JP6513208B2 - 光塩基発生剤を含有する光イメージ化可能なポリオレフィン組成物 - Google Patents

光塩基発生剤を含有する光イメージ化可能なポリオレフィン組成物 Download PDF

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JP6513208B2
JP6513208B2 JP2017542905A JP2017542905A JP6513208B2 JP 6513208 B2 JP6513208 B2 JP 6513208B2 JP 2017542905 A JP2017542905 A JP 2017542905A JP 2017542905 A JP2017542905 A JP 2017542905A JP 6513208 B2 JP6513208 B2 JP 6513208B2
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formula
alkyl
group
polymer
film
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JP2018508824A5 (https=
JP2018508824A (ja
Inventor
プラモド カンダナラチチ，
プラモド カンダナラチチ，
ラリー ローズ，
ラリー ローズ，
ヘンドラ イング，
ヘンドラ イング，
ウェイ チャン，
ウェイ チャン，
ブライアン ナップ，
ブライアン ナップ，
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プロメラス， エルエルシー
プロメラス， エルエルシー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2017542905A 2015-02-18 2016-02-12 光塩基発生剤を含有する光イメージ化可能なポリオレフィン組成物 Active JP6513208B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201562117774P 2015-02-18 2015-02-18
US62/117,774 2015-02-18
PCT/US2016/017656 WO2016133795A1 (en) 2015-02-18 2016-02-12 Photoimageable polyolefin compositions containing photobase generators

Publications (3)

Publication Number Publication Date
JP2018508824A JP2018508824A (ja) 2018-03-29
JP2018508824A5 JP2018508824A5 (https=) 2018-08-16
JP6513208B2 true JP6513208B2 (ja) 2019-05-15

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ID=55487111

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JP2017542905A Active JP6513208B2 (ja) 2015-02-18 2016-02-12 光塩基発生剤を含有する光イメージ化可能なポリオレフィン組成物

Country Status (6)

Country Link
US (3) US9952507B2 (https=)
JP (1) JP6513208B2 (https=)
KR (1) KR101998338B1 (https=)
CN (1) CN107407872B (https=)
TW (1) TWI652281B (https=)
WO (1) WO2016133795A1 (https=)

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JP2018538396A (ja) * 2015-11-30 2018-12-27 プロメラス， エルエルシー 光酸発生剤及び塩基を含有する永久誘電体組成物

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TWI732111B (zh) * 2017-03-28 2021-07-01 日商住友電木股份有限公司 感光性組成物、彩色濾光片及由其衍生之微透鏡
TWI758525B (zh) 2017-08-10 2022-03-21 日商住友電木股份有限公司 作為光學材料之聚環烯烴聚合物組成物
WO2021076131A1 (en) * 2019-10-17 2021-04-22 Promerus, Llc Photosensitive compositions and applications thereof
TWI834019B (zh) * 2020-01-09 2024-03-01 日商住友電木股份有限公司 作為3d列印材料之穩定本體聚合型多環烯烴組成物及其製備方法

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JP4054477B2 (ja) * 1998-04-08 2008-02-27 キヤノン株式会社 同一相手に対して複数の通信チャネルを用いた通信を行なうことが可能な通信装置、及びその制御方法
US6849377B2 (en) * 1998-09-23 2005-02-01 E. I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
KR100481601B1 (ko) * 1999-09-21 2005-04-08 주식회사 하이닉스반도체 광산 발생제와 함께 광염기 발생제를 포함하는 포토레지스트 조성물
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WO2010113813A1 (ja) * 2009-03-31 2010-10-07 大日本印刷株式会社 塩基発生剤、感光性樹脂組成物、当該感光性樹脂組成物からなるパターン形成用材料、当該感光性樹脂組成物を用いたパターン形成方法並びに物品
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JP2018538396A (ja) * 2015-11-30 2018-12-27 プロメラス， エルエルシー 光酸発生剤及び塩基を含有する永久誘電体組成物

Also Published As

Publication number Publication date
WO2016133795A1 (en) 2016-08-25
TW201634502A (zh) 2016-10-01
US20160238932A1 (en) 2016-08-18
US10634998B2 (en) 2020-04-28
CN107407872A (zh) 2017-11-28
US20180203349A1 (en) 2018-07-19
KR101998338B1 (ko) 2019-10-01
JP2018508824A (ja) 2018-03-29
CN107407872B (zh) 2020-08-07
US10409160B2 (en) 2019-09-10
KR20170117468A (ko) 2017-10-23
US9952507B2 (en) 2018-04-24
TWI652281B (zh) 2019-03-01
US20190369492A1 (en) 2019-12-05

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