JP6313167B2 - 活性化フォーミングガスを利用するダイ取付装置及び方法 - Google Patents
活性化フォーミングガスを利用するダイ取付装置及び方法 Download PDFInfo
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- JP6313167B2 JP6313167B2 JP2014177708A JP2014177708A JP6313167B2 JP 6313167 B2 JP6313167 B2 JP 6313167B2 JP 2014177708 A JP2014177708 A JP 2014177708A JP 2014177708 A JP2014177708 A JP 2014177708A JP 6313167 B2 JP6313167 B2 JP 6313167B2
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- 238000000034 method Methods 0.000 title claims description 17
- 239000007789 gas Substances 0.000 claims description 146
- 239000000758 substrate Substances 0.000 claims description 97
- 239000000463 material Substances 0.000 claims description 34
- 239000004065 semiconductor Substances 0.000 claims description 24
- 239000001257 hydrogen Substances 0.000 claims description 18
- 229910052739 hydrogen Inorganic materials 0.000 claims description 18
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 230000005684 electric field Effects 0.000 claims description 11
- 239000003989 dielectric material Substances 0.000 claims description 9
- 150000002431 hydrogen Chemical class 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 3
- 239000000376 reactant Substances 0.000 claims description 3
- 230000004913 activation Effects 0.000 claims description 2
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- 238000004891 communication Methods 0.000 claims 3
- 239000012530 fluid Substances 0.000 claims 3
- 238000005507 spraying Methods 0.000 claims 3
- 239000007921 spray Substances 0.000 claims 2
- 229910000679 solder Inorganic materials 0.000 description 69
- 230000009467 reduction Effects 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 229910044991 metal oxide Inorganic materials 0.000 description 6
- 150000004706 metal oxides Chemical class 0.000 description 6
- 238000005476 soldering Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 5
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 4
- 239000005751 Copper oxide Substances 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 229910000431 copper oxide Inorganic materials 0.000 description 4
- -1 hydrogen ions Chemical class 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000002609 medium Substances 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000012120 mounting media Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
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- 239000002243 precursor Substances 0.000 description 1
- 230000007420 reactivation Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
- B23K1/0008—Soldering, e.g. brazing, or unsoldering specially adapted for particular articles or work
- B23K1/0016—Brazing of electronic components
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K3/00—Tools, devices, or special appurtenances for soldering, e.g. brazing, or unsoldering, not specially adapted for particular methods
- B23K3/08—Auxiliary devices therefor
- B23K3/082—Flux dispensers; Apparatus for applying flux
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
- B23K1/20—Preliminary treatment of work or areas to be soldered, e.g. in respect of a galvanic coating
- B23K1/206—Cleaning
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K3/00—Tools, devices, or special appurtenances for soldering, e.g. brazing, or unsoldering, not specially adapted for particular methods
- B23K3/06—Solder feeding devices; Solder melting pans
- B23K3/0607—Solder feeding devices
- B23K3/063—Solder feeding devices for wire feeding
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K3/00—Tools, devices, or special appurtenances for soldering, e.g. brazing, or unsoldering, not specially adapted for particular methods
- B23K3/08—Auxiliary devices therefor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/64—Manufacture or treatment of solid state devices other than semiconductor devices, or of parts thereof, not peculiar to a single device provided for in groups H01L31/00 - H10K99/00
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
- H01L24/75—Apparatus for connecting with bump connectors or layer connectors
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/42—Printed circuits
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- H—ELECTRICITY
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/60—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
- H01L2021/60007—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation involving a soldering or an alloying process
- H01L2021/60022—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation involving a soldering or an alloying process using bump connectors, e.g. for flip chip mounting
- H01L2021/60045—Pre-treatment step of the bump connectors prior to bonding
- H01L2021/60052—Oxide removing step, e.g. flux, rosin
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/27—Manufacturing methods
- H01L2224/273—Manufacturing methods by local deposition of the material of the layer connector
- H01L2224/2733—Manufacturing methods by local deposition of the material of the layer connector in solid form
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- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/291—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
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- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/75—Apparatus for connecting with bump connectors or layer connectors
- H01L2224/7501—Means for cleaning, e.g. brushes, for hydro blasting, for ultrasonic cleaning, for dry ice blasting, using gas-flow, by etching, by applying flux or plasma
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- H—ELECTRICITY
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- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/75—Apparatus for connecting with bump connectors or layer connectors
- H01L2224/756—Means for supplying the connector to be connected in the bonding apparatus
- H01L2224/75611—Feeding means
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- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/75—Apparatus for connecting with bump connectors or layer connectors
- H01L2224/7565—Means for transporting the components to be connected
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- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/78—Apparatus for connecting with wire connectors
- H01L2224/7801—Means for cleaning, e.g. brushes, for hydro blasting, for ultrasonic cleaning, for dry ice blasting, using gas-flow, by etching, by applying flux or plasma
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8319—Arrangement of the layer connectors prior to mounting
- H01L2224/83192—Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on another item or body to be connected to the semiconductor or solid-state body
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- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/83801—Soldering or alloying
- H01L2224/83815—Reflow soldering
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- H01L24/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
- H01L24/741—Apparatus for manufacturing means for bonding, e.g. connectors
- H01L24/742—Apparatus for manufacturing bump connectors
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Die Bonding (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Description
解離:nH2−>H2 *(励起された分子)+2H(励起された原子)+2H(イオン)+2e’
酸化物還元:2H(+)+MO−>H2O(気体)+M(ここでMははんだ又は銅)
11 ヒートトンネル
12 ヒートトンネルカバー
14 基板
16 遮蔽ガス
18 活性化ガス発生器
20 ガス供給チューブ
22 フォーミングガス
24 活性化フォーミングガス
26 スライド可能なカバー
27 材料ディスペンス部
28 ワイヤディスペンサー
30 はんだワイヤ
32 はんだドット
33 ダイ取付部
34 結合具
36 半導体ダイス
38 結合はんだ
50 ダイ取付装置
52 活性化ガス発生器
54 第2のガス供給チューブ
56 供給形成ガス
58 活性化フォーミングガス
60 スライド可能なカバー
62 ワイヤディスペンサー
72 誘電性材料
74 ガス旋回翼
76 ガス旋回翼孔
78 旋回ガス
80 中心円筒電極
82 交流電源
84 金属酸化物層
86 洗浄された金属表面
Claims (19)
- 金属表面を有する基板に半導体ダイを取り付けるためのダイ取付装置であって、
雰囲気と流体連結状態にあるヒートトンネルであって、前記基板に前記半導体ダイを取り付けるために前記基板が前記雰囲気を通って運搬されるよう構成される、ヒートトンネルと、
前記ヒートトンネルを閉じるヒートトンネルカバーと、
前記基板に結合材料をディスペンスするための材料ディスペンス部と、
前記基板にディスペンスされている前記結合材料に前記半導体ダイを配置するためのダイ取付部と、
大気圧でフォーミングガスを励起するために使用可能である活性化ガス発生器であって、前記活性化ガス発生器が、前記ヒートトンネルカバーの開口を通して前記ヒートトンネル内の前記基板に直接的に大気圧で励起されている活性化フォーミングガスを噴霧するために前記ダイ取付部の前で前記開口上に位置し、前記活性化フォーミングガスが、前記基板の酸化物を還元するように作用する活性化ガス発生器と、
を備える、ダイ取付装置。 - 前記基板が前記それぞれの部において処理を受ける際に、遮蔽ガスで満たされ、前記基板を含むヒートトンネルカバーで閉じられたヒートトンネルをさらに備える、請求項1に記載のダイ取付装置。
- 前記活性化ガス発生器が、前記ヒートトンネルカバーの開口上に位置し、前記活性化フォーミングガスが、前記開口を通して前記ヒートトンネル内の前記基板に投げ出される、請求項2に記載のダイ取付装置。
- 前記活性化ガス発生器が、前記ヒートトンネル内の前記基板の運搬の方向に対して少なくとも垂直に移動可能である、請求項3に記載のダイ取付装置。
- 前記活性化ガス発生器に接続され、前記活性化ガス発生器と共に移動可能なスライド可能なカバーをさらに備え、前記スライド可能なカバーが、前記開口を通して前記ヒートトンネルから前記活性化フォーミングガスの漏れを最小化するように作用する、請求項4に記載のダイ取付装置。
- 前記活性化ガス発生器が、前記材料ディスペンス部の前に位置する第1のガス発生器、及び、前記材料ディスペンス部及び前記ダイ取付部の間に位置する第2のガス発生器を備える、請求項1に記載のダイ取付装置。
- 前記第1のガス発生器が、多量の結合材料が堆積される、少なくとも前記基板の位置において前記基板の酸化物を還元するように作用し、前記第2のガス発生器が、前記基板にディスペンスされている多量の結合材料の酸化物を還元するように作用する、請求項6に記載のダイ取付装置。
- 前記活性化ガス発生器が、前記材料ディスペンス部に位置する、請求項1に記載のダイ取付装置。
- 前記活性化ガス発生器が、前記材料ディスペンス部に位置する材料ディスペンサーに取り付けられ、
前記活性化ガス発生器が、前記結合材料がディスペンスされる少なくとも前記基板の部分の両方において活性化フォーミングガスを導入し、前記基板の前記部分においてディスペンスされている結合材料に活性化フォーミングガスを導入するように作用する、請求項8に記載のダイ取付装置。 - 前記活性化ガス発生器が、電界を生成する第1の電極及び第2の電極、並びに、周方向分布を有する前記電界を通って旋回するガスのための複数のガス旋回翼孔を備えるガス旋回翼を備える、請求項1に記載のダイ取付装置。
- 前記第1の電極が、導電性であって突き出した円錐形状の円筒電極を備える、請求項10に記載のダイ取付装置。
- その最下点において、前記円錐形状の円筒電極が、前記それぞれの部における処理中に前記基板を含むように作用するヒートトンネルの開口に隣接して位置する、請求項11に記載のダイ取付装置。
- 前記円錐形状の円筒電極及び前記活性化ガス発生器のホルダーの間に位置する誘電性材料をさらに備え、前記誘電性材料が、前記電界を与えるように分極される、請求項11に記載のダイ取付装置。
- 前記第2の電極が、交流電源に接続され、前記活性化ガス発生器のホルダー及び前記それぞれの部における前記基板の処理中に前記基板を含むように作用するヒートトンネルを閉じるヒートトンネルカバーを備える、請求項11に記載のダイ取付装置。
- 前記交流電源が、10kHzから20MHzの周波数及び100Vから50kVの電圧を有する、請求項14に記載のダイ取付装置。
- 前記活性化フォーミングガスが、酸化物を還元するための前記活性化された種及び励起されたラジカルを生成するために前記活性化ガス発生器によって励起される、請求項1に記載のダイ取付装置。
- 前記活性化フォーミングガスが、原子の、イオンの及び放電された水素並びに他の反応物質を含むプラズマ状の粒子を形成するために活性化される活性化された水素種を含む、請求項1に記載のダイ取付装置。
- 金属表面を有する基板に半導体ダイを取り付ける方法であって、
雰囲気と流体連結状態にあるヒートトンネルを通って基板を運搬する段階であって、前記ヒートトンネルがヒートトンネルカバーによって閉じられる段階と、
前記基板が前記ヒートトンネル内で運搬される際に、前記基板の酸化物を還元するために活性化ガス発生器を用いて前記基板に直接的に活性化フォーミングガスを噴霧する段階であって、前記活性化ガス発生器が、前記ヒートトンネルカバーの開口上に位置し、前記開口を通して大気圧でフォーミングガスを励起し、次いで噴霧するために使用可能である段階と、
材料ディスペンス部において前記基板に結合材料をディスペンスする段階と、
その後に、ダイ取付部において前記基板にディスペンスされている前記結合材料に前記半導体ダイを配置する段階と、
を含む方法。 - 金属表面を有する基板を備える電子デバイスを製造する方法であって、
雰囲気と流体連結状態にあるヒートトンネルを通って基板を運搬する段階であって、前記ヒートトンネルがヒートトンネルカバーによって閉じられる段階と、
前記基板が前記ヒートトンネル内で運搬される際に、前記基板の酸化物を還元するために活性化ガス発生器を用いて前記基板に直接的に活性化フォーミングガスを噴霧する段階であって、前記活性化ガス発生器が、前記ヒートトンネルカバーの開口上に位置し、前記開口を通して大気圧でフォーミングガスを励起し、次いで噴霧するために使用可能である段階と、
材料ディスペンス部において前記基板に結合材料をディスペンスする段階と、
その後に、ダイ取付部において前記基板にディスペンスされている前記結合材料に前記半導体ダイを配置する段階と、
を含む方法。
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