 (ja) | 2015-10-13 | 2015-10-13 | 半導体装置および選択回路 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017076840A JP2017076840A (ja) | 2017-04-20 |
JP6666105B2 true JP6666105B2 (ja) | 2020-03-13 |
Family
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Application Number | Title | Priority Date | Filing Date |
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JP2015202223A Active JP6666105B2 (ja) | 2015-10-13 | 2015-10-13 | 半導体装置および選択回路 |
Country Status (3)
Country | Link |
---|---|
US (1) | US9831878B2 (ja) |
JP (1) | JP6666105B2 (ja) |
CN (1) | CN107017874B (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6915253B2 (ja) * | 2016-09-30 | 2021-08-04 | ヤマハ株式会社 | 制御装置、制御方法およびプログラム |
WO2020044183A1 (ja) | 2018-08-31 | 2020-03-05 | 株式会社半導体エネルギー研究所 | 半導体装置 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3214395B2 (ja) * | 1997-05-20 | 2001-10-02 | 日本電気株式会社 | 不揮発性半導体記憶装置 |
JP2000068819A (ja) * | 1998-08-20 | 2000-03-03 | Toshiba Corp | カウンタ回路、2分周論理回路及びクロック信号供給回路 |
JP2001168686A (ja) * | 1999-12-03 | 2001-06-22 | Sony Corp | ラッチ回路 |
JP2005184774A (ja) * | 2003-11-28 | 2005-07-07 | Matsushita Electric Ind Co Ltd | レベルシフト回路 |
US7002371B2 (en) * | 2003-12-29 | 2006-02-21 | Freescale Semiconductor, Inc. | Level shifter |
KR100859226B1 (ko) * | 2006-05-12 | 2008-09-18 | 주식회사 하이닉스반도체 | 선정된 순서의 카운팅 값을 가지는 카운팅 신호를 출력하는 카운터 |
JP2008177755A (ja) | 2007-01-17 | 2008-07-31 | Rohm Co Ltd | レベルシフト回路およびそれを用いた半導体装置 |
DE102008014916B4 (de) * | 2007-03-20 | 2010-07-29 | DENSO CORPORATION, Kariya-shi | Pegelverschiebungsschaltung |
US7622954B2 (en) * | 2008-02-26 | 2009-11-24 | Standard Microsystems Corporation | Level shifter with memory interfacing two supply domains |
JP5200875B2 (ja) * | 2008-11-17 | 2013-06-05 | サンケン電気株式会社 | レベルシフト回路 |
JP5710175B2 (ja) * | 2010-08-04 | 2015-04-30 | ラピスセミコンダクタ株式会社 | 電源切替回路 |
JPWO2012029872A1 (ja) * | 2010-09-02 | 2013-10-31 | シャープ株式会社 | 信号処理回路、インバータ回路、バッファ回路、レベルシフタ、フリップフロップ、ドライバ回路、表示装置 |
US8405422B2 (en) * | 2010-09-30 | 2013-03-26 | Fuji Electric Co., Ltd. | Level shift circuit |
FR2982701B1 (fr) * | 2011-11-16 | 2014-01-03 | St Microelectronics Crolles 2 | Dispositif memoire |
JP5880225B2 (ja) * | 2012-04-02 | 2016-03-08 | 富士電機株式会社 | 半導体装置 |
-
2015
- 2015-10-13 JP JP2015202223A patent/JP6666105B2/ja active Active
-
2016
- 2016-10-12 US US15/291,677 patent/US9831878B2/en active Active
- 2016-10-13 CN CN201610892794.6A patent/CN107017874B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
US20170104488A1 (en) | 2017-04-13 |
US9831878B2 (en) | 2017-11-28 |
CN107017874B (zh) | 2022-05-13 |
JP2017076840A (ja) | 2017-04-20 |
CN107017874A (zh) | 2017-08-04 |
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