JP6585521B2 - テンプレート、インプリント方法およびインプリント装置 - Google Patents

テンプレート、インプリント方法およびインプリント装置 Download PDF

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Publication number
JP6585521B2
JP6585521B2 JP2016026908A JP2016026908A JP6585521B2 JP 6585521 B2 JP6585521 B2 JP 6585521B2 JP 2016026908 A JP2016026908 A JP 2016026908A JP 2016026908 A JP2016026908 A JP 2016026908A JP 6585521 B2 JP6585521 B2 JP 6585521B2
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JP
Japan
Prior art keywords
template
stress
resist
pattern
light
Prior art date
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Expired - Fee Related
Application number
JP2016026908A
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English (en)
Japanese (ja)
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JP2017147294A (ja
JP2017147294A5 (https=
Inventor
みつ子 清水
みつ子 清水
佐藤　隆
隆 佐藤
晶子 三本木
晶子 三本木
晶子 山田
晶子 山田
須藤　武
武 須藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kioxia Corp
Original Assignee
Toshiba Memory Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Memory Corp filed Critical Toshiba Memory Corp
Priority to JP2016026908A priority Critical patent/JP6585521B2/ja
Priority to US15/255,298 priority patent/US20170235239A1/en
Publication of JP2017147294A publication Critical patent/JP2017147294A/ja
Publication of JP2017147294A5 publication Critical patent/JP2017147294A5/ja
Priority to US16/404,699 priority patent/US10782621B2/en
Application granted granted Critical
Publication of JP6585521B2 publication Critical patent/JP6585521B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
    • C09K11/08—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials
    • C09K11/56—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials containing sulfur
    • C09K11/562—Chalcogenides
    • C09K11/565—Chalcogenides with zinc cadmium
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
    • C09K11/08—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials
    • C09K11/77—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials containing rare earth metals
    • C09K11/7728—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials containing rare earth metals containing europium
    • C09K11/7734—Aluminates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2016026908A 2016-02-16 2016-02-16 テンプレート、インプリント方法およびインプリント装置 Expired - Fee Related JP6585521B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2016026908A JP6585521B2 (ja) 2016-02-16 2016-02-16 テンプレート、インプリント方法およびインプリント装置
US15/255,298 US20170235239A1 (en) 2016-02-16 2016-09-02 Imprint method, imprint apparatus, and template
US16/404,699 US10782621B2 (en) 2016-02-16 2019-05-06 Imprint method, imprint apparatus, and template

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016026908A JP6585521B2 (ja) 2016-02-16 2016-02-16 テンプレート、インプリント方法およびインプリント装置

Publications (3)

Publication Number Publication Date
JP2017147294A JP2017147294A (ja) 2017-08-24
JP2017147294A5 JP2017147294A5 (https=) 2018-03-15
JP6585521B2 true JP6585521B2 (ja) 2019-10-02

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016026908A Expired - Fee Related JP6585521B2 (ja) 2016-02-16 2016-02-16 テンプレート、インプリント方法およびインプリント装置

Country Status (2)

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US (2) US20170235239A1 (https=)
JP (1) JP6585521B2 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105974731B (zh) * 2016-07-25 2020-01-03 京东方科技集团股份有限公司 一种压印板、检测方法及检测装置
JP7129259B2 (ja) * 2018-07-24 2022-09-01 キヤノン株式会社 検査方法、インプリント装置、および物品製造方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3785457B2 (ja) 2002-08-28 2006-06-14 独立行政法人産業技術総合研究所 光ファイバーセンサ及び応力計測装置
US7307702B1 (en) 2004-08-13 2007-12-11 The United States Of America As Represented By The Secretary Of The Navy Color switchable stress-fracture sensor for damage control
JP4406695B2 (ja) * 2005-03-31 2010-02-03 独立行政法人産業技術総合研究所 応力測定システム
US7855046B2 (en) * 2005-04-07 2010-12-21 The University Of North Carolina At Charlotte Method and apparatus for fabricating shaped structures and shaped structures including one- , two- or three-dimensional patterns incorporated therein
JP2007081048A (ja) * 2005-09-13 2007-03-29 Canon Inc ナノインプリント用型、装置および方法
JP4521533B2 (ja) 2005-09-30 2010-08-11 独立行政法人産業技術総合研究所 応力−ひずみ検出システム
CN101400977A (zh) 2006-03-10 2009-04-01 独立行政法人产业技术综合研究所 应力历史记录系统
WO2008020541A1 (fr) * 2006-08-14 2008-02-21 Fujikura Ltd. Dispositif électroluminescent et dispositif d'éclairage
JP4963077B2 (ja) * 2007-03-30 2012-06-27 独立行政法人産業技術総合研究所 紫外線を発光する応力発光材料およびその製造方法、並びにその利用
US8945444B2 (en) * 2007-12-04 2015-02-03 Canon Nanotechnologies, Inc. High throughput imprint based on contact line motion tracking control
JP5127785B2 (ja) * 2009-07-21 2013-01-23 株式会社東芝 インプリント装置およびインプリント方法
JP5448714B2 (ja) 2009-10-20 2014-03-19 キヤノン株式会社 インプリント装置、及びそれを用いた物品の製造方法
JP2011103362A (ja) * 2009-11-10 2011-05-26 Toshiba Corp パターン形成方法
JP5653769B2 (ja) * 2011-01-19 2015-01-14 富士フイルム株式会社 ナノインプリント方法
CN104210047B (zh) * 2011-06-23 2016-09-28 旭化成株式会社 微细图案形成用积层体及微细图案形成用积层体的制造方法
JP2013098181A (ja) * 2011-10-27 2013-05-20 Canon Inc インプリント装置、インプリント方法、インプリントシステム及びデバイス製造方法
TW201445246A (zh) * 2013-05-31 2014-12-01 奈米晶光電股份有限公司 無缺陷模仁之製造方法
US10010956B2 (en) * 2014-01-07 2018-07-03 Paul A. SOLLIDAY Firefighter's appliance
KR101727658B1 (ko) * 2014-06-10 2017-04-17 재단법인대구경북과학기술원 기계적 발광 디스플레이 장치

Also Published As

Publication number Publication date
US10782621B2 (en) 2020-09-22
US20170235239A1 (en) 2017-08-17
JP2017147294A (ja) 2017-08-24
US20190302614A1 (en) 2019-10-03

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