JP6448279B2 - 真空蒸着装置 - Google Patents

真空蒸着装置 Download PDF

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Publication number
JP6448279B2
JP6448279B2 JP2014200860A JP2014200860A JP6448279B2 JP 6448279 B2 JP6448279 B2 JP 6448279B2 JP 2014200860 A JP2014200860 A JP 2014200860A JP 2014200860 A JP2014200860 A JP 2014200860A JP 6448279 B2 JP6448279 B2 JP 6448279B2
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film thickness
organic material
crystal
vapor deposition
film
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JP2014200860A
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English (en)
Japanese (ja)
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JP2016069694A (ja
JP2016069694A5 (enExample
Inventor
博之 田村
博之 田村
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Canon Tokki Corp
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Canon Tokki Corp
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Priority to JP2014200860A priority Critical patent/JP6448279B2/ja
Priority to TW104126707A priority patent/TWI681066B/zh
Priority to KR1020150131559A priority patent/KR101968798B1/ko
Priority to CN201510607517.1A priority patent/CN105463377B/zh
Publication of JP2016069694A publication Critical patent/JP2016069694A/ja
Publication of JP2016069694A5 publication Critical patent/JP2016069694A5/ja
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  • Physical Vapour Deposition (AREA)
  • Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
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JP2014200860A 2014-09-30 2014-09-30 真空蒸着装置 Active JP6448279B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2014200860A JP6448279B2 (ja) 2014-09-30 2014-09-30 真空蒸着装置
TW104126707A TWI681066B (zh) 2014-09-30 2015-08-17 真空蒸鍍裝置
KR1020150131559A KR101968798B1 (ko) 2014-09-30 2015-09-17 진공 증착 장치
CN201510607517.1A CN105463377B (zh) 2014-09-30 2015-09-22 真空蒸镀装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014200860A JP6448279B2 (ja) 2014-09-30 2014-09-30 真空蒸着装置

Publications (3)

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JP2016069694A JP2016069694A (ja) 2016-05-09
JP2016069694A5 JP2016069694A5 (enExample) 2017-11-09
JP6448279B2 true JP6448279B2 (ja) 2019-01-09

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JP2014200860A Active JP6448279B2 (ja) 2014-09-30 2014-09-30 真空蒸着装置

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JP (1) JP6448279B2 (enExample)
KR (1) KR101968798B1 (enExample)
CN (1) CN105463377B (enExample)
TW (1) TWI681066B (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180067463A (ko) * 2016-10-25 2018-06-20 어플라이드 머티어리얼스, 인코포레이티드 증착 레이트를 측정하기 위한 측정 조립체, 증발 소스, 증착 장치, 및 이를 위한 방법
US10763143B2 (en) * 2017-08-18 2020-09-01 Applied Materials, Inc. Processing tool having a monitoring device
KR101870581B1 (ko) * 2017-09-29 2018-06-22 캐논 톡키 가부시키가이샤 수정진동자의 수명 판정방법, 막두께 측정장치, 성막방법, 성막장치, 및 전자 디바이스 제조방법
JP7301578B2 (ja) * 2019-03-29 2023-07-03 キヤノントッキ株式会社 成膜装置及び成膜方法
CN109930112A (zh) * 2019-04-15 2019-06-25 湖畔光电科技（江苏）有限公司 一种蒸镀腔体结构
TWI701641B (zh) * 2019-10-01 2020-08-11 龍翩真空科技股份有限公司 無線傳輸薄膜厚度監控裝置
CN113302332B (zh) * 2019-10-21 2023-09-08 株式会社爱发科 成膜装置
CN111829428B (zh) * 2020-06-17 2022-02-15 华中科技大学 一种双石英晶振膜厚控制仪及误差校正方法
KR20220011924A (ko) * 2020-07-22 2022-02-03 주식회사 엘지화학 실리콘계 코팅 조성물 및 이를 포함하는 실리콘계 이형필름
JP2023072407A (ja) * 2021-11-12 2023-05-24 キヤノントッキ株式会社 成膜量測定装置、成膜装置、成膜量測定方法、成膜方法、及び電子デバイスの製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4233644B2 (ja) 1998-09-22 2009-03-04 株式会社アルバック 膜厚モニター用水晶振動子
JP2005325400A (ja) * 2004-05-13 2005-11-24 Seiko Epson Corp 真空蒸着装置及び薄膜形成方法
KR20120023273A (ko) * 2010-09-01 2012-03-13 (주)알파플러스 셔터를 이용하는 진공증착막의 두께 모니터링 방법 및 이 방법을 채용하는 진공증착장치
JP5854731B2 (ja) * 2010-11-04 2016-02-09 キヤノン株式会社 成膜装置及びこれを用いた成膜方法
TW201337013A (zh) * 2012-03-12 2013-09-16 Hitachi High Tech Corp 蒸發源裝置及真空蒸鍍裝置及有機ｅｌ顯示裝置之製造方法
JP2014065942A (ja) * 2012-09-26 2014-04-17 Hitachi High-Technologies Corp 真空蒸着装置
JP2014070238A (ja) * 2012-09-28 2014-04-21 Hitachi High-Technologies Corp 真空蒸着装置及びその蒸着方法
CN103469172B (zh) * 2013-08-31 2015-08-05 上海膜林科技有限公司 石英晶体镀膜厚度控制方法及石英晶体镀膜装置
JP6223275B2 (ja) * 2014-05-15 2017-11-01 キヤノントッキ株式会社 水晶発振式膜厚計

Also Published As

Publication number Publication date
CN105463377A (zh) 2016-04-06
CN105463377B (zh) 2019-08-23
KR101968798B1 (ko) 2019-04-12
TWI681066B (zh) 2020-01-01
KR20160038746A (ko) 2016-04-07
JP2016069694A (ja) 2016-05-09
TW201627514A (zh) 2016-08-01

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