JP6481168B2 - 蛍光ｘ線分析システム - Google Patents

蛍光ｘ線分析システム Download PDF

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Publication number
JP6481168B2
JP6481168B2 JP2015081884A JP2015081884A JP6481168B2 JP 6481168 B2 JP6481168 B2 JP 6481168B2 JP 2015081884 A JP2015081884 A JP 2015081884A JP 2015081884 A JP2015081884 A JP 2015081884A JP 6481168 B2 JP6481168 B2 JP 6481168B2
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Japan
Prior art keywords
substrate
sample
ray
fluorescent
measurement
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JP2015081884A
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English (en)
Japanese (ja)
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JP2016200537A (ja
JP2016200537A5 (enExample
Inventor
基行 山上
基行 山上
裕幸 川上
裕幸 川上
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Rigaku Corp
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Rigaku Corp
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Priority to JP2015081884A priority Critical patent/JP6481168B2/ja
Priority to US15/094,142 priority patent/US9989484B2/en
Publication of JP2016200537A publication Critical patent/JP2016200537A/ja
Publication of JP2016200537A5 publication Critical patent/JP2016200537A5/ja
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Publication of JP6481168B2 publication Critical patent/JP6481168B2/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/307—Accessories, mechanical or electrical features cuvettes-sample holders
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/60—Specific applications or type of materials
    • G01N2223/652—Specific applications or type of materials impurities, foreign matter, trace amounts

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2015081884A 2015-04-13 2015-04-13 蛍光ｘ線分析システム Active JP6481168B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2015081884A JP6481168B2 (ja) 2015-04-13 2015-04-13 蛍光ｘ線分析システム
US15/094,142 US9989484B2 (en) 2015-04-13 2016-04-08 X-ray fluorescence analyzing system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015081884A JP6481168B2 (ja) 2015-04-13 2015-04-13 蛍光ｘ線分析システム

Publications (3)

Publication Number Publication Date
JP2016200537A JP2016200537A (ja) 2016-12-01
JP2016200537A5 JP2016200537A5 (enExample) 2018-05-10
JP6481168B2 true JP6481168B2 (ja) 2019-03-13

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ID=57111711

Family Applications (1)

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JP2015081884A Active JP6481168B2 (ja) 2015-04-13 2015-04-13 蛍光ｘ線分析システム

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US (1) US9989484B2 (enExample)
JP (1) JP6481168B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108885186B (zh) * 2017-03-07 2019-11-12 株式会社理学 样品回收装置、样品回收方法及使用它们的荧光x射线分析装置
JP7302504B2 (ja) * 2020-02-27 2023-07-04 株式会社島津製作所 蛍光ｘ線分析装置
CN113960091A (zh) * 2021-10-28 2022-01-21 马鞍山钢铁股份有限公司 一种有色金属自动检测系统及自动检测方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2630249B2 (ja) * 1994-02-16 1997-07-16 日本電気株式会社 全反射蛍光ｘ線分析装置
JP2001343339A (ja) * 2000-06-02 2001-12-14 Rigaku Industrial Co 分析位置設定手段を備えた蛍光ｘ線分析方法およびその装置
JP3603278B2 (ja) * 2001-09-06 2004-12-22 理学電機工業株式会社 蛍光ｘ線分析システムおよびそれに用いるプログラム
JP3584262B2 (ja) * 2001-09-18 2004-11-04 理学電機工業株式会社 蛍光ｘ線分析用試料前処理システムおよびそれを備えた蛍光ｘ線分析システム
JP2003149181A (ja) 2001-11-12 2003-05-21 Rigaku Industrial Co 蛍光ｘ線分析方法および装置
JP4377755B2 (ja) * 2004-06-15 2009-12-02 株式会社東芝 全反射蛍光ｘ線分析方法
JP5092052B1 (ja) 2011-11-14 2012-12-05 株式会社リガク Ｘ線分析装置および方法

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Publication number Publication date
US20160299089A1 (en) 2016-10-13
US9989484B2 (en) 2018-06-05
JP2016200537A (ja) 2016-12-01

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