JP6574244B2 - Ｃｍｐ用の多層研磨パッド - Google Patents

Ｃｍｐ用の多層研磨パッド Download PDF

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Publication number
JP6574244B2
JP6574244B2 JP2017511151A JP2017511151A JP6574244B2 JP 6574244 B2 JP6574244 B2 JP 6574244B2 JP 2017511151 A JP2017511151 A JP 2017511151A JP 2017511151 A JP2017511151 A JP 2017511151A JP 6574244 B2 JP6574244 B2 JP 6574244B2
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JP
Japan
Prior art keywords
layer
polishing pad
polishing
intermediate layer
top layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2017511151A
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English (en)
Japanese (ja)
Other versions
JP2017514718A5 (https=
JP2017514718A (ja
Inventor
マージーグロッド ブライアン
マージーグロッド ブライアン
ネアー ジャヤクリシュナン
ネアー ジャヤクリシュナン
ブレイク ギャレット
ブレイク ギャレット
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CMC Materials LLC
Original Assignee
Cabot Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Microelectronics Corp filed Critical Cabot Microelectronics Corp
Publication of JP2017514718A publication Critical patent/JP2017514718A/ja
Publication of JP2017514718A5 publication Critical patent/JP2017514718A5/ja
Application granted granted Critical
Publication of JP6574244B2 publication Critical patent/JP6574244B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H10P52/40—Chemomechanical polishing [CMP]
    • H10P52/402—Chemomechanical polishing [CMP] of semiconductor materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/001—Manufacture of flexible abrasive materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0045—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for by stacking sheets of abrasive material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H10P52/40—Chemomechanical polishing [CMP]
    • H10P52/403—Chemomechanical polishing [CMP] of conductive or resistive materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
JP2017511151A 2014-05-07 2015-04-30 Ｃｍｐ用の多層研磨パッド Expired - Fee Related JP6574244B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201461989669P 2014-05-07 2014-05-07
US61/989,669 2014-05-07
US201462022770P 2014-07-10 2014-07-10
US62/022,770 2014-07-10
PCT/US2015/028503 WO2015171419A1 (en) 2014-05-07 2015-04-30 Multi-layer polishing pad for cmp

Publications (3)

Publication Number Publication Date
JP2017514718A JP2017514718A (ja) 2017-06-08
JP2017514718A5 JP2017514718A5 (https=) 2018-05-24
JP6574244B2 true JP6574244B2 (ja) 2019-09-11

Family

ID=54368476

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017511151A Expired - Fee Related JP6574244B2 (ja) 2014-05-07 2015-04-30 Ｃｍｐ用の多層研磨パッド

Country Status (7)

Country Link
US (1) US9818618B2 (https=)
EP (1) EP3140852B1 (https=)
JP (1) JP6574244B2 (https=)
KR (1) KR102440303B1 (https=)
CN (1) CN106575613B (https=)
TW (1) TWI626118B (https=)
WO (1) WO2015171419A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102777772B1 (ko) * 2018-11-27 2025-03-06 쓰리엠 이노베이티브 프로퍼티즈 컴파니 폴리싱 패드 및 시스템과 이의 제조 및 사용 방법
CN112238670B (zh) * 2020-10-16 2022-11-15 上海江丰平芯电子科技有限公司 一种研磨垫的制备方法
CN116847948A (zh) * 2020-12-22 2023-10-03 Cmc材料有限责任公司 具有带有聚合物型外壳的成孔剂的化学-机械抛光副垫

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5257478A (en) 1990-03-22 1993-11-02 Rodel, Inc. Apparatus for interlayer planarization of semiconductor material
US5196353A (en) 1992-01-03 1993-03-23 Micron Technology, Inc. Method for controlling a semiconductor (CMP) process by measuring a surface temperature and developing a thermal image of the wafer
US6614529B1 (en) 1992-12-28 2003-09-02 Applied Materials, Inc. In-situ real-time monitoring technique and apparatus for endpoint detection of thin films during chemical/mechanical polishing planarization
US5658183A (en) 1993-08-25 1997-08-19 Micron Technology, Inc. System for real-time control of semiconductor wafer polishing including optical monitoring
US5433651A (en) 1993-12-22 1995-07-18 International Business Machines Corporation In-situ endpoint detection and process monitoring method and apparatus for chemical-mechanical polishing
JP3270282B2 (ja) 1994-02-21 2002-04-02 株式会社東芝 半導体製造装置及び半導体装置の製造方法
JP3313505B2 (ja) 1994-04-14 2002-08-12 株式会社日立製作所 研磨加工法
US5964643A (en) 1995-03-28 1999-10-12 Applied Materials, Inc. Apparatus and method for in-situ monitoring of chemical mechanical polishing operations
US5893796A (en) 1995-03-28 1999-04-13 Applied Materials, Inc. Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
US5838447A (en) 1995-07-20 1998-11-17 Ebara Corporation Polishing apparatus including thickness or flatness detector
US5872633A (en) 1996-07-26 1999-02-16 Speedfam Corporation Methods and apparatus for detecting removal of thin film layers during planarization
JP2002303727A (ja) * 2001-04-06 2002-10-18 Nitto Denko Corp 偏光フィルムの製造方法
US20050276967A1 (en) * 2002-05-23 2005-12-15 Cabot Microelectronics Corporation Surface textured microporous polishing pads
US6884156B2 (en) * 2003-06-17 2005-04-26 Cabot Microelectronics Corporation Multi-layer polishing pad material for CMP
US20070015448A1 (en) * 2003-08-07 2007-01-18 Ppg Industries Ohio, Inc. Polishing pad having edge surface treatment
WO2005035194A2 (en) * 2003-10-09 2005-04-21 Thomas West, Inc. Stacked pad and method of use
CN101678667A (zh) * 2007-04-03 2010-03-24 陶氏环球技术公司 用于地毯背衬应用的（真空辅助的）热膜层合
US20080274674A1 (en) * 2007-05-03 2008-11-06 Cabot Microelectronics Corporation Stacked polishing pad for high temperature applications
JP5585081B2 (ja) * 2008-05-16 2014-09-10 東レ株式会社 研磨パッド
WO2010082992A2 (en) * 2009-01-16 2010-07-22 Applied Materials, Inc. Polishing pad and system with window support
SG181889A1 (en) * 2009-12-30 2012-07-30 3M Innovative Properties Co Organic particulate loaded polishing pads and method of making and using the same
WO2011082155A2 (en) * 2009-12-30 2011-07-07 3M Innovative Properties Company Polishing pads including phase-separated polymer blend and method of making and using the same
US9067297B2 (en) * 2011-11-29 2015-06-30 Nexplanar Corporation Polishing pad with foundation layer and polishing surface layer
JP5893413B2 (ja) * 2012-01-17 2016-03-23 東洋ゴム工業株式会社 積層研磨パッドの製造方法
US9597769B2 (en) * 2012-06-04 2017-03-21 Nexplanar Corporation Polishing pad with polishing surface layer having an aperture or opening above a transparent foundation layer

Also Published As

Publication number Publication date
EP3140852A4 (en) 2018-01-10
WO2015171419A1 (en) 2015-11-12
TW201542317A (zh) 2015-11-16
US9818618B2 (en) 2017-11-14
EP3140852A1 (en) 2017-03-15
EP3140852B1 (en) 2021-07-28
CN106575613A (zh) 2017-04-19
KR102440303B1 (ko) 2022-09-05
TWI626118B (zh) 2018-06-11
US20150325451A1 (en) 2015-11-12
JP2017514718A (ja) 2017-06-08
CN106575613B (zh) 2019-12-17
KR20170015907A (ko) 2017-02-10

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