JP6566416B2 - 光ビーム測定装置 - Google Patents

光ビーム測定装置 Download PDF

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Publication number
JP6566416B2
JP6566416B2 JP2015113703A JP2015113703A JP6566416B2 JP 6566416 B2 JP6566416 B2 JP 6566416B2 JP 2015113703 A JP2015113703 A JP 2015113703A JP 2015113703 A JP2015113703 A JP 2015113703A JP 6566416 B2 JP6566416 B2 JP 6566416B2
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JP
Japan
Prior art keywords
light beam
unit
optical axis
light source
source unit
Prior art date
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Active
Application number
JP2015113703A
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English (en)
Japanese (ja)
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JP2016014657A (ja
JP2016014657A5 (enExample
Inventor
長谷川　清
清 長谷川
裕士 川村
裕士 川村
ウッド ピーター
ウッド ピーター
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samco Inc
Original Assignee
Samco Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samco Inc filed Critical Samco Inc
Priority to JP2015113703A priority Critical patent/JP6566416B2/ja
Publication of JP2016014657A publication Critical patent/JP2016014657A/ja
Publication of JP2016014657A5 publication Critical patent/JP2016014657A5/ja
Application granted granted Critical
Publication of JP6566416B2 publication Critical patent/JP6566416B2/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/0238—Details making use of sensor-related data, e.g. for identification of sensor or optical parts
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G01N2021/8427—Coatings
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/02—Mechanical
    • G01N2201/025—Mechanical control of operations
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/10—Scanning
    • G01N2201/108—Miscellaneous
    • G01N2201/1087—Focussed scan beam, e.g. laser

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Microscoopes, Condenser (AREA)
JP2015113703A 2014-06-10 2015-06-04 光ビーム測定装置 Active JP6566416B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2015113703A JP6566416B2 (ja) 2014-06-10 2015-06-04 光ビーム測定装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014119392 2014-06-10
JP2014119392 2014-06-10
JP2015113703A JP6566416B2 (ja) 2014-06-10 2015-06-04 光ビーム測定装置

Publications (3)

Publication Number Publication Date
JP2016014657A JP2016014657A (ja) 2016-01-28
JP2016014657A5 JP2016014657A5 (enExample) 2018-04-12
JP6566416B2 true JP6566416B2 (ja) 2019-08-28

Family

ID=54769344

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015113703A Active JP6566416B2 (ja) 2014-06-10 2015-06-04 光ビーム測定装置

Country Status (2)

Country Link
US (1) US9488519B2 (enExample)
JP (1) JP6566416B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6878866B2 (ja) * 2016-12-15 2021-06-02 株式会社サタケ 光学式選別機用光学ユニット

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61140887A (ja) * 1984-12-14 1986-06-27 富士通株式会社 ２軸ゴニオステ−ジ
JP3529486B2 (ja) * 1995-04-18 2004-05-24 株式会社東芝 光ディスクドライブの組み立て方法
JP2000352505A (ja) * 1999-04-05 2000-12-19 Toshiba Corp 膜厚測定方法および装置、薄膜処理装置並びに半導体装置の製造方法
JP2003121572A (ja) * 2001-10-10 2003-04-23 Fuji Photo Optical Co Ltd 載物ステージ
JP2006330210A (ja) 2005-05-24 2006-12-07 Olympus Corp レンズの心出し方法及び装置
JP2009243920A (ja) * 2008-03-28 2009-10-22 Jfe Steel Corp 基準板、表面検査装置の光軸調整方法、及び表面検査装置
JP5134603B2 (ja) * 2009-09-09 2013-01-30 株式会社日立ハイテクノロジーズ 光ビーム調整方法及び光ビーム調整装置
US8325344B2 (en) * 2009-12-18 2012-12-04 Hewlett-Packard Development Company, L.P. Optical density determination methods and apparatus

Also Published As

Publication number Publication date
JP2016014657A (ja) 2016-01-28
US9488519B2 (en) 2016-11-08
US20150355016A1 (en) 2015-12-10

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