JP6542793B2 - 長尺状の切削エッジを有する化学機械平坦化パッド・コンディショナ - Google Patents

長尺状の切削エッジを有する化学機械平坦化パッド・コンディショナ Download PDF

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Publication number
JP6542793B2
JP6542793B2 JP2016558346A JP2016558346A JP6542793B2 JP 6542793 B2 JP6542793 B2 JP 6542793B2 JP 2016558346 A JP2016558346 A JP 2016558346A JP 2016558346 A JP2016558346 A JP 2016558346A JP 6542793 B2 JP6542793 B2 JP 6542793B2
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elongated
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protrusions
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Japanese (ja)
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JP2017509500A (ja
JP2017509500A5 (enExample
Inventor
ギャルピン、アンドリュー
ウェルズ、ダニエル
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Entegris Inc
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Entegris Inc
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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D5/00—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting only by their periphery; Bushings or mountings therefor
    • B24D5/06—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting only by their periphery; Bushings or mountings therefor with inserted abrasive blocks, e.g. segmental
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/12—Dressing tools; Holders therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D2203/00—Tool surfaces formed with a pattern
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H10P52/40—Chemomechanical polishing [CMP]
    • H10P52/402—Chemomechanical polishing [CMP] of semiconductor materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
JP2016558346A 2014-03-21 2015-03-20 長尺状の切削エッジを有する化学機械平坦化パッド・コンディショナ Active JP6542793B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201461968846P 2014-03-21 2014-03-21
US61/968,846 2014-03-21
PCT/US2015/021679 WO2015143278A1 (en) 2014-03-21 2015-03-20 Chemical mechanical planarization pad conditioner with elongated cutting edges

Publications (3)

Publication Number Publication Date
JP2017509500A JP2017509500A (ja) 2017-04-06
JP2017509500A5 JP2017509500A5 (enExample) 2018-05-10
JP6542793B2 true JP6542793B2 (ja) 2019-07-10

Family

ID=54145367

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016558346A Active JP6542793B2 (ja) 2014-03-21 2015-03-20 長尺状の切削エッジを有する化学機械平坦化パッド・コンディショナ

Country Status (6)

Country Link
US (1) US10293463B2 (enExample)
JP (1) JP6542793B2 (enExample)
KR (1) KR102304574B1 (enExample)
CN (1) CN106463379B (enExample)
TW (1) TWI666091B (enExample)
WO (1) WO2015143278A1 (enExample)

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US10471567B2 (en) * 2016-09-15 2019-11-12 Entegris, Inc. CMP pad conditioning assembly
US20180085891A1 (en) * 2016-09-29 2018-03-29 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Apparatus for shaping the surface of chemical mechanical polishing pads
TWI621503B (zh) * 2017-05-12 2018-04-21 Kinik Company Ltd. 化學機械研磨拋光墊修整器及其製造方法
US20190351527A1 (en) * 2018-05-17 2019-11-21 Entegris, Inc. Conditioner for chemical-mechanical-planarization pad and related methods
US12687790B2 (en) * 2018-07-27 2026-07-21 Asml Netherlands B.V. Tool for modifying a support surface
US12208487B2 (en) * 2018-10-29 2025-01-28 Taiwan Semiconductor Manufacturing Co., Ltd. Chemical mechanical polishing apparatus and method
US11331767B2 (en) * 2019-02-01 2022-05-17 Micron Technology, Inc. Pads for chemical mechanical planarization tools, chemical mechanical planarization tools, and related methods
WO2020165759A1 (en) * 2019-02-13 2020-08-20 3M Innovative Properties Company Abrasive elements with precisely shaped features, abrasive articles fabricated therefrom and methods of making thereof
SG11202111151XA (en) * 2019-04-09 2021-11-29 Entegris Inc Segment designs for discs
US11524385B2 (en) * 2019-06-07 2022-12-13 Rohm And Haas Electronic Materials Cmp Holdings, Inc. CMP polishing pad with lobed protruding structures
GB2590511B (en) * 2019-11-20 2023-10-25 Best Engineered Surface Tech Llc Hybrid CMP conditioning head
US12370648B2 (en) * 2020-01-30 2025-07-29 Taiwan Semiconductor Manufacturing Co., Ltd. Surface clean system and method
US11833638B2 (en) * 2020-03-25 2023-12-05 Rohm and Haas Electronic Materials Holding, Inc. CMP polishing pad with polishing elements on supports
JP2024535447A (ja) * 2021-09-29 2024-09-30 インテグリス・インコーポレーテッド 両面パッドコンディショナー

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US6302770B1 (en) * 1998-07-28 2001-10-16 Nikon Research Corporation Of America In-situ pad conditioning for CMP polisher
JP2001157967A (ja) * 1999-11-29 2001-06-12 Mitsubishi Materials Corp 単層砥石
US6439986B1 (en) 1999-10-12 2002-08-27 Hunatech Co., Ltd. Conditioner for polishing pad and method for manufacturing the same
KR100387954B1 (ko) 1999-10-12 2003-06-19 (주) 휴네텍 연마패드용 컨디셔너와 이의 제조방법
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Also Published As

Publication number Publication date
JP2017509500A (ja) 2017-04-06
TW201600241A (zh) 2016-01-01
CN106463379B (zh) 2019-08-06
CN106463379A (zh) 2017-02-22
US10293463B2 (en) 2019-05-21
US20170095903A1 (en) 2017-04-06
KR102304574B1 (ko) 2021-09-27
WO2015143278A1 (en) 2015-09-24
TWI666091B (zh) 2019-07-21
KR20160136404A (ko) 2016-11-29

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