JP6310864B2 - 検査装置 - Google Patents

検査装置 Download PDF

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Publication number
JP6310864B2
JP6310864B2 JP2015004025A JP2015004025A JP6310864B2 JP 6310864 B2 JP6310864 B2 JP 6310864B2 JP 2015004025 A JP2015004025 A JP 2015004025A JP 2015004025 A JP2015004025 A JP 2015004025A JP 6310864 B2 JP6310864 B2 JP 6310864B2
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JP
Japan
Prior art keywords
wafer
value
voltage
image
inspection apparatus
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Expired - Fee Related
Application number
JP2015004025A
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English (en)
Japanese (ja)
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JP2016131177A (ja
JP2016131177A5 (OSRAM
Inventor
長谷川　正樹
正樹 長谷川
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Filing date
Publication date
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Priority to JP2015004025A priority Critical patent/JP6310864B2/ja
Priority to US14/993,470 priority patent/US9460891B2/en
Publication of JP2016131177A publication Critical patent/JP2016131177A/ja
Publication of JP2016131177A5 publication Critical patent/JP2016131177A5/ja
Application granted granted Critical
Publication of JP6310864B2 publication Critical patent/JP6310864B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/29—Reflection microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/263—Contrast, resolution or power of penetration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/221—Image processing
    • H01J2237/223—Fourier techniques
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24592—Inspection and quality control of devices

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2015004025A 2015-01-13 2015-01-13 検査装置 Expired - Fee Related JP6310864B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2015004025A JP6310864B2 (ja) 2015-01-13 2015-01-13 検査装置
US14/993,470 US9460891B2 (en) 2015-01-13 2016-01-12 Inspection equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015004025A JP6310864B2 (ja) 2015-01-13 2015-01-13 検査装置

Publications (3)

Publication Number Publication Date
JP2016131177A JP2016131177A (ja) 2016-07-21
JP2016131177A5 JP2016131177A5 (OSRAM) 2017-04-13
JP6310864B2 true JP6310864B2 (ja) 2018-04-11

Family

ID=56368015

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015004025A Expired - Fee Related JP6310864B2 (ja) 2015-01-13 2015-01-13 検査装置

Country Status (2)

Country Link
US (1) US9460891B2 (OSRAM)
JP (1) JP6310864B2 (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI750608B (zh) * 2019-09-30 2021-12-21 日商三菱電機股份有限公司 用以進行影像或聲音辨識的資訊處理裝置、儲存媒體、程式產品及資訊處理方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11333393B2 (en) 2016-12-05 2022-05-17 3M Innovative Properties Company Condensate management system
DE112017007862B4 (de) * 2017-09-20 2020-11-19 Hitachi High-Technologies Corporation Ladungsträgerstrahlvorrichtung
US11193895B2 (en) * 2017-10-30 2021-12-07 Hitachi High-Tech Corporation Semiconductor substrate for evaluation and method using same to evaluate defect detection sensitivity of inspection device

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4686531A (en) * 1983-10-28 1987-08-11 Control Data Corporation Capacitance height gage applied in reticle position detection system for electron beam lithography apparatus
US4538069A (en) * 1983-10-28 1985-08-27 Control Data Corporation Capacitance height gage applied in reticle position detection system for electron beam lithography apparatus
JPS63202835A (ja) * 1987-02-17 1988-08-22 Nippon Telegr & Teleph Corp <Ntt> 荷電ビ−ムの自動調整方法および自動調整装置
US20060060781A1 (en) * 1997-08-11 2006-03-23 Masahiro Watanabe Charged-particle beam apparatus and method for automatically correcting astigmatism and for height detection
JP3994691B2 (ja) * 2001-07-04 2007-10-24 株式会社日立製作所 荷電粒子線装置および自動非点収差調整方法
JP3534582B2 (ja) 1997-10-02 2004-06-07 株式会社日立製作所 パターン欠陥検査方法および検査装置
JP3441955B2 (ja) * 1998-02-23 2003-09-02 株式会社日立製作所 投射方式の荷電粒子顕微鏡および基板検査システム
JP3805565B2 (ja) * 1999-06-11 2006-08-02 株式会社日立製作所 電子線画像に基づく検査または計測方法およびその装置
US6825480B1 (en) * 1999-06-23 2004-11-30 Hitachi, Ltd. Charged particle beam apparatus and automatic astigmatism adjustment method
JP2002260296A (ja) * 2001-02-28 2002-09-13 Sony Corp 電子ビーム照射装置及び電子ビーム照射方法
US6828571B1 (en) * 2003-09-17 2004-12-07 Kla-Tencor Technologies Corporation Apparatus and methods of controlling surface charge and focus
JP4914604B2 (ja) * 2005-12-07 2012-04-11 株式会社日立ハイテクノロジーズ 電子線検査装置を用いたパターン欠陥検査方法及びそのシステム、並びに写像投影型又はマルチビーム型電子線検査装置
JP4870450B2 (ja) * 2006-02-27 2012-02-08 株式会社日立ハイテクノロジーズ 検査装置、および検査方法
JP4988444B2 (ja) * 2007-06-19 2012-08-01 株式会社日立製作所 検査方法および装置
JP5873227B2 (ja) * 2007-12-06 2016-03-01 エフ・イ−・アイ・カンパニー デコレーションを用いたスライス・アンド・ビュー
JP4988662B2 (ja) * 2008-07-25 2012-08-01 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5178558B2 (ja) * 2009-02-03 2013-04-10 株式会社日立ハイテクノロジーズ 荷電粒子線の光軸調整方法、及び荷電粒子線装置
JP5415523B2 (ja) * 2009-03-19 2014-02-12 株式会社日立ハイテクノロジーズ パターン検査装置及びその検査方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI750608B (zh) * 2019-09-30 2021-12-21 日商三菱電機股份有限公司 用以進行影像或聲音辨識的資訊處理裝置、儲存媒體、程式產品及資訊處理方法

Also Published As

Publication number Publication date
JP2016131177A (ja) 2016-07-21
US20160203946A1 (en) 2016-07-14
US9460891B2 (en) 2016-10-04

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