JP6501858B2 - 金属酸化物エッチング液組成物およびエッチング方法 - Google Patents

金属酸化物エッチング液組成物およびエッチング方法 Download PDF

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JP6501858B2
JP6501858B2 JP2017238195A JP2017238195A JP6501858B2 JP 6501858 B2 JP6501858 B2 JP 6501858B2 JP 2017238195 A JP2017238195 A JP 2017238195A JP 2017238195 A JP2017238195 A JP 2017238195A JP 6501858 B2 JP6501858 B2 JP 6501858B2
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acid
etching
metal oxide
oxide containing
etching solution
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JP2018041982A (ja
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拓央 大和田
拓央 大和田
寿和 清水
寿和 清水
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Kanto Chemical Co Inc
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Publication number Priority date Publication date Assignee Title
JP6795543B2 (ja) * 2018-04-27 2020-12-02 株式会社Ｊｏｌｅｄ 半導体装置の製造方法
WO2022050099A1 (ja) * 2020-09-01 2022-03-10 株式会社Adeka エッチング方法
CN119120025A (zh) * 2024-08-02 2024-12-13 湖北兴福电子材料股份有限公司 一种ZnS蚀刻液

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JPH11302876A (ja) * 1998-04-16 1999-11-02 Nippon Sheet Glass Co Ltd 透明導電膜の電極パターン加工方法
JP4248793B2 (ja) * 2002-02-15 2009-04-02 独立行政法人産業技術総合研究所 薄膜太陽電池の製造方法
JP4816250B2 (ja) * 2006-05-25 2011-11-16 三菱瓦斯化学株式会社 エッチング液組成物及びエッチング方法
JP5007907B2 (ja) * 2008-05-09 2012-08-22 株式会社豊田中央研究所 エッチング液及び半導体素子の製造方法

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