JP2016129176A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2016129176A5 JP2016129176A5 JP2015002997A JP2015002997A JP2016129176A5 JP 2016129176 A5 JP2016129176 A5 JP 2016129176A5 JP 2015002997 A JP2015002997 A JP 2015002997A JP 2015002997 A JP2015002997 A JP 2015002997A JP 2016129176 A5 JP2016129176 A5 JP 2016129176A5
- Authority
- JP
- Japan
- Prior art keywords
- cooled
- cooling
- cooling plate
- plate
- cooling structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001816 cooling Methods 0.000 claims description 31
- 230000002093 peripheral effect Effects 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 3
- 238000000034 method Methods 0.000 claims 2
- 239000012212 insulator Substances 0.000 claims 1
- 238000005457 optimization Methods 0.000 description 1
Images
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015002997A JP6541355B2 (ja) | 2015-01-09 | 2015-01-09 | 冷却構造及び平行平板エッチング装置 |
| US14/963,465 US20160203955A1 (en) | 2015-01-09 | 2015-12-09 | Cooling structure and parallel plate etching apparatus |
| KR1020150187625A KR20160086272A (ko) | 2015-01-09 | 2015-12-28 | 냉각 구조물 및 평행 평판 에칭 장치 |
| US16/591,800 US20200035464A1 (en) | 2015-01-09 | 2019-10-03 | Cooling structure and parallel plate etching apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015002997A JP6541355B2 (ja) | 2015-01-09 | 2015-01-09 | 冷却構造及び平行平板エッチング装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016129176A JP2016129176A (ja) | 2016-07-14 |
| JP2016129176A5 true JP2016129176A5 (enExample) | 2017-12-07 |
| JP6541355B2 JP6541355B2 (ja) | 2019-07-10 |
Family
ID=56368020
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015002997A Active JP6541355B2 (ja) | 2015-01-09 | 2015-01-09 | 冷却構造及び平行平板エッチング装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US20160203955A1 (enExample) |
| JP (1) | JP6541355B2 (enExample) |
| KR (1) | KR20160086272A (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7246154B2 (ja) * | 2018-10-02 | 2023-03-27 | 東京エレクトロン株式会社 | プラズマ処理装置及び静電吸着方法 |
| EP3813092A1 (en) * | 2019-10-23 | 2021-04-28 | EMD Corporation | Plasma source |
| US20240312770A1 (en) * | 2023-03-16 | 2024-09-19 | Applied Materials, Inc. | Apparatus and methods for controlling substrate temperature during processing |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0624187B2 (ja) * | 1986-09-24 | 1994-03-30 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| JPH01227438A (ja) * | 1988-03-07 | 1989-09-11 | Tokyo Electron Ltd | 半導体基板用載置台 |
| JPH0382022A (ja) * | 1989-08-24 | 1991-04-08 | Nec Corp | ドライエッチング装置 |
| US7895970B2 (en) * | 2005-09-29 | 2011-03-01 | Tokyo Electron Limited | Structure for plasma processing chamber, plasma processing chamber, plasma processing apparatus, and plasma processing chamber component |
| JP4777790B2 (ja) * | 2005-09-29 | 2011-09-21 | 東京エレクトロン株式会社 | プラズマ処理室用構造物、プラズマ処理室、及びプラズマ処理装置 |
| JP5002505B2 (ja) * | 2008-03-26 | 2012-08-15 | 株式会社アルバック | 搬送トレー及びこの搬送トレーを用いた真空処理装置 |
| JP6068849B2 (ja) * | 2012-07-17 | 2017-01-25 | 東京エレクトロン株式会社 | 上部電極、及びプラズマ処理装置 |
-
2015
- 2015-01-09 JP JP2015002997A patent/JP6541355B2/ja active Active
- 2015-12-09 US US14/963,465 patent/US20160203955A1/en not_active Abandoned
- 2015-12-28 KR KR1020150187625A patent/KR20160086272A/ko not_active Ceased
-
2019
- 2019-10-03 US US16/591,800 patent/US20200035464A1/en not_active Abandoned