JP6451893B2 - 容量素子 - Google Patents
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- JP6451893B2 JP6451893B2 JP2018505398A JP2018505398A JP6451893B2 JP 6451893 B2 JP6451893 B2 JP 6451893B2 JP 2018505398 A JP2018505398 A JP 2018505398A JP 2018505398 A JP2018505398 A JP 2018505398A JP 6451893 B2 JP6451893 B2 JP 6451893B2
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- 239000004020 conductor Substances 0.000 claims description 100
- 239000011229 interlayer Substances 0.000 claims description 66
- 239000010410 layer Substances 0.000 claims description 66
- 239000000758 substrate Substances 0.000 claims description 26
- 239000010408 film Substances 0.000 description 87
- 239000003990 capacitor Substances 0.000 description 26
- 230000001681 protective effect Effects 0.000 description 26
- 238000000034 method Methods 0.000 description 17
- ORQBXQOJMQIAOY-UHFFFAOYSA-N nobelium Chemical compound [No] ORQBXQOJMQIAOY-UHFFFAOYSA-N 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 9
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- 238000010586 diagram Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 5
- 229910000679 solder Inorganic materials 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 229920002577 polybenzoxazole Polymers 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
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- 238000001755 magnetron sputter deposition Methods 0.000 description 3
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- -1 (Ba Chemical class 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
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- 238000001020 plasma etching Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910004205 SiNX Inorganic materials 0.000 description 1
- 229910002367 SrTiO Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 238000000224 chemical solution deposition Methods 0.000 description 1
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- 238000001312 dry etching Methods 0.000 description 1
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- 230000005621 ferroelectricity Effects 0.000 description 1
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- 229910010272 inorganic material Inorganic materials 0.000 description 1
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- 229910052751 metal Inorganic materials 0.000 description 1
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- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
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- 239000009719 polyimide resin Substances 0.000 description 1
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- 229910052710 silicon Inorganic materials 0.000 description 1
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- 238000004804 winding Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/33—Thin- or thick-film capacitors
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
- G06K19/00—Record carriers for use with machines and with at least a part designed to carry digital markings
- G06K19/06—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code
- G06K19/067—Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components
- G06K19/07—Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components with integrated circuit chips
- G06K19/0723—Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components with integrated circuit chips the record carrier comprising an arrangement for non-contact communication, e.g. wireless communication circuits on transponder cards, non-contact smart cards or RFIDs
- G06K19/0726—Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components with integrated circuit chips the record carrier comprising an arrangement for non-contact communication, e.g. wireless communication circuits on transponder cards, non-contact smart cards or RFIDs the arrangement including a circuit for tuning the resonance frequency of an antenna on the record carrier
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G2/00—Details of capacitors not covered by a single one of groups H01G4/00-H01G11/00
- H01G2/02—Mountings
- H01G2/06—Mountings specially adapted for mounting on a printed-circuit support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G2/00—Details of capacitors not covered by a single one of groups H01G4/00-H01G11/00
- H01G2/10—Housing; Encapsulation
- H01G2/103—Sealings, e.g. for lead-in wires; Covers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/228—Terminals
- H01G4/236—Terminals leading through the housing, i.e. lead-through
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/38—Multiple capacitors, i.e. structural combinations of fixed capacitors
- H01G4/385—Single unit multiple capacitors, e.g. dual capacitor in one coil
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/40—Structural combinations of fixed capacitors with other electric elements, the structure mainly consisting of a capacitor, e.g. RC combinations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G5/00—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
- H01G5/01—Details
- H01G5/011—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/38—Multiple capacitors, i.e. structural combinations of fixed capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/01—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate comprising only passive thin-film or thick-film elements formed on a common insulating substrate
- H01L27/016—Thin-film circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/0805—Capacitors only
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- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Networks & Wireless Communication (AREA)
- Computer Hardware Design (AREA)
- Theoretical Computer Science (AREA)
- Semiconductor Integrated Circuits (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Description
X−Y直交座標系においてX軸方向およびY軸方向に拡がる面を有する基板と、
前記基板の前記面に設けられ、前記Y軸方向に隣接配置された、第1下部電極および第2下部電極と、
前記第1下部電極上に形成された第1誘電体層と、
前記第2下部電極上に形成された第2誘電体層と、
前記第1誘電体層上に形成され、前記X軸方向に隣接配置された、第1上部電極および第2上部電極と、
前記第2誘電体層上に形成され、前記X軸方向に隣接配置された、第3上部電極および第4上部電極と、
前記第1上部電極に接する第1層間導体と、
前記第2上部電極に接する第2層間導体と、
前記第3上部電極に接する第3層間導体と、
前記第4上部電極に接する第4層間導体と、
前記第2層間導体と前記第4層間導体とを接続する第1接続導体と、
を有し、
前記第3上部電極は前記第1上部電極に対して前記Y軸方向に隣接配置され、前記第4上部電極は前記第2上部電極に対して前記Y軸方向に隣接配置され、前記第1接続導体は前記Y軸方向に延伸することを特徴とする。
図1(A)は第1の実施形態に係る容量素子101Aの主要部の平面図であり、図1(B)は図1(A)におけるB−B部分の断面図である。
第2の実施形態では、バイアス電圧印加回路を備える可変容量素子の例を示す。
第3の実施形態では、上記可変容量素子を備える通信回路について示す。
C2…第2容量形成部
C3…第3容量形成部
C4…第4容量形成部
C11,C12,C20,C21,C22…キャパシタ
EE…外部接続電極
FS1,FS3…強誘電体膜
L11,L12…インダクタ
PC1…耐湿保護膜
PC2…有機保護膜
R11〜R20…抵抗素子
SB…半田ボール
SR1,SR2…層間絶縁膜
TI1,TI2…配線膜
1…基板
2…実装用再配線基板
3…再配線用電極
4…実装用端子
9…抵抗素子
11…RFIC
13…アンテナコイル
17A,17B…ESD保護素子
21…第1下部電極
22…第2下部電極
31,31A,31B…第1誘電体層
32,32A,32B…第2誘電体層
41…第1上部電極
42…第2上部電極
43…第3上部電極
44…第4上部電極
51…第1層間導体
52…第2層間導体
53…第3層間導体
54…第4層間導体
60…接続導体
61…第1接続導体
62…第2接続導体
71…第1外部電極
72…第2外部電極
81〜87…導体パターン
101A,101B…容量素子
102…可変容量素子
Claims (7)
- X−Y直交座標系においてX軸方向およびY軸方向に拡がる面を有する基板と、
前記基板の前記面に設けられ、前記Y軸方向に隣接配置された、第1下部電極および第2下部電極と、
前記第1下部電極上に形成された第1誘電体層と、
前記第2下部電極上に形成された第2誘電体層と、
前記第1誘電体層上に形成され、前記X軸方向に隣接配置された、第1上部電極および第2上部電極と、
前記第2誘電体層上に形成され、前記X軸方向に隣接配置された、第3上部電極および第4上部電極と、
前記第1上部電極の中央部に接する第1層間導体と、
前記第2上部電極の中央部に接する第2層間導体と、
前記第3上部電極の中央部に接する第3層間導体と、
前記第4上部電極の中央部に接する第4層間導体と、
前記第2層間導体と前記第4層間導体とを接続する第1接続導体と、
を有し、
前記第3上部電極は前記第1上部電極に対して前記Y軸方向に隣接配置され、前記第4上部電極は前記第2上部電極に対して前記Y軸方向に隣接配置され、前記第1接続導体は前記Y軸方向に延伸する、容量素子。 - 前記第1上部電極は前記第1層間導体の接する位置から外縁までの長さの最小値に対する最大値の比が2未満であり、
前記第2上部電極は前記第2層間導体の接する位置から外縁までの長さの最小値に対する最大値の比が2未満であり、
前記第3上部電極は前記第3層間導体の接する位置から外縁までの長さの最小値に対する最大値の比が2未満であり、
前記第4上部電極は前記第4層間導体の接する位置から外縁までの長さの最小値に対する最大値の比が2未満である、請求項1に記載の容量素子。 - 前記第1上部電極、前記第2上部電極、前記第3上部電極、および前記第4上部電極は、それぞれの前記X軸方向の幅と前記Y軸方向の幅が実質的に等しい、請求項2に記載の容量素子。
- 前記第1接続導体の電気抵抗値は、前記第1上部電極、前記第2上部電極、前記第3上部電極、前記第4上部電極、前記第1下部電極および第2下部電極の抵抗値より低い、請求項1から3のいずれかに記載の容量素子。
- 前記第1下部電極、前記第1上部電極、前記第2上部電極、前記第1層間導体および前記第2層間導体の組と、前記第2下部電極、前記第3上部電極、前記第4上部電極、前記第3層間導体および前記第4層間導体の組は前記Y軸方向に交互に配置され、
前記第1接続導体とは前記X軸方向に隣接しない位置で、前記Y軸方向に延伸し、前記第3上部電極と当該第3上部電極に隣接する前記第1上部電極とを接続する第2接続導体を備える、請求項1から4のいずれかに記載の容量素子。 - 前記第2接続導体の電気抵抗値は、前記第1上部電極、前記第2上部電極、前記第3上部電極、前記第4上部電極、前記第1下部電極および前記第2下部電極の抵抗値より低い、請求項5に記載の容量素子。
- 前記第1誘電体層および前記第2誘電体層は強誘電体の層であり、
前記第1下部電極と前記第1上部電極との間、前記第1下部電極と前記第2上部電極との間、前記第2下部電極と前記第3上部電極との間、および前記第2下部電極と前記第4上部電極との間にそれぞれ印加するバイアス電圧経路を構成する抵抗素子を前記基板に備えた、請求項1から6のいずれかに記載の容量素子。
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JP7120941B2 (ja) * | 2018-10-29 | 2022-08-17 | 京セラ株式会社 | Rfidタグ用基板、rfidタグおよびrfidシステム |
KR20200089059A (ko) * | 2019-01-16 | 2020-07-24 | 삼성전기주식회사 | 기판 배선 쇼트 검출 장치 및 방법 |
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JP2752832B2 (ja) * | 1992-02-24 | 1998-05-18 | 日本電気アイシーマイコンシステム株式会社 | 半導体集積回路装置 |
JP4535817B2 (ja) | 2003-09-26 | 2010-09-01 | 京セラ株式会社 | 薄膜コンデンサ、薄膜コンデンサアレイおよび電子部品 |
US7449772B2 (en) | 2006-05-19 | 2008-11-11 | Casio Computer Co., Ltd. | Chip-type electronic component including thin-film circuit elements |
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JP4738299B2 (ja) * | 2006-09-20 | 2011-08-03 | 富士通株式会社 | キャパシタ、その製造方法、および電子基板 |
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JP5314873B2 (ja) * | 2007-10-05 | 2013-10-16 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
WO2011010638A1 (ja) * | 2009-07-22 | 2011-01-27 | 株式会社村田製作所 | 誘電体薄膜素子及びその製造方法 |
KR101358939B1 (ko) * | 2012-05-23 | 2014-02-06 | 한국과학기술연구원 | 고밀도 실장용 박막 콘덴서, 그 제조방법 및 고밀도 실장 기판 |
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