JP6545395B2 - メッシュフィルターの製造方法 - Google Patents
メッシュフィルターの製造方法 Download PDFInfo
- Publication number
- JP6545395B2 JP6545395B2 JP2018537070A JP2018537070A JP6545395B2 JP 6545395 B2 JP6545395 B2 JP 6545395B2 JP 2018537070 A JP2018537070 A JP 2018537070A JP 2018537070 A JP2018537070 A JP 2018537070A JP 6545395 B2 JP6545395 B2 JP 6545395B2
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- JP
- Japan
- Prior art keywords
- mesh filter
- dlc
- resist pattern
- pattern
- cylindrical metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D39/00—Filtering material for liquid or gaseous fluids
- B01D39/10—Filter screens essentially made of metal
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/08—Perforated or foraminous objects, e.g. sieves
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/10—Moulds; Masks; Masterforms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
- G02B26/023—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light comprising movable attenuating elements, e.g. neutral density filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
- B01D2239/10—Filtering material manufacturing
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/005—Diaphragms
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Filtering Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Description
円周600mm、面長1100mmの版母材(アルミ中空ロール)を準備し、New FX装置(株式会社シンク・ラボラトリー製全自動レーザーグラビア製版ロール製造装置)を用いて下記するDLCパターン付ロールを製造した。
ついで、5%水酸化ナトリウム水溶液にてレジストを剥離させ、図2のように、直径の異なる複数の円形凸部がそれぞれ併存せしめたDLCパターンとした。DLCパターンとしては、直径200μm〜10μmの複数の円形凸部が前記基材上に無段階グラデーションで併存するように形成した。このようにして、DLCパターン付ロールを得た。
Claims (4)
- メッキ可能な円筒状金属基材を準備する工程と、前記円筒状金属基材の表面にフォトレジストを塗布し、露光・現像せしめてメッシュフィルター状レジストパターンを形成する工程と、前記円筒状金属基材及びメッシュフィルター状レジストパターンの表面にDLC
被覆膜を形成する工程と、前記メッシュフィルター状レジストパターン上に形成されたDLC被覆膜を前記メッシュフィルター状レジストパターンごと剥離せしめて前記円筒状金属基材の表面にDLCパターンを形成し、DLCパターン付ロールを作製する工程と、前記DLCパターン付ロールを用いて、メッキ可能な金属を連続メッキすることによりメッシュフィルターを作製する工程と、を含み、
前記メッシュフィルター状レジストパターンが、目開きの異なる複数のメッシュフィルター状レジストパターンが同一の前記円筒状金属基材に形成されてなるメッシュフィルター状レジストパターンである、メッシュフィルターの製造方法。 - 前記フォトレジストが塗布される金属基材が、ニッケル、タングステン、クロム、チタン、金、銀、白金、ステンレス鋼、鉄、銅、アルミニウムからなる群から選ばれた少なくとも一種の材料から構成されてなる、請求項1記載のメッシュフィルターの製造方法。
- 前記DLC被覆膜の厚さが、0.1μm〜20μmである、請求項1又は2記載のメッシュフィルターの製造方法。
- 前記目開きの異なる複数のメッシュフィルター状レジストパターンが、目開きが無段階で変化する無段階グラデーションパターンである、請求項1〜3いずれか1項記載のメッシュフィルターの製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016170618 | 2016-09-01 | ||
JP2016170618 | 2016-09-01 | ||
PCT/JP2017/028511 WO2018043036A1 (ja) | 2016-09-01 | 2017-08-07 | メッシュフィルターの製造方法及びメッシュフィルター |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2018043036A1 JPWO2018043036A1 (ja) | 2019-06-24 |
JP6545395B2 true JP6545395B2 (ja) | 2019-07-17 |
Family
ID=61305250
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018537070A Active JP6545395B2 (ja) | 2016-09-01 | 2017-08-07 | メッシュフィルターの製造方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20190249320A1 (ja) |
EP (1) | EP3508618A4 (ja) |
JP (1) | JP6545395B2 (ja) |
KR (1) | KR102026756B1 (ja) |
CN (1) | CN109642336A (ja) |
TW (1) | TW201819021A (ja) |
WO (1) | WO2018043036A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019130457A (ja) * | 2018-01-30 | 2019-08-08 | イビデン株式会社 | フィルタ膜 |
CN110055567B (zh) * | 2019-04-18 | 2021-05-07 | 中国科学院化学研究所 | 微孔膜材料的电沉积制备方法和微孔膜材料及其应用 |
CN111481974B (zh) * | 2020-05-12 | 2020-12-15 | 海汇集团有限公司 | 一种能自动更换过滤网的污水过滤装置 |
GB2593603B (en) * | 2021-04-15 | 2022-06-01 | Filter8 Ltd | Air purification |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06260384A (ja) * | 1993-03-08 | 1994-09-16 | Nikon Corp | 露光量制御方法 |
JPH09131506A (ja) | 1995-11-09 | 1997-05-20 | Mitsubishi Materials Corp | 抗菌性金属フィルタ−およびその製造方法 |
US10717032B2 (en) * | 2006-09-21 | 2020-07-21 | Acs Industries, Inc. | Expanded metal filters |
TWI479382B (zh) * | 2011-09-27 | 2015-04-01 | Lg Chemical Ltd | 包括導電圖案之導電基板及包含其之觸控面板 |
EP2767618B1 (en) * | 2011-10-14 | 2017-07-19 | Hitachi Chemical Company, Ltd. | Method for producing metal filters |
CN103361680B (zh) * | 2012-04-10 | 2017-06-06 | 昆山允升吉光电科技有限公司 | 电铸平面丝网 |
CN202538485U (zh) * | 2012-04-28 | 2012-11-21 | 邹睿 | 一种用于下水管道的滤网 |
WO2013176029A1 (ja) * | 2012-05-25 | 2013-11-28 | 株式会社シンク・ラボラトリー | パターン付ロール及びその製造方法 |
JP2014105374A (ja) * | 2012-11-29 | 2014-06-09 | Think Laboratory Co Ltd | 伸縮性を有する金属メッシュ及びその製造方法 |
JP6144907B2 (ja) * | 2012-12-13 | 2017-06-07 | 株式会社シンク・ラボラトリー | 摺動面被覆用微細金属パターンシートの製造方法 |
KR101648544B1 (ko) * | 2013-02-12 | 2016-08-17 | 가부시키가이샤 씽크. 라보라토리 | 연속 도금용 패터닝 롤 및 그 제조 방법 |
JP6173824B2 (ja) * | 2013-08-02 | 2017-08-02 | 株式会社オプトニクス精密 | 開口プレートの製造方法 |
JPWO2015076180A1 (ja) * | 2013-11-25 | 2017-03-16 | 株式会社シンク・ラボラトリー | パターン付ロールの製造方法 |
-
2017
- 2017-08-07 WO PCT/JP2017/028511 patent/WO2018043036A1/ja unknown
- 2017-08-07 CN CN201780052516.2A patent/CN109642336A/zh active Pending
- 2017-08-07 US US16/329,418 patent/US20190249320A1/en not_active Abandoned
- 2017-08-07 KR KR1020197007160A patent/KR102026756B1/ko active IP Right Grant
- 2017-08-07 JP JP2018537070A patent/JP6545395B2/ja active Active
- 2017-08-07 EP EP17846045.7A patent/EP3508618A4/en not_active Withdrawn
- 2017-08-16 TW TW106127716A patent/TW201819021A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
US20190249320A1 (en) | 2019-08-15 |
CN109642336A (zh) | 2019-04-16 |
KR102026756B1 (ko) | 2019-09-30 |
EP3508618A1 (en) | 2019-07-10 |
TW201819021A (zh) | 2018-06-01 |
JPWO2018043036A1 (ja) | 2019-06-24 |
WO2018043036A1 (ja) | 2018-03-08 |
EP3508618A4 (en) | 2020-07-29 |
KR20190029776A (ko) | 2019-03-20 |
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