JP6491216B2 - 対流加熱及び放射加熱を用いた炉 - Google Patents

対流加熱及び放射加熱を用いた炉 Download PDF

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Publication number
JP6491216B2
JP6491216B2 JP2016544761A JP2016544761A JP6491216B2 JP 6491216 B2 JP6491216 B2 JP 6491216B2 JP 2016544761 A JP2016544761 A JP 2016544761A JP 2016544761 A JP2016544761 A JP 2016544761A JP 6491216 B2 JP6491216 B2 JP 6491216B2
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Japan
Prior art keywords
temperature
temperature controlled
carrier element
controlled part
furnace
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Expired - Fee Related
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JP2016544761A
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English (en)
Japanese (ja)
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JP2016536557A (ja
JP2016536557A5 (https=
Inventor
ロバート エブナー
ロバート エブナー
バーナード ジョーンズ
バーナード ジョーンズ
アルフレド スプリッツェンバーガー
アルフレド スプリッツェンバーガー
ウーヴェ ケイム
ウーヴェ ケイム
Original Assignee
エーディーピーヴィー シーアイジーエス リミテッド
エーディーピーヴィー シーアイジーエス リミテッド
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Publication of JP2016536557A publication Critical patent/JP2016536557A/ja
Publication of JP2016536557A5 publication Critical patent/JP2016536557A5/ja
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30—Details, accessories or equipment specially adapted for furnaces of these types
    • F27B9/40—Arrangements of controlling or monitoring devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/06—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated
    • F27B9/062—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated electrically heated
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any of groups F27B1/00 - F27B15/00
    • F27B17/0016—Chamber type furnaces
    • F27B17/0025—Chamber type furnaces specially adapted for treating semiconductor wafers
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/14—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment
    • F27B9/20—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/14—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment
    • F27B9/20—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path
    • F27B9/24—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path being carried by a conveyor
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/28—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity for treating continuous lengths of work
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0434—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0602—Temperature monitoring
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0606—Position monitoring, e.g. misposition detection or presence detection
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
    • H10P72/3314—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/36—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations using air tracks
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D19/00—Arrangements of controlling devices
    • F27D2019/0028—Regulation
    • F27D2019/0071—Regulation using position sensors

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Tunnel Furnaces (AREA)
  • Furnace Details (AREA)
  • Furnace Charging Or Discharging (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
JP2016544761A 2013-09-27 2014-09-25 対流加熱及び放射加熱を用いた炉 Expired - Fee Related JP6491216B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB1317170.7A GB201317170D0 (en) 2013-09-27 2013-09-27 Furnace with a convection and radiation heating
GB1317170.7 2013-09-27
PCT/EP2014/070580 WO2015044320A1 (en) 2013-09-27 2014-09-25 Furnace with a convection and radiation heating

Publications (3)

Publication Number Publication Date
JP2016536557A JP2016536557A (ja) 2016-11-24
JP2016536557A5 JP2016536557A5 (https=) 2017-04-13
JP6491216B2 true JP6491216B2 (ja) 2019-03-27

Family

ID=49553514

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016544761A Expired - Fee Related JP6491216B2 (ja) 2013-09-27 2014-09-25 対流加熱及び放射加熱を用いた炉

Country Status (7)

Country Link
US (1) US9970709B2 (https=)
EP (1) EP3049744B1 (https=)
JP (1) JP6491216B2 (https=)
KR (1) KR20160068820A (https=)
CN (1) CN107110602B (https=)
GB (1) GB201317170D0 (https=)
WO (1) WO2015044320A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB201317194D0 (https=) * 2013-09-27 2013-11-13 Ebner Ind Ofenbau
JP7477754B2 (ja) * 2020-03-30 2024-05-02 日本製鉄株式会社 加熱炉および加熱方法
CN117438332A (zh) * 2022-07-14 2024-01-23 长鑫存储技术有限公司 加热装置和方法

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61149781A (ja) * 1984-12-24 1986-07-08 日立金属株式会社 雰囲気焼結用連続炉
FR2579501B1 (fr) * 1985-03-30 1990-03-02 Neitz Heinrich Verwaltung Procede et dispositif pour le brasage de pieces en aluminium
US4767324A (en) * 1987-05-26 1988-08-30 General Electric Company Transition section for muffle furnace
JPH01167582A (ja) * 1987-12-23 1989-07-03 Shinagawa Refract Co Ltd 被熱物の浮上・輸送焼成炉およびその焼成法
JP2910061B2 (ja) * 1989-06-30 1999-06-23 松下電器産業株式会社 焼成炉
JP4090585B2 (ja) * 1997-08-04 2008-05-28 松下電器産業株式会社 対象物体の加熱処理方法およびそのための装置
US6091055A (en) * 1997-08-04 2000-07-18 Matsushita Electric Industrial Co., Ltd. Method of heat treating object and apparatus for the same
JPH11281259A (ja) * 1998-03-27 1999-10-15 Tokai Konetsu Kogyo Co Ltd 連続式雰囲気炉
US5915958A (en) * 1998-06-18 1999-06-29 Ross Air Systems, Inc. Convertible apparatus for heat treating materials
JP2000128346A (ja) * 1998-08-20 2000-05-09 Matsushita Electric Ind Co Ltd 浮揚装置、浮揚搬送装置および熱処理装置
US6336775B1 (en) * 1998-08-20 2002-01-08 Matsushita Electric Industrial Co., Ltd. Gas floating apparatus, gas floating-transporting apparatus, and thermal treatment apparatus
JP2001066751A (ja) * 1999-02-16 2001-03-16 Fuji Photo Film Co Ltd 画像形成装置
JP3547724B2 (ja) * 2001-09-25 2004-07-28 沖電気工業株式会社 レジストパターンのベーク装置及びレジストパターンの形成方法
JP2003329372A (ja) * 2002-05-14 2003-11-19 Nittetsu Elex Co Ltd 連続処理設備
JP4741307B2 (ja) * 2005-05-20 2011-08-03 富士フイルム株式会社 加熱装置及び加熱方法
JP2008020112A (ja) * 2006-07-12 2008-01-31 Fujitsu Hitachi Plasma Display Ltd 加熱処理方法および装置
CN101257060B (zh) * 2008-03-05 2012-05-23 常州亿晶光电科技有限公司 太阳能电池烧结炉温区隔断装置
US20100127418A1 (en) * 2008-11-25 2010-05-27 Ronald Alan Davidson Methods For Continuous Firing Of Shaped Bodies And Roller Hearth Furnaces Therefor
CN201331256Y (zh) * 2008-12-15 2009-10-21 合肥恒力电子技术开发公司 一种高温炉管气隔断装置
DE102009037299A1 (de) * 2009-08-14 2011-08-04 Leybold Optics GmbH, 63755 Vorrichtung und Behandlungskammer zur thermischen Behandlung von Substraten
US9163877B2 (en) * 2011-06-07 2015-10-20 Berndorf Band Gmbh Conveyor oven

Also Published As

Publication number Publication date
GB201317170D0 (en) 2013-11-06
JP2016536557A (ja) 2016-11-24
CN107110602B (zh) 2019-11-15
EP3049744B1 (en) 2018-10-24
CN107110602A (zh) 2017-08-29
KR20160068820A (ko) 2016-06-15
US20160290719A1 (en) 2016-10-06
WO2015044320A1 (en) 2015-04-02
US9970709B2 (en) 2018-05-15
EP3049744A1 (en) 2016-08-03

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