CN107407872B - 含有光碱产生剂的可光成像聚烯烃组合物 - Google Patents

含有光碱产生剂的可光成像聚烯烃组合物 Download PDF

Info

Publication number
CN107407872B
CN107407872B CN201680018462.3A CN201680018462A CN107407872B CN 107407872 B CN107407872 B CN 107407872B CN 201680018462 A CN201680018462 A CN 201680018462A CN 107407872 B CN107407872 B CN 107407872B
Authority
CN
China
Prior art keywords
alkyl
formula
composition
branched
hydrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201680018462.3A
Other languages
English (en)
Chinese (zh)
Other versions
CN107407872A (zh
Inventor
P·坎达纳朗齐
L·罗德
H·恩济
张伟
B·卡纳普
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Promerus LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd, Promerus LLC filed Critical Sumitomo Bakelite Co Ltd
Publication of CN107407872A publication Critical patent/CN107407872A/zh
Application granted granted Critical
Publication of CN107407872B publication Critical patent/CN107407872B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN201680018462.3A 2015-02-18 2016-02-12 含有光碱产生剂的可光成像聚烯烃组合物 Active CN107407872B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201562117774P 2015-02-18 2015-02-18
US62/117,774 2015-02-18
PCT/US2016/017656 WO2016133795A1 (en) 2015-02-18 2016-02-12 Photoimageable polyolefin compositions containing photobase generators

Publications (2)

Publication Number Publication Date
CN107407872A CN107407872A (zh) 2017-11-28
CN107407872B true CN107407872B (zh) 2020-08-07

Family

ID=55487111

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201680018462.3A Active CN107407872B (zh) 2015-02-18 2016-02-12 含有光碱产生剂的可光成像聚烯烃组合物

Country Status (6)

Country Link
US (3) US9952507B2 (https=)
JP (1) JP6513208B2 (https=)
KR (1) KR101998338B1 (https=)
CN (1) CN107407872B (https=)
TW (1) TWI652281B (https=)
WO (1) WO2016133795A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180088652A (ko) * 2015-11-30 2018-08-06 프로메러스, 엘엘씨 광산발생제 및 염기 함유 영구유전체조성물
TWI732111B (zh) * 2017-03-28 2021-07-01 日商住友電木股份有限公司 感光性組成物、彩色濾光片及由其衍生之微透鏡
TWI758525B (zh) 2017-08-10 2022-03-21 日商住友電木股份有限公司 作為光學材料之聚環烯烴聚合物組成物
WO2021076131A1 (en) * 2019-10-17 2021-04-22 Promerus, Llc Photosensitive compositions and applications thereof
TWI834019B (zh) * 2020-01-09 2024-03-01 日商住友電木股份有限公司 作為3d列印材料之穩定本體聚合型多環烯烴組成物及其製備方法

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6395451B1 (en) * 1999-09-21 2002-05-28 Hyundai Electronics Industries Co., Ltd. Photoresist composition containing photo base generator with photo acid generator
EP1246013A2 (en) * 2001-03-30 2002-10-02 E.I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
WO2002093263A1 (en) * 2001-05-11 2002-11-21 Clariant International Ltd Photoresist composition for deep ultraviolet lithography
CN101031595A (zh) * 2003-10-31 2007-09-05 普罗米鲁斯有限责任公司 用于环烯烃潜聚合的单组分阳离子钯前引发剂
CN101213491A (zh) * 2005-06-30 2008-07-02 东丽株式会社 感光性树脂组合物及粘合改良剂
US20090189277A1 (en) * 2002-07-03 2009-07-30 Promerus Llc Photosensitive compositions based on polycyclic polymers for low stress, high temperature films
CN102365341A (zh) * 2009-03-31 2012-02-29 大日本印刷株式会社 碱产生剂、感光性树脂组合物、含有该感光性树脂组合物的图案形成用材料、使用该感光性树脂组合物的图案形成方法以及物品
US20140087293A1 (en) * 2012-09-25 2014-03-27 Promerus, Llc Maleimide containing cycloolefinic polymers and applications thereof
CN104252102A (zh) * 2013-06-28 2014-12-31 住友电木株式会社 负型感光性树脂组合物、固化膜、电子装置和聚合物

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5563011A (en) * 1993-04-21 1996-10-08 Shipley Company Inc. Color filter assembly
JP4054477B2 (ja) * 1998-04-08 2008-02-27 キヤノン株式会社 同一相手に対して複数の通信チャネルを用いた通信を行なうことが可能な通信装置、及びその制御方法
US6849377B2 (en) * 1998-09-23 2005-02-01 E. I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
AU1603101A (en) * 1999-11-17 2001-05-30 E.I. Du Pont De Nemours And Company Nitrile/fluoroalcohol-containing photoresists and associated processes for microlithography
US20150007950A1 (en) * 2011-12-27 2015-01-08 Allure Home Creations Co., Inc. Curtain hanging assembly
JP5803957B2 (ja) * 2013-03-05 2015-11-04 信越化学工業株式会社 パターン形成方法及びレジスト組成物
WO2014176490A1 (en) * 2013-04-26 2014-10-30 Promerus, Llc Photosensitive compositions and applications thereof
JP2015007770A (ja) * 2013-05-29 2015-01-15 住友ベークライト株式会社 感光性樹脂組成物および電子装置
JP6306296B2 (ja) 2013-07-09 2018-04-04 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物およびフレキシブルプリント配線板
WO2015038412A2 (en) * 2013-09-16 2015-03-19 Promerus, Llc Amine treated maleic anhydride polymers with pendent silyl group, compositions and applications thereof
JP2015184325A (ja) * 2014-03-20 2015-10-22 住友ベークライト株式会社 感光性樹脂組成物および電子装置
KR20180088652A (ko) * 2015-11-30 2018-08-06 프로메러스, 엘엘씨 광산발생제 및 염기 함유 영구유전체조성물

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6395451B1 (en) * 1999-09-21 2002-05-28 Hyundai Electronics Industries Co., Ltd. Photoresist composition containing photo base generator with photo acid generator
EP1246013A2 (en) * 2001-03-30 2002-10-02 E.I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
WO2002093263A1 (en) * 2001-05-11 2002-11-21 Clariant International Ltd Photoresist composition for deep ultraviolet lithography
US20090189277A1 (en) * 2002-07-03 2009-07-30 Promerus Llc Photosensitive compositions based on polycyclic polymers for low stress, high temperature films
CN101031595A (zh) * 2003-10-31 2007-09-05 普罗米鲁斯有限责任公司 用于环烯烃潜聚合的单组分阳离子钯前引发剂
CN101213491A (zh) * 2005-06-30 2008-07-02 东丽株式会社 感光性树脂组合物及粘合改良剂
CN102365341A (zh) * 2009-03-31 2012-02-29 大日本印刷株式会社 碱产生剂、感光性树脂组合物、含有该感光性树脂组合物的图案形成用材料、使用该感光性树脂组合物的图案形成方法以及物品
US20140087293A1 (en) * 2012-09-25 2014-03-27 Promerus, Llc Maleimide containing cycloolefinic polymers and applications thereof
CN104252102A (zh) * 2013-06-28 2014-12-31 住友电木株式会社 负型感光性树脂组合物、固化膜、电子装置和聚合物

Also Published As

Publication number Publication date
JP6513208B2 (ja) 2019-05-15
WO2016133795A1 (en) 2016-08-25
TW201634502A (zh) 2016-10-01
US20160238932A1 (en) 2016-08-18
US10634998B2 (en) 2020-04-28
CN107407872A (zh) 2017-11-28
US20180203349A1 (en) 2018-07-19
KR101998338B1 (ko) 2019-10-01
JP2018508824A (ja) 2018-03-29
US10409160B2 (en) 2019-09-10
KR20170117468A (ko) 2017-10-23
US9952507B2 (en) 2018-04-24
TWI652281B (zh) 2019-03-01
US20190369492A1 (en) 2019-12-05

Similar Documents

Publication Publication Date Title
CN107407873B (zh) 含有热碱产生剂的可光成像组合物
US10634998B2 (en) Photoimageable polyolefin compositions containing photobase generators
TWI591087B (zh) 感光組成物及其應用
JP5419614B2 (ja) 水性ベースの現像可能な官能化したノルボルネンポリマーをベースとしたネガ型フィルム
KR102288743B1 (ko) 감광성 조성물, 컬러필터 및 그로부터 유래한 마이크로렌즈
CN104093784B (zh) 低介电可光致成像组合物以及由其制得的电子器件
US11048168B2 (en) Permanent dielectric compositions containing photoacid generator and base
TWI649620B (zh) 含有光產鹼劑的光可成像組成物
KR20180088652A (ko) 광산발생제 및 염기 함유 영구유전체조성물
TW202528839A (zh) 含有不含pfas的多環烯烴聚合物之感光性組成物及由其製成的半導體裝置
CN120936660A (zh) 光敏树脂组合物、绝缘膜和半导体器件

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
TA01 Transfer of patent application right

Effective date of registration: 20200709

Address after: Tokyo, Japan

Applicant after: SUMITOMO BAKELITE Co.,Ltd.

Address before: Ohio, USA

Applicant before: PROMERUS, LLC

TA01 Transfer of patent application right
GR01 Patent grant
GR01 Patent grant