JP6492994B2 - 光配向用偏光光照射装置 - Google Patents

光配向用偏光光照射装置 Download PDF

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Publication number
JP6492994B2
JP6492994B2 JP2015119608A JP2015119608A JP6492994B2 JP 6492994 B2 JP6492994 B2 JP 6492994B2 JP 2015119608 A JP2015119608 A JP 2015119608A JP 2015119608 A JP2015119608 A JP 2015119608A JP 6492994 B2 JP6492994 B2 JP 6492994B2
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Japan
Prior art keywords
stage
irradiation
polarized light
unit
alignment
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JP2015119608A
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Japanese (ja)
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JP2017003876A (ja
Inventor
貴章 田中
貴章 田中
亮彦 田内
亮彦 田内
幸信 中川
幸信 中川
祥平 前田
祥平 前田
剛雄 加藤
剛雄 加藤
純 藤岡
純 藤岡
弘喜 日野
弘喜 日野
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Toshiba Lighting and Technology Corp
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Toshiba Lighting and Technology Corp
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Priority to JP2015119608A priority Critical patent/JP6492994B2/ja
Priority to KR1020160010805A priority patent/KR20160146502A/ko
Priority to TW105108646A priority patent/TW201643529A/zh
Priority to CN201620216526.8U priority patent/CN205507314U/zh
Publication of JP2017003876A publication Critical patent/JP2017003876A/ja
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Publication of JP6492994B2 publication Critical patent/JP6492994B2/ja
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  • Physics & Mathematics (AREA)
  • Liquid Crystal (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
JP2015119608A 2015-06-12 2015-06-12 光配向用偏光光照射装置 Expired - Fee Related JP6492994B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2015119608A JP6492994B2 (ja) 2015-06-12 2015-06-12 光配向用偏光光照射装置
KR1020160010805A KR20160146502A (ko) 2015-06-12 2016-01-28 광 배향용 편광광 조사장치
TW105108646A TW201643529A (zh) 2015-06-12 2016-03-21 光配向用偏振光照射裝置
CN201620216526.8U CN205507314U (zh) 2015-06-12 2016-03-21 光取向用偏振光照射装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015119608A JP6492994B2 (ja) 2015-06-12 2015-06-12 光配向用偏光光照射装置

Publications (2)

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JP2017003876A JP2017003876A (ja) 2017-01-05
JP6492994B2 true JP6492994B2 (ja) 2019-04-03

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JP2015119608A Expired - Fee Related JP6492994B2 (ja) 2015-06-12 2015-06-12 光配向用偏光光照射装置

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JP (1) JP6492994B2 (zh)
KR (1) KR20160146502A (zh)
CN (1) CN205507314U (zh)
TW (1) TW201643529A (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107272267A (zh) * 2017-08-10 2017-10-20 武汉华星光电技术有限公司 光配向补正设备及光配向补正调节方法
JP2019101226A (ja) * 2017-12-01 2019-06-24 シャープ株式会社 偏光照射装置、及び、感光膜付き基板の製造方法
CN108761926A (zh) * 2018-05-09 2018-11-06 深圳市华星光电技术有限公司 配向微观检测设备及配向检测方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4451374B2 (ja) * 2005-10-17 2010-04-14 住友重機械工業株式会社 ステージ装置
JP4887165B2 (ja) 2007-02-02 2012-02-29 富士フイルム株式会社 描画装置及び方法
NL1036742A1 (nl) * 2008-04-18 2009-10-20 Asml Netherlands Bv Stage system calibration method, stage system and lithographic apparatus comprising such stage system.
NL2006981A (en) * 2010-07-26 2012-01-30 Asml Netherlands Bv Position control system, lithographic apparatus, and method to control a position of a movable object.
JP2012145786A (ja) * 2011-01-13 2012-08-02 Hitachi High-Technologies Corp 露光装置及び露光方法
US9366908B2 (en) * 2013-06-03 2016-06-14 Shenzhen China Star Optoelectronics Technology Co., Ltd Optical alignment device and the method thereof
JP5862616B2 (ja) * 2013-07-17 2016-02-16 ウシオ電機株式会社 光配向用偏光光照射装置及び光配向用偏光光照射方法

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CN205507314U (zh) 2016-08-24
JP2017003876A (ja) 2017-01-05
KR20160146502A (ko) 2016-12-21
TW201643529A (zh) 2016-12-16

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