JP6474492B2 - 半導体圧力センサ - Google Patents
半導体圧力センサ Download PDFInfo
- Publication number
- JP6474492B2 JP6474492B2 JP2017530286A JP2017530286A JP6474492B2 JP 6474492 B2 JP6474492 B2 JP 6474492B2 JP 2017530286 A JP2017530286 A JP 2017530286A JP 2017530286 A JP2017530286 A JP 2017530286A JP 6474492 B2 JP6474492 B2 JP 6474492B2
- Authority
- JP
- Japan
- Prior art keywords
- resistor
- membrane
- output node
- node
- pressure sensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L19/00—Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
- G01L19/04—Means for compensating for effects of changes of temperature, i.e. other than electric compensation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L19/00—Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
- G01L19/02—Arrangements for preventing, or for compensating for, effects of inclination or acceleration of the measuring device; Zero-setting means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0051—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance
- G01L9/0052—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements
- G01L9/0054—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements integral with a semiconducting diaphragm
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0051—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance
- G01L9/0052—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements
- G01L9/0055—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements bonded on a diaphragm
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/02—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in ohmic resistance, e.g. of potentiometers, electric circuits therefor, e.g. bridges, amplifiers or signal conditioning
- G01L9/06—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in ohmic resistance, e.g. of potentiometers, electric circuits therefor, e.g. bridges, amplifiers or signal conditioning of piezo-resistive devices
- G01L9/065—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in ohmic resistance, e.g. of potentiometers, electric circuits therefor, e.g. bridges, amplifiers or signal conditioning of piezo-resistive devices with temperature compensating means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Measuring Fluid Pressure (AREA)
- Pressure Sensors (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EPPCT/EP2014/077230 | 2014-12-10 | ||
| PCT/EP2014/077230 WO2015086680A1 (en) | 2013-12-11 | 2014-12-10 | Semiconductor pressure sensor |
| EP15171268.4A EP3032235B1 (en) | 2014-12-10 | 2015-06-09 | Semiconductor pressure sensor |
| EP15171268.4 | 2015-06-09 | ||
| PCT/EP2015/079010 WO2016091896A1 (en) | 2014-12-10 | 2015-12-08 | Semiconductor pressure sensor |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018504588A JP2018504588A (ja) | 2018-02-15 |
| JP2018504588A5 JP2018504588A5 (enExample) | 2018-09-27 |
| JP6474492B2 true JP6474492B2 (ja) | 2019-02-27 |
Family
ID=53274454
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017530286A Expired - Fee Related JP6474492B2 (ja) | 2014-12-10 | 2015-12-08 | 半導体圧力センサ |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP3032235B1 (enExample) |
| JP (1) | JP6474492B2 (enExample) |
| KR (1) | KR20170095218A (enExample) |
| CN (1) | CN107003198B (enExample) |
| WO (1) | WO2016091896A1 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020058091A1 (en) | 2018-09-18 | 2020-03-26 | Unilever Plc | Method of chemical monitoring the fat removal from surfaces |
| JP2020514678A (ja) * | 2017-11-28 | 2020-05-21 | デヤン エレクトリック カンパニー リミテッド | 半導体圧力センサ |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3358309B1 (en) | 2017-02-06 | 2019-04-24 | Melexis Technologies SA | Method and circuit for biasing and readout of resistive sensor structure |
| US10704969B2 (en) | 2017-11-21 | 2020-07-07 | The Boeing Company | Stress sensor |
| CN109374158B (zh) * | 2018-12-14 | 2024-08-13 | 华景传感科技(无锡)有限公司 | 一种压力传感器 |
| CN113227954B (zh) | 2018-12-20 | 2025-01-24 | 深圳纽迪瑞科技开发有限公司 | 压力感应装置、压力感应方法及电子终端 |
| US11189536B2 (en) | 2018-12-31 | 2021-11-30 | Micron Technology, Inc. | Method and apparatus for on-chip stress detection |
| DE102021200720B4 (de) | 2021-01-27 | 2023-08-03 | Infineon Technologies Ag | Transistorbasierter stress-sensor und verfahren zum ermitteln einer gradienten-kompensierten mechanischen spannungskomponente |
| EP4421468B1 (en) * | 2023-02-27 | 2025-02-12 | Melexis Technologies NV | Pressure sensor resistor configuration for stress compensation |
| EP4567393A1 (en) * | 2023-12-04 | 2025-06-11 | TE Connectivity Solutions GmbH | Piezoresistive sensor element and piezoresistive pressure sensor with minimized long-term drift |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5217780A (en) * | 1975-07-04 | 1977-02-09 | Hitachi Ltd | Pressure convertor with semi-conductor elements |
| CA1186163A (en) | 1982-01-04 | 1985-04-30 | James B. Starr | Semiconductor pressure transducer |
| JPS60128673A (ja) | 1983-12-16 | 1985-07-09 | Hitachi Ltd | 半導体感圧装置 |
| US4777826A (en) * | 1985-06-20 | 1988-10-18 | Rosemount Inc. | Twin film strain gauge system |
| WO1996022515A1 (en) * | 1995-01-19 | 1996-07-25 | Honeywell Inc. | Apparatus for detection of a diaphragm rupture in a pressure sensor |
| JPH08279621A (ja) * | 1995-04-03 | 1996-10-22 | Motorola Inc | 平衡圧力センサとその方法 |
| JP4568982B2 (ja) * | 2000-10-06 | 2010-10-27 | 株式会社デンソー | 物理量検出装置 |
| JP3891037B2 (ja) * | 2002-05-21 | 2007-03-07 | 株式会社デンソー | 半導体圧力センサおよび半導体圧力センサ用の半導体ウェハ |
| JP3915715B2 (ja) * | 2003-03-07 | 2007-05-16 | 株式会社デンソー | 半導体圧力センサ |
| ATE470844T1 (de) * | 2004-09-24 | 2010-06-15 | Grundfos As | Drucksensor |
-
2015
- 2015-06-09 EP EP15171268.4A patent/EP3032235B1/en active Active
- 2015-12-08 WO PCT/EP2015/079010 patent/WO2016091896A1/en not_active Ceased
- 2015-12-08 CN CN201580067525.XA patent/CN107003198B/zh active Active
- 2015-12-08 JP JP2017530286A patent/JP6474492B2/ja not_active Expired - Fee Related
- 2015-12-08 KR KR1020177015587A patent/KR20170095218A/ko not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020514678A (ja) * | 2017-11-28 | 2020-05-21 | デヤン エレクトリック カンパニー リミテッド | 半導体圧力センサ |
| WO2020058091A1 (en) | 2018-09-18 | 2020-03-26 | Unilever Plc | Method of chemical monitoring the fat removal from surfaces |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2018504588A (ja) | 2018-02-15 |
| CN107003198A (zh) | 2017-08-01 |
| CN107003198B (zh) | 2020-06-26 |
| EP3032235B1 (en) | 2017-09-20 |
| WO2016091896A1 (en) | 2016-06-16 |
| EP3032235A1 (en) | 2016-06-15 |
| KR20170095218A (ko) | 2017-08-22 |
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| A524 | Written submission of copy of amendment under article 19 pct |
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| A01 | Written decision to grant a patent or to grant a registration (utility model) |
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| A61 | First payment of annual fees (during grant procedure) |
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| LAPS | Cancellation because of no payment of annual fees |