JP6353455B2 - 印刷法 - Google Patents
印刷法 Download PDFInfo
- Publication number
- JP6353455B2 JP6353455B2 JP2015540110A JP2015540110A JP6353455B2 JP 6353455 B2 JP6353455 B2 JP 6353455B2 JP 2015540110 A JP2015540110 A JP 2015540110A JP 2015540110 A JP2015540110 A JP 2015540110A JP 6353455 B2 JP6353455 B2 JP 6353455B2
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- Prior art keywords
- sodium
- potassium
- iii
- hydrate
- solution
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
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- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
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- C04B35/6325—Organic additives based on organo-metallic compounds
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- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
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Description
a)セラミック粉末、ガラスセラミック粉末又はガラス粉末を含有する層を、基材の上に形成し、
b)前記層の少なくとも一部の上に、少なくとも1つの硬化組成物を塗布し、その組成物は、少なくとも1つの、溶解されたか又は液状の有機元素化合物少なくとも0.01〜99.98重量%、有機結合剤0.01〜20重量%及び溶剤又は分散剤0.01〜99.98重量%を含有し、その際、この有機元素化合物は、C、Si、H、O又はNではない原子少なくとも1つを有し、かつこの原子は、少なくとも1つの有機残基に結合されている、
c)ステップa)及びb)は、少なくとも1度繰り返し、
d)溶剤又は分散剤は、素地の形成下に、少なくとも1部又は完全に除去し、
e)結合されていないセラミック粉末を除去し、素地を露出させる。
リチウム(Li):ブチルリチウム、乳酸−リチウム塩、酢酸リチウム、酢酸リチウム二水和物(酢酸リチウム塩)、リチウムアセトアセテート(アセト酢酸リチウム塩)、リチウムアセチルアセトネート(Li(acac))、リチウムアセチリド−エチレンジアミン錯体、水素化アルミニウムリチウム−テトラヒドロフラン−錯体溶液(トルエン中)、リチウムアルミニウム−trri−tetr.−ブチルオキシヒドリド、リチウムアルミニウムトリス−((3−エチル−3−ペンチル)−オキシ)−ヒドリド溶液(THF中)、リチウム−9−ボラビシクロ[3.3.1]ノナンヒドリド溶液(THF中)、リチウム−tetr.−ブチレート溶液、炭酸リチウム、クエン酸リチウム水和物(クエン酸トリリチウム塩水和物)、ジブチル−(イソプロピル)−マグネシウム酸リチウム、リチウムジシクロヘキシルアミド、リチウムジエチルアミド、リチウム−ジイソブチル−tetr.−ブトキシアルミニウムヒドリド溶液(テトラヒドロフラン、ヘキサン中)、リチウム−ジイソプロピルアミド溶液(THF/へプタン/エチルベンゼン中)、リチウム−ジイソプロピルアミド−モノ−THF−錯体溶液(シクロヘキサン中)、リチウム−(ジメチルアミノ)−トリヒドロボレート溶液(THF中)、リチウム−ジフェニルホスフィド溶液(THF中)、リチウムエチレート(エタノール、THF中)、ギ酸リチウム一水和物(ギ酸のリチウム塩)、リチウムメチレート、リチウム−2−メチル−2−ブトキシド溶液(ヘプタン中)、リチウムモルホリノボロヒドリド溶液(THF)、パルミチン酸リチウム、リチウムフェノキシド溶液(THF中)、リチウムフェニルアセチリド溶液(THF中)、リチウムピロリジノボロヒドリド溶液(THF中)、サリチル酸リチウム、リチウムテトラメチルシクロペンタジエニリド、テトラフェニルホウ酸−トリス(1,2−ジメトキシエタン)リチウム、2−チエニルシアノ銅酸リチウム溶液(THF中)、リチウムチオフェノレート溶液(THF中チオフェノールリチウム塩)、p−トルエンスルフィン酸リチウム、重水素化リチウム−tetr.−ブトキシアルミニウム、トリフルオロ酢酸リチウム、トリフルオロメタンスルホン酸リチウム、リチウム−トリイソブチル−(2,2,6,6テトラメチルピペリジノ)−アルミネート溶液(THF中)、リチウムトリメチルシラノレート(塩化メチレン中)、リチウム−(トリメチルシリル)−アセチリド溶液(THF中)。
Claims (9)
- 素地の製造方法であって、
a)セラミック粉末を含有する層を、基材の上に形成し、
b)前記層の少なくとも一部の上に、少なくとも1つの硬化組成物を塗布し、前記組成物は、少なくとも1つの、溶解されたか又は液状の有機金属化合物少なくとも0.01〜99.98重量%、有機結合剤0.01〜20重量%及び溶剤又は分散剤0.01〜99.98重量%を含有し、その際、前記有機金属化合物は、C、Si、H、O又はNではない原子少なくとも1つを有し、かつこの原子は、少なくとも1つの有機残基に結合されており、
c)ステップa)及びb)は、少なくとも1度繰り返し、
d)溶剤又は分散剤は、素地の形成下に、少なくとも1部又は完全に除去し、
e)結合されていないセラミック粉末を除去し、素地を露出させる、
製造方法。 - a)における層も結合剤を含有することを特徴とする、請求項1に記載の方法。
- 分散剤として、水又は有機分散剤を選択することを特徴とする、請求項1又は2に記載の方法。
- セラミック粉末及び結合剤の層厚さを、10〜300μmの範囲に選択することを特徴とする、請求項1乃至3のいずれか1項に記載の方法。
- Al、B、Bi、Ca、Ce、Cr、Cu、K、Fe、Ga、Ge、In、Li、Mg、Mn、Mo、Na、Si、Sn、Sr、Ta、Ti、W、Y及び/又はZr元素の酸化物、ケイ化物、窒化物及び/又は炭化物或いはこれらの混合物からの粉末を使用することを特徴とする、請求項1乃至4のいずれか1項に記載の方法。
- その後、素地を焼結することを特徴とする、請求項1乃至5のいずれか1項に記載の方法。
- 前記硬化組成物が、液体であることを特徴とする、請求項1乃至6のいずれか1項に記載の方法。
- 前記硬化組成物が、固体を含まないことを特徴とする、請求項1乃至7のいずれか1項に記載の方法。
- 前記硬化組成物の粘度が、20℃、1barで50mPa・sであることを特徴とする、請求項1乃至8のいずれか1項に記載の方法。
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US9908819B1 (en) | 2018-03-06 |
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WO2014067990A1 (de) | 2014-05-08 |
DE102012219989B4 (de) | 2016-09-29 |
CN104781213A (zh) | 2015-07-15 |
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EP2914563A1 (de) | 2015-09-09 |
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