JP6541355B2 - 冷却構造及び平行平板エッチング装置 - Google Patents

冷却構造及び平行平板エッチング装置 Download PDF

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Publication number
JP6541355B2
JP6541355B2 JP2015002997A JP2015002997A JP6541355B2 JP 6541355 B2 JP6541355 B2 JP 6541355B2 JP 2015002997 A JP2015002997 A JP 2015002997A JP 2015002997 A JP2015002997 A JP 2015002997A JP 6541355 B2 JP6541355 B2 JP 6541355B2
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Japan
Prior art keywords
cooling
plate
cooled
cooling plate
electrode plate
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JP2015002997A
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English (en)
Japanese (ja)
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JP2016129176A (ja
JP2016129176A5 (enExample
Inventor
啓太 神原
啓太 神原
良 佐々木
良 佐々木
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority to JP2015002997A priority Critical patent/JP6541355B2/ja
Priority to US14/963,465 priority patent/US20160203955A1/en
Priority to KR1020150187625A priority patent/KR20160086272A/ko
Publication of JP2016129176A publication Critical patent/JP2016129176A/ja
Publication of JP2016129176A5 publication Critical patent/JP2016129176A5/ja
Application granted granted Critical
Publication of JP6541355B2 publication Critical patent/JP6541355B2/ja
Priority to US16/591,800 priority patent/US20200035464A1/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F13/00—Arrangements for modifying heat-transfer, e.g. increasing, decreasing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H01J37/32724—Temperature

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Drying Of Semiconductors (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Plasma Technology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
JP2015002997A 2015-01-09 2015-01-09 冷却構造及び平行平板エッチング装置 Active JP6541355B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2015002997A JP6541355B2 (ja) 2015-01-09 2015-01-09 冷却構造及び平行平板エッチング装置
US14/963,465 US20160203955A1 (en) 2015-01-09 2015-12-09 Cooling structure and parallel plate etching apparatus
KR1020150187625A KR20160086272A (ko) 2015-01-09 2015-12-28 냉각 구조물 및 평행 평판 에칭 장치
US16/591,800 US20200035464A1 (en) 2015-01-09 2019-10-03 Cooling structure and parallel plate etching apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015002997A JP6541355B2 (ja) 2015-01-09 2015-01-09 冷却構造及び平行平板エッチング装置

Publications (3)

Publication Number Publication Date
JP2016129176A JP2016129176A (ja) 2016-07-14
JP2016129176A5 JP2016129176A5 (enExample) 2017-12-07
JP6541355B2 true JP6541355B2 (ja) 2019-07-10

Family

ID=56368020

Family Applications (1)

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JP2015002997A Active JP6541355B2 (ja) 2015-01-09 2015-01-09 冷却構造及び平行平板エッチング装置

Country Status (3)

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US (2) US20160203955A1 (enExample)
JP (1) JP6541355B2 (enExample)
KR (1) KR20160086272A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7246154B2 (ja) * 2018-10-02 2023-03-27 東京エレクトロン株式会社 プラズマ処理装置及び静電吸着方法
EP3813092A1 (en) * 2019-10-23 2021-04-28 EMD Corporation Plasma source
US20240312770A1 (en) * 2023-03-16 2024-09-19 Applied Materials, Inc. Apparatus and methods for controlling substrate temperature during processing

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0624187B2 (ja) * 1986-09-24 1994-03-30 東京エレクトロン株式会社 プラズマ処理装置
JPH01227438A (ja) * 1988-03-07 1989-09-11 Tokyo Electron Ltd 半導体基板用載置台
JPH0382022A (ja) * 1989-08-24 1991-04-08 Nec Corp ドライエッチング装置
US7895970B2 (en) * 2005-09-29 2011-03-01 Tokyo Electron Limited Structure for plasma processing chamber, plasma processing chamber, plasma processing apparatus, and plasma processing chamber component
JP4777790B2 (ja) * 2005-09-29 2011-09-21 東京エレクトロン株式会社 プラズマ処理室用構造物、プラズマ処理室、及びプラズマ処理装置
JP5002505B2 (ja) * 2008-03-26 2012-08-15 株式会社アルバック 搬送トレー及びこの搬送トレーを用いた真空処理装置
JP6068849B2 (ja) * 2012-07-17 2017-01-25 東京エレクトロン株式会社 上部電極、及びプラズマ処理装置

Also Published As

Publication number Publication date
US20160203955A1 (en) 2016-07-14
US20200035464A1 (en) 2020-01-30
JP2016129176A (ja) 2016-07-14
KR20160086272A (ko) 2016-07-19

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