JP6306308B2 - 半導体発光装置 - Google Patents
半導体発光装置 Download PDFInfo
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- JP6306308B2 JP6306308B2 JP2013194108A JP2013194108A JP6306308B2 JP 6306308 B2 JP6306308 B2 JP 6306308B2 JP 2013194108 A JP2013194108 A JP 2013194108A JP 2013194108 A JP2013194108 A JP 2013194108A JP 6306308 B2 JP6306308 B2 JP 6306308B2
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- 238000006243 chemical reaction Methods 0.000 claims description 21
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- 239000002184 metal Substances 0.000 claims description 14
- 239000010949 copper Substances 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 230000000903 blocking effect Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 239
- 239000000463 material Substances 0.000 description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 9
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 8
- 150000004767 nitrides Chemical class 0.000 description 8
- 239000010936 titanium Substances 0.000 description 8
- 230000004888 barrier function Effects 0.000 description 7
- 238000000605 extraction Methods 0.000 description 7
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- 239000011521 glass Substances 0.000 description 7
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
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- 238000005530 etching Methods 0.000 description 6
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- 238000000034 method Methods 0.000 description 6
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 5
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- 239000000203 mixture Substances 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
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- 238000009713 electroplating Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
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- 229910052709 silver Inorganic materials 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 229910002601 GaN Inorganic materials 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
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- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
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- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 229920002577 polybenzoxazole Polymers 0.000 description 2
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- 239000010980 sapphire Substances 0.000 description 2
- 239000005368 silicate glass Substances 0.000 description 2
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- 239000010703 silicon Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910002704 AlGaN Inorganic materials 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004541 SiN Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- GDFCWFBWQUEQIJ-UHFFFAOYSA-N [B].[P] Chemical compound [B].[P] GDFCWFBWQUEQIJ-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000004382 potting Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/10—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a light reflecting structure, e.g. semiconductor Bragg reflector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
- H01L33/385—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape the electrode extending at least partially onto a side surface of the semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/405—Reflective materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/42—Transparent materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/501—Wavelength conversion elements characterised by the materials, e.g. binder
- H01L33/502—Wavelength conversion materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
- Led Device Packages (AREA)
Description
Claims (6)
- 積層体であって、
第1導電形の第1半導体層の一部と、
第2導電形の第2半導体層と、
前記第1半導体層の一部と、前記第2半導体層と、の間に設けられた発光層と、
を含む第1部分と、
前記第1部分に並設され、前記第1半導体層の残りの部分を含む第2部分と、
を有する積層体と、
前記第1部分において、前記第2半導体層の前記発光層とは反対側の面上に設けられた第1電極と、
前記第2部分において、前記第1半導体層の前記発光層に接する側の面上に設けられた第2電極と、
前記積層体の前記第1電極および前記第2電極が設けられた側の表面と、その表面に接する側面と、を覆う絶縁層と、
前記第1部分において前記絶縁層上に設けられ、前記第1電極に電気的に接続された第1中間配線と、
前記第2部分において前記絶縁層上に設けられ、前記第2電極と電気的に接続された第2中間配線と、
前記絶縁層上において、前記第1中間配線と、前記第2中間配線と、を囲み、前記積層体の前記側面を覆う遮光部と、
前記第1中間配線上に設けられ、前記第1半導体層から前記第2半導体層に向かう第1方向に延びる第1ピラーと、
前記第2中間配線上に設けられ、前記第1方向に延びる第2ピラーと、
前記第1ピラーの端部及び前記第2ピラーの端部を露出させて、前記積層体および前記第1ピラー、前記第2ピラーを覆う封止部と、
を備え、
前記第1中間配線、前記第2中間配線および前記遮光部は、前記絶縁層に接したアルミニウムを含む第1金属層と、前記第1金属層の上に設けられ、前記第1金属層よりも厚い銅を含む第2金属層と、を含む半導体発光装置。 - 前記第2中間配線は、前記第2部分から前記第1部分に延在し、前記発光層および前記第2半導体層の側面を覆う請求項1記載の半導体発光装置。
- 前記遮光部は、前記第1中間配線および前記第2中間配線から電気的に分離された請求項1または2に記載の半導体発光装置。
- 前記第1中間配線層は、前記第1電極と前記第1ピラーとの間の部分を有し、
前記第2中間配線層は、前記第2電極と前記第2ピラーとの間の部分を有する請求項1〜3のいずれか1つに記載の半導体発光装置。 - 前記遮光部は、前記第1中間配線および前記第2中間配線のいずれか1つと電気的に接続される請求項1または2に記載の半導体発光装置。
- 前記積層体上に設けられ、前記発光層から放射される光の波長を変換する波長変換層をさらに備え、
前記第1半導体層は、前記発光層と前記波長変換層との間に位置し、
前記波長変換層は、前記積層体上から前記遮光部上に延在し、
前記遮光部は、前記波長変換部と前記封止部から露出した端面を有し、
前記積層体と前記波長変換層との間、および、前記遮光部と前記波長変換層との間に基板を介在させない請求項1〜5に記載の半導体発光装置。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013194108A JP6306308B2 (ja) | 2013-09-19 | 2013-09-19 | 半導体発光装置 |
US14/445,261 US9142727B2 (en) | 2013-09-19 | 2014-07-29 | Semiconductor light emitting device |
KR20140099037A KR20150032621A (ko) | 2013-09-19 | 2014-08-01 | 반도체 발광 장치 |
EP14180009.4A EP2851970B1 (en) | 2013-09-19 | 2014-08-06 | Semiconductor light emitting diode device |
TW103128342A TWI560902B (en) | 2013-09-19 | 2014-08-18 | Semiconductor light emitting device |
CN201410407696.XA CN104465970A (zh) | 2013-09-19 | 2014-08-19 | 半导体发光装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013194108A JP6306308B2 (ja) | 2013-09-19 | 2013-09-19 | 半導体発光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015060964A JP2015060964A (ja) | 2015-03-30 |
JP6306308B2 true JP6306308B2 (ja) | 2018-04-04 |
Family
ID=51265616
Family Applications (1)
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JP2013194108A Active JP6306308B2 (ja) | 2013-09-19 | 2013-09-19 | 半導体発光装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9142727B2 (ja) |
EP (1) | EP2851970B1 (ja) |
JP (1) | JP6306308B2 (ja) |
KR (1) | KR20150032621A (ja) |
CN (1) | CN104465970A (ja) |
TW (1) | TWI560902B (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6295171B2 (ja) | 2014-09-16 | 2018-03-14 | アルパッド株式会社 | 発光ユニット及び半導体発光装置 |
JP6555907B2 (ja) * | 2015-03-16 | 2019-08-07 | アルパッド株式会社 | 半導体発光装置 |
DE102015114587A1 (de) * | 2015-09-01 | 2017-03-02 | Osram Opto Semiconductors Gmbh | Optoelektronisches Halbleiterbauelement und Verfahren zu dessen Herstellung |
JP2017168808A (ja) * | 2015-11-06 | 2017-09-21 | 株式会社カネカ | Csp−led用熱硬化性白色インク |
KR102417181B1 (ko) | 2015-11-09 | 2022-07-05 | 삼성전자주식회사 | 발광 패키지, 반도체 발광 소자, 발광 모듈 및 발광 패키지의 제조 방법 |
TWI557701B (zh) * | 2015-12-30 | 2016-11-11 | 友達光電股份有限公司 | 應用於製作發光元件陣列顯示器的印刷板模及發光元件陣列顯示器 |
DE102016103059A1 (de) * | 2016-02-22 | 2017-08-24 | Osram Opto Semiconductors Gmbh | Halbleiterbauelement und Verfahren zur Herstellung eines Halbleiterbauelements |
US10043956B2 (en) | 2016-09-29 | 2018-08-07 | Nichia Corporation | Method for manufacturing light emitting device |
CN109712967B (zh) | 2017-10-25 | 2020-09-29 | 隆达电子股份有限公司 | 一种发光二极管装置及其制造方法 |
Family Cites Families (14)
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JP3531475B2 (ja) * | 1998-05-22 | 2004-05-31 | 日亜化学工業株式会社 | フリップチップ型光半導体素子 |
JP4411695B2 (ja) * | 1999-07-28 | 2010-02-10 | 日亜化学工業株式会社 | 窒化物半導体発光素子 |
JP4678211B2 (ja) | 2005-02-28 | 2011-04-27 | 三菱化学株式会社 | 発光装置 |
JP2008205005A (ja) | 2007-02-16 | 2008-09-04 | Mitsubishi Chemicals Corp | GaN系LED素子 |
US20090173956A1 (en) | 2007-12-14 | 2009-07-09 | Philips Lumileds Lighting Company, Llc | Contact for a semiconductor light emitting device |
JP2009260316A (ja) * | 2008-03-26 | 2009-11-05 | Panasonic Electric Works Co Ltd | 半導体発光素子およびそれを用いる照明装置 |
JP2011071272A (ja) * | 2009-09-25 | 2011-04-07 | Toshiba Corp | 半導体発光装置及びその製造方法 |
JP5337106B2 (ja) * | 2010-06-04 | 2013-11-06 | 株式会社東芝 | 半導体発光装置 |
JP5414627B2 (ja) * | 2010-06-07 | 2014-02-12 | 株式会社東芝 | 半導体発光装置及びその製造方法 |
KR101230622B1 (ko) * | 2010-12-10 | 2013-02-06 | 이정훈 | 집단 본딩을 이용한 반도체 디바이스 제조 방법 및 그것에 의해 제조된 반도체 디바이스 |
JP2013021175A (ja) * | 2011-07-12 | 2013-01-31 | Toshiba Corp | 半導体発光素子 |
JP5304855B2 (ja) | 2011-08-12 | 2013-10-02 | 三菱化学株式会社 | GaN系発光ダイオードおよびそれを用いた発光装置 |
JP5949294B2 (ja) | 2011-08-31 | 2016-07-06 | 日亜化学工業株式会社 | 半導体発光素子 |
JP2013084889A (ja) | 2011-09-30 | 2013-05-09 | Toshiba Corp | 半導体発光装置及びその製造方法 |
-
2013
- 2013-09-19 JP JP2013194108A patent/JP6306308B2/ja active Active
-
2014
- 2014-07-29 US US14/445,261 patent/US9142727B2/en active Active
- 2014-08-01 KR KR20140099037A patent/KR20150032621A/ko not_active Application Discontinuation
- 2014-08-06 EP EP14180009.4A patent/EP2851970B1/en active Active
- 2014-08-18 TW TW103128342A patent/TWI560902B/zh active
- 2014-08-19 CN CN201410407696.XA patent/CN104465970A/zh active Pending
Also Published As
Publication number | Publication date |
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KR20150032621A (ko) | 2015-03-27 |
US9142727B2 (en) | 2015-09-22 |
US20150076546A1 (en) | 2015-03-19 |
JP2015060964A (ja) | 2015-03-30 |
EP2851970A1 (en) | 2015-03-25 |
CN104465970A (zh) | 2015-03-25 |
TW201519466A (zh) | 2015-05-16 |
TWI560902B (en) | 2016-12-01 |
EP2851970B1 (en) | 2018-03-14 |
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