KR20160086272A - 냉각 구조물 및 평행 평판 에칭 장치 - Google Patents

냉각 구조물 및 평행 평판 에칭 장치 Download PDF

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Publication number
KR20160086272A
KR20160086272A KR1020150187625A KR20150187625A KR20160086272A KR 20160086272 A KR20160086272 A KR 20160086272A KR 1020150187625 A KR1020150187625 A KR 1020150187625A KR 20150187625 A KR20150187625 A KR 20150187625A KR 20160086272 A KR20160086272 A KR 20160086272A
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KR
South Korea
Prior art keywords
cooling
plate
cooled
cooling plate
electrode plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020150187625A
Other languages
English (en)
Korean (ko)
Inventor
게이타 감바라
료 사사키
Original Assignee
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20160086272A publication Critical patent/KR20160086272A/ko
Ceased legal-status Critical Current

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    • H01L21/3065—
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F13/00—Arrangements for modifying heat-transfer, e.g. increasing, decreasing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H01J37/32724—Temperature
    • H01L21/02255—
    • H01L21/32135—
    • H01L21/67098—
    • H01L21/68721—

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
KR1020150187625A 2015-01-09 2015-12-28 냉각 구조물 및 평행 평판 에칭 장치 Ceased KR20160086272A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015002997A JP6541355B2 (ja) 2015-01-09 2015-01-09 冷却構造及び平行平板エッチング装置
JPJP-P-2015-002997 2015-01-09

Publications (1)

Publication Number Publication Date
KR20160086272A true KR20160086272A (ko) 2016-07-19

Family

ID=56368020

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020150187625A Ceased KR20160086272A (ko) 2015-01-09 2015-12-28 냉각 구조물 및 평행 평판 에칭 장치

Country Status (3)

Country Link
US (2) US20160203955A1 (enExample)
JP (1) JP6541355B2 (enExample)
KR (1) KR20160086272A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200038173A (ko) * 2018-10-02 2020-04-10 도쿄엘렉트론가부시키가이샤 플라즈마 처리 장치 및 플라즈마 처리 방법

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3813092A1 (en) * 2019-10-23 2021-04-28 EMD Corporation Plasma source
US20240312770A1 (en) * 2023-03-16 2024-09-19 Applied Materials, Inc. Apparatus and methods for controlling substrate temperature during processing

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0382022A (ja) 1989-08-24 1991-04-08 Nec Corp ドライエッチング装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0624187B2 (ja) * 1986-09-24 1994-03-30 東京エレクトロン株式会社 プラズマ処理装置
JPH01227438A (ja) * 1988-03-07 1989-09-11 Tokyo Electron Ltd 半導体基板用載置台
JP4777790B2 (ja) * 2005-09-29 2011-09-21 東京エレクトロン株式会社 プラズマ処理室用構造物、プラズマ処理室、及びプラズマ処理装置
US7895970B2 (en) * 2005-09-29 2011-03-01 Tokyo Electron Limited Structure for plasma processing chamber, plasma processing chamber, plasma processing apparatus, and plasma processing chamber component
JP5002505B2 (ja) * 2008-03-26 2012-08-15 株式会社アルバック 搬送トレー及びこの搬送トレーを用いた真空処理装置
JP6068849B2 (ja) * 2012-07-17 2017-01-25 東京エレクトロン株式会社 上部電極、及びプラズマ処理装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0382022A (ja) 1989-08-24 1991-04-08 Nec Corp ドライエッチング装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200038173A (ko) * 2018-10-02 2020-04-10 도쿄엘렉트론가부시키가이샤 플라즈마 처리 장치 및 플라즈마 처리 방법

Also Published As

Publication number Publication date
US20200035464A1 (en) 2020-01-30
US20160203955A1 (en) 2016-07-14
JP6541355B2 (ja) 2019-07-10
JP2016129176A (ja) 2016-07-14

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