JP6385899B2 - Ｔｅｍ試料取付け構造 - Google Patents

Ｔｅｍ試料取付け構造 Download PDF

Info

Publication number
JP6385899B2
JP6385899B2 JP2015142246A JP2015142246A JP6385899B2 JP 6385899 B2 JP6385899 B2 JP 6385899B2 JP 2015142246 A JP2015142246 A JP 2015142246A JP 2015142246 A JP2015142246 A JP 2015142246A JP 6385899 B2 JP6385899 B2 JP 6385899B2
Authority
JP
Japan
Prior art keywords
sample
rotating
needle
orthogonal
angles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2015142246A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016025085A (ja
JP2016025085A5 (enExample
Inventor
デイヴィッド・フォード
Original Assignee
エフ・イ−・アイ・カンパニー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by エフ・イ−・アイ・カンパニー filed Critical エフ・イ−・アイ・カンパニー
Publication of JP2016025085A publication Critical patent/JP2016025085A/ja
Publication of JP2016025085A5 publication Critical patent/JP2016025085A5/ja
Application granted granted Critical
Publication of JP6385899B2 publication Critical patent/JP6385899B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20207—Tilt
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20214—Rotation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/226—Image reconstruction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2015142246A 2014-07-21 2015-07-16 Ｔｅｍ試料取付け構造 Expired - Fee Related JP6385899B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201462027035P 2014-07-21 2014-07-21
US62/027,035 2014-07-21

Publications (3)

Publication Number Publication Date
JP2016025085A JP2016025085A (ja) 2016-02-08
JP2016025085A5 JP2016025085A5 (enExample) 2017-11-24
JP6385899B2 true JP6385899B2 (ja) 2018-09-05

Family

ID=55075144

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015142246A Expired - Fee Related JP6385899B2 (ja) 2014-07-21 2015-07-16 Ｔｅｍ試料取付け構造

Country Status (3)

Country Link
US (1) US9514913B2 (enExample)
JP (1) JP6385899B2 (enExample)
CN (1) CN105277576B (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015215323A1 (de) * 2015-08-11 2017-02-16 Georg-August-Universität Göttingen Stiftung Öffentlichen Rechts Technik zur tomografischen Bilderfassung
CN110118791B (zh) * 2019-05-21 2020-03-03 山东省分析测试中心 用于获取裂纹/晶界三维信息的ebsd设备样品台及方法
CN110672881A (zh) * 2019-09-30 2020-01-10 上海华力集成电路制造有限公司 金属栅结构及其制造方法
CN111208155B (zh) * 2020-03-13 2024-12-27 康湃医疗科技(苏州)有限公司 一种多角度摆放样品的x射线样品托架
CN113063967B (zh) * 2021-02-18 2023-02-10 上海大学 可实现三维原子探针微尖阵列样品转动的旋转样品台装置
US11476079B1 (en) * 2021-03-31 2022-10-18 Fei Company Method and system for imaging a multi-pillar sample
CN115047016A (zh) * 2022-08-16 2022-09-13 合肥晶合集成电路股份有限公司 立体tem样品结构及其制备方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62281349A (ja) 1986-05-29 1987-12-07 Seiko Instr & Electronics Ltd 金属パタ−ン膜の形成方法及びその装置
US5104684A (en) 1990-05-25 1992-04-14 Massachusetts Institute Of Technology Ion beam induced deposition of metals
BE1007675A3 (nl) 1993-10-28 1995-09-12 Philips Electronics Nv Werkwijze voor het vervaardigen van preparaten voor een elektronenmicroscoop.
JPH08304243A (ja) * 1995-05-11 1996-11-22 Nippon Steel Corp 断面薄膜試料及びその作製方法及び断面薄膜試料用ホルダ
US8723144B2 (en) 2004-07-14 2014-05-13 Applied Materials Israel, Ltd. Apparatus for sample formation and microanalysis in a vacuum chamber
US7442924B2 (en) 2005-02-23 2008-10-28 Fei, Company Repetitive circumferential milling for sample preparation
JP4851804B2 (ja) 2006-02-13 2012-01-11 株式会社日立ハイテクノロジーズ 集束イオンビーム加工観察装置、集束イオンビーム加工観察システム及び加工観察方法
JP4923716B2 (ja) * 2006-05-11 2012-04-25 株式会社日立製作所 試料分析装置および試料分析方法
EP1890136A1 (en) 2006-08-16 2008-02-20 FEI Company Method for obtaining images from slices of a specimen
CN200982932Y (zh) * 2006-11-03 2007-11-28 中国科学院金属研究所 一种用离子束加工样品界面实现背散射表征的装置
US7884326B2 (en) 2007-01-22 2011-02-08 Fei Company Manipulator for rotating and translating a sample holder
EP2051280A1 (en) 2007-10-18 2009-04-22 The Regents of the University of California Motorized manipulator for positioning a TEM specimen
JP5268324B2 (ja) * 2007-10-29 2013-08-21 株式会社日立ハイテクノロジーズ 荷電粒子線顕微装置及び顕微方法
JP2009192341A (ja) 2008-02-14 2009-08-27 Sumitomo Metal Mining Co Ltd 透過電子顕微鏡用薄片試料の作製方法、及びそれに用いる試料台
TWI372859B (en) 2008-10-03 2012-09-21 Inotera Memories Inc Method for manufacturing an electron tomography specimen with fiducial markers and method for constructing 3d image
JP5883658B2 (ja) * 2012-01-20 2016-03-15 株式会社日立ハイテクノロジーズ 荷電粒子線顕微鏡、荷電粒子線顕微鏡用試料ホルダ及び荷電粒子線顕微方法
US8502172B1 (en) 2012-06-26 2013-08-06 Fei Company Three dimensional fiducial
WO2014195998A1 (ja) * 2013-06-03 2014-12-11 株式会社日立製作所 荷電粒子線顕微鏡、荷電粒子線顕微鏡用試料ホルダ及び荷電粒子線顕微方法

Also Published As

Publication number Publication date
US9514913B2 (en) 2016-12-06
CN105277576B (zh) 2019-08-27
US20160020065A1 (en) 2016-01-21
CN105277576A (zh) 2016-01-27
JP2016025085A (ja) 2016-02-08

Similar Documents

Publication Publication Date Title
JP6385899B2 (ja) Ｔｅｍ試料取付け構造
US8476588B2 (en) Method of electron diffraction tomography
JP3287858B2 (ja) 電子顕微鏡装置及び電子顕微方法
JP6618380B2 (ja) 自動化されたｓ／ｔｅｍ取得および測定のための既知の形状の薄片を使用したパターン・マッチング
JP6393448B2 (ja) Ｔｅｍ／ｓｔｅｍトモグラフィ連続傾斜の取得および位置合せのための基準マーク形成
US9659743B2 (en) Image creating method and imaging system for performing the same
JP5883658B2 (ja) 荷電粒子線顕微鏡、荷電粒子線顕微鏡用試料ホルダ及び荷電粒子線顕微方法
CN105388173A (zh) 获取ebsp图样的方法
WO2010125754A1 (ja) 複合荷電粒子線装置
JP2015170600A (ja) 相関原子分解能断層撮影分析用の適応性がある（ｍａｌｌｅａｂｌｅ）薄片の製作
US12198895B2 (en) Method and device for preparing a microscopic sample from a volume sample
KR20200011611A (ko) 하전 입자 빔 샘플 준비과정에서 커트닝을 감소하기 위한 방법 및 시스템
EP2506285B1 (en) Particle beam device having a detector arrangement
JP4433092B2 (ja) 三次元構造観察方法
TWI638987B (zh) Charged particle beam device
US20160274040A1 (en) Method for generating image data relating to an object and particle beam device for carrying out this method
Roussel et al. Extreme high resolution scanning electron microscopy (XHR SEM) and beyond
JP2025530151A (ja) 結晶の絶対構造を決定するための方法及びシステム
EP3226279A1 (en) Sample holder and focused ion beam apparatus
JP2023076412A (ja) 試料を画像化及びミリングする方法
JP2022509915A (ja) 分子の構造および配座を決定するための電子回折イメージングシステム
EP3125270B1 (en) Tem sample mounting geometry
JP2006153894A (ja) 電子線を用いた観察装置及び観察方法
WO2019016855A1 (ja) Ｘ線検査装置の検査条件設定方法
Langer et al. First X-ray fluorescence excited Kossel diffraction in SEM

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20171015

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20171015

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20171016

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20180112

A975 Report on accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A971005

Effective date: 20180116

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20180123

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20180422

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20180622

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20180715

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20180724

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20180808

R150 Certificate of patent or registration of utility model

Ref document number: 6385899

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees