JP2016131177A5 - - Google Patents

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Publication number
JP2016131177A5
JP2016131177A5 JP2015004025A JP2015004025A JP2016131177A5 JP 2016131177 A5 JP2016131177 A5 JP 2016131177A5 JP 2015004025 A JP2015004025 A JP 2015004025A JP 2015004025 A JP2015004025 A JP 2015004025A JP 2016131177 A5 JP2016131177 A5 JP 2016131177A5
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JP
Japan
Prior art keywords
value
wafer
voltage
unit
inspection apparatus
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Application number
JP2015004025A
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English (en)
Japanese (ja)
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JP6310864B2 (ja
JP2016131177A (ja
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Priority to JP2015004025A priority Critical patent/JP6310864B2/ja
Priority claimed from JP2015004025A external-priority patent/JP6310864B2/ja
Priority to US14/993,470 priority patent/US9460891B2/en
Publication of JP2016131177A publication Critical patent/JP2016131177A/ja
Publication of JP2016131177A5 publication Critical patent/JP2016131177A5/ja
Application granted granted Critical
Publication of JP6310864B2 publication Critical patent/JP6310864B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2015004025A 2015-01-13 2015-01-13 検査装置 Expired - Fee Related JP6310864B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2015004025A JP6310864B2 (ja) 2015-01-13 2015-01-13 検査装置
US14/993,470 US9460891B2 (en) 2015-01-13 2016-01-12 Inspection equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015004025A JP6310864B2 (ja) 2015-01-13 2015-01-13 検査装置

Publications (3)

Publication Number Publication Date
JP2016131177A JP2016131177A (ja) 2016-07-21
JP2016131177A5 true JP2016131177A5 (OSRAM) 2017-04-13
JP6310864B2 JP6310864B2 (ja) 2018-04-11

Family

ID=56368015

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015004025A Expired - Fee Related JP6310864B2 (ja) 2015-01-13 2015-01-13 検査装置

Country Status (2)

Country Link
US (1) US9460891B2 (OSRAM)
JP (1) JP6310864B2 (OSRAM)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110036249B (zh) 2016-12-05 2021-03-30 3M创新有限公司 冷凝物管理系统
DE112017007862B4 (de) * 2017-09-20 2020-11-19 Hitachi High-Technologies Corporation Ladungsträgerstrahlvorrichtung
JP6957633B2 (ja) * 2017-10-30 2021-11-02 株式会社日立ハイテク 評価用半導体基板およびそれを用いた検査装置の欠陥検出感度評価方法
CN114424236B (zh) * 2019-09-30 2025-06-10 三菱电机株式会社 信息处理装置、计算机能读入的记录介质和信息处理方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4538069A (en) * 1983-10-28 1985-08-27 Control Data Corporation Capacitance height gage applied in reticle position detection system for electron beam lithography apparatus
US4686531A (en) * 1983-10-28 1987-08-11 Control Data Corporation Capacitance height gage applied in reticle position detection system for electron beam lithography apparatus
JPS63202835A (ja) * 1987-02-17 1988-08-22 Nippon Telegr & Teleph Corp <Ntt> 荷電ビ−ムの自動調整方法および自動調整装置
JP3994691B2 (ja) * 2001-07-04 2007-10-24 株式会社日立製作所 荷電粒子線装置および自動非点収差調整方法
US20060060781A1 (en) * 1997-08-11 2006-03-23 Masahiro Watanabe Charged-particle beam apparatus and method for automatically correcting astigmatism and for height detection
JP3534582B2 (ja) 1997-10-02 2004-06-07 株式会社日立製作所 パターン欠陥検査方法および検査装置
JP3441955B2 (ja) * 1998-02-23 2003-09-02 株式会社日立製作所 投射方式の荷電粒子顕微鏡および基板検査システム
JP3805565B2 (ja) * 1999-06-11 2006-08-02 株式会社日立製作所 電子線画像に基づく検査または計測方法およびその装置
US6825480B1 (en) * 1999-06-23 2004-11-30 Hitachi, Ltd. Charged particle beam apparatus and automatic astigmatism adjustment method
JP2002260296A (ja) * 2001-02-28 2002-09-13 Sony Corp 電子ビーム照射装置及び電子ビーム照射方法
US6828571B1 (en) * 2003-09-17 2004-12-07 Kla-Tencor Technologies Corporation Apparatus and methods of controlling surface charge and focus
JP4914604B2 (ja) * 2005-12-07 2012-04-11 株式会社日立ハイテクノロジーズ 電子線検査装置を用いたパターン欠陥検査方法及びそのシステム、並びに写像投影型又はマルチビーム型電子線検査装置
JP4870450B2 (ja) * 2006-02-27 2012-02-08 株式会社日立ハイテクノロジーズ 検査装置、および検査方法
JP4988444B2 (ja) * 2007-06-19 2012-08-01 株式会社日立製作所 検査方法および装置
JP5873227B2 (ja) * 2007-12-06 2016-03-01 エフ・イ−・アイ・カンパニー デコレーションを用いたスライス・アンド・ビュー
JP4988662B2 (ja) * 2008-07-25 2012-08-01 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5178558B2 (ja) * 2009-02-03 2013-04-10 株式会社日立ハイテクノロジーズ 荷電粒子線の光軸調整方法、及び荷電粒子線装置
US20110298915A1 (en) * 2009-03-19 2011-12-08 Takashi Hiroi Pattern inspecting apparatus and pattern inspecting method

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