JP6306296B2 - 感光性熱硬化性樹脂組成物およびフレキシブルプリント配線板 - Google Patents
感光性熱硬化性樹脂組成物およびフレキシブルプリント配線板 Download PDFInfo
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- JP6306296B2 JP6306296B2 JP2013144034A JP2013144034A JP6306296B2 JP 6306296 B2 JP6306296 B2 JP 6306296B2 JP 2013144034 A JP2013144034 A JP 2013144034A JP 2013144034 A JP2013144034 A JP 2013144034A JP 6306296 B2 JP6306296 B2 JP 6306296B2
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- dianhydride
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- thermosetting resin
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- 239000011342 resin composition Substances 0.000 title claims description 79
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- -1 cyclic ether compound Chemical class 0.000 claims description 49
- 229920001721 polyimide Polymers 0.000 claims description 45
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- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 39
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- 230000018109 developmental process Effects 0.000 description 25
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- 229910000679 solder Inorganic materials 0.000 description 9
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- 150000004985 diamines Chemical class 0.000 description 8
- 239000012948 isocyanate Substances 0.000 description 8
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- 239000007864 aqueous solution Substances 0.000 description 4
- 239000003086 colorant Substances 0.000 description 4
- UKJLNMAFNRKWGR-UHFFFAOYSA-N cyclohexatrienamine Chemical group NC1=CC=C=C[CH]1 UKJLNMAFNRKWGR-UHFFFAOYSA-N 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 4
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- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 3
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 3
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- BXUSJTNZBBPMHY-UHFFFAOYSA-N 2-amino-5-[4-[4-(4-amino-3-hydroxyphenoxy)phenyl]phenoxy]phenol Chemical group C1=C(O)C(N)=CC=C1OC1=CC=C(C=2C=CC(OC=3C=C(O)C(N)=CC=3)=CC=2)C=C1 BXUSJTNZBBPMHY-UHFFFAOYSA-N 0.000 description 2
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- UENRXLSRMCSUSN-UHFFFAOYSA-N 3,5-diaminobenzoic acid Chemical compound NC1=CC(N)=CC(C(O)=O)=C1 UENRXLSRMCSUSN-UHFFFAOYSA-N 0.000 description 2
- LXJLFVRAWOOQDR-UHFFFAOYSA-N 3-(3-aminophenoxy)aniline Chemical compound NC1=CC=CC(OC=2C=C(N)C=CC=2)=C1 LXJLFVRAWOOQDR-UHFFFAOYSA-N 0.000 description 2
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 2
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 2
- KHYXYOGWAIYVBD-UHFFFAOYSA-N 4-(4-propylphenoxy)aniline Chemical compound C1=CC(CCC)=CC=C1OC1=CC=C(N)C=C1 KHYXYOGWAIYVBD-UHFFFAOYSA-N 0.000 description 2
- MQAHXEQUBNDFGI-UHFFFAOYSA-N 5-[4-[2-[4-[(1,3-dioxo-2-benzofuran-5-yl)oxy]phenyl]propan-2-yl]phenoxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC2=CC=C(C=C2)C(C)(C=2C=CC(OC=3C=C4C(=O)OC(=O)C4=CC=3)=CC=2)C)=C1 MQAHXEQUBNDFGI-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
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- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
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- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- VHRGRCVQAFMJIZ-UHFFFAOYSA-N cadaverine Chemical compound NCCCCCN VHRGRCVQAFMJIZ-UHFFFAOYSA-N 0.000 description 2
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- 150000002989 phenols Chemical class 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
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- CLYVDMAATCIVBF-UHFFFAOYSA-N pigment red 224 Chemical compound C=12C3=CC=C(C(OC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)OC(=O)C4=CC=C3C1=C42 CLYVDMAATCIVBF-UHFFFAOYSA-N 0.000 description 1
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- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
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- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
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- 238000006798 ring closing metathesis reaction Methods 0.000 description 1
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- 238000007650 screen-printing Methods 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical group S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
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- 150000003512 tertiary amines Chemical class 0.000 description 1
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- 239000002562 thickening agent Substances 0.000 description 1
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- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- KLNPWTHGTVSSEU-UHFFFAOYSA-N undecane-1,11-diamine Chemical compound NCCCCCCCCCCCN KLNPWTHGTVSSEU-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0393—Flexible materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
- H05K3/0035—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material of blind holes, i.e. having a metal layer at the bottom
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Materials For Photolithography (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Optics & Photonics (AREA)
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JP2013144034A JP6306296B2 (ja) | 2013-07-09 | 2013-07-09 | 感光性熱硬化性樹脂組成物およびフレキシブルプリント配線板 |
KR1020167003054A KR102372561B1 (ko) | 2013-07-09 | 2014-06-17 | 감광성 열경화성 수지 조성물 및 플렉시블 프린트 배선판 |
PCT/JP2014/066078 WO2015005077A1 (ja) | 2013-07-09 | 2014-06-17 | 感光性熱硬化性樹脂組成物およびフレキシブルプリント配線板 |
CN201480039321.0A CN105378564B (zh) | 2013-07-09 | 2014-06-17 | 感光性热固性树脂组合物和柔性印刷电路板 |
TW103122978A TWI637665B (zh) | 2013-07-09 | 2014-07-03 | Photosensitive thermosetting resin composition and flexible printed circuit board |
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JP2013144034A JP6306296B2 (ja) | 2013-07-09 | 2013-07-09 | 感光性熱硬化性樹脂組成物およびフレキシブルプリント配線板 |
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JP (1) | JP6306296B2 (zh) |
KR (1) | KR102372561B1 (zh) |
CN (1) | CN105378564B (zh) |
TW (1) | TWI637665B (zh) |
WO (1) | WO2015005077A1 (zh) |
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JP6363861B2 (ja) * | 2014-03-31 | 2018-07-25 | 太陽インキ製造株式会社 | 硬化性樹脂組成物、そのドライフィルムおよび硬化物、並びにそれらを用いて形成された硬化被膜を有するプリント配線板 |
TWI652281B (zh) * | 2015-02-18 | 2019-03-01 | 日商住友電木股份有限公司 | 含有光產鹼劑的光可成像聚烯烴組成物 |
KR102040224B1 (ko) * | 2016-08-09 | 2019-11-06 | 주식회사 엘지화학 | 절연층 제조방법 및 다층인쇄회로기판 제조방법 |
WO2018030761A1 (ko) * | 2016-08-09 | 2018-02-15 | 주식회사 엘지화학 | 절연층 제조방법 및 다층인쇄회로기판 제조방법 |
WO2018043262A1 (ja) * | 2016-08-31 | 2018-03-08 | 富士フイルム株式会社 | パターン形成方法、積層体の製造方法および電子デバイスの製造方法 |
KR102040225B1 (ko) * | 2016-11-11 | 2019-11-06 | 주식회사 엘지화학 | 절연층 제조방법 및 다층인쇄회로기판 제조방법 |
WO2018088754A1 (ko) * | 2016-11-11 | 2018-05-17 | 주식회사 엘지화학 | 절연층 제조방법 및 다층인쇄회로기판 제조방법 |
KR102207604B1 (ko) * | 2018-11-06 | 2021-01-26 | (주)이녹스첨단소재 | Fpic 필름 및 이의 제조방법 |
CN110239163B (zh) * | 2019-06-13 | 2021-01-08 | 东莞市政潮电子科技有限公司 | 一种提高PI膜与Cu箔间粘结性能的柔性印刷电路板基材 |
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JPS62263692A (ja) | 1986-05-12 | 1987-11-16 | ニツポン高度紙工業株式会社 | 耐熱性フレキシブルプリント配線板 |
JPS63110224A (ja) | 1986-10-27 | 1988-05-14 | Dainippon Printing Co Ltd | フレキシブルオ−バ−レイフイルム |
TW436491B (en) * | 1997-08-22 | 2001-05-28 | Ciba Sc Holding Ag | Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions |
JP4191956B2 (ja) * | 2002-05-24 | 2008-12-03 | サンノプコ株式会社 | 感光性樹脂組成物 |
TWI398724B (zh) * | 2005-03-15 | 2013-06-11 | Toray Industries | 感光性樹脂組成物 |
US7977028B2 (en) * | 2005-06-30 | 2011-07-12 | Toray Industries, Inc. | Photosensitive resin composition and adhesion promoter |
KR20090038390A (ko) * | 2006-07-11 | 2009-04-20 | 니폰 가야꾸 가부시끼가이샤 | 감광성 알칼리 수용액 가용형 폴리이미드 수지 및 이를 함유하는 감광성 수지 조성물 |
JP5125747B2 (ja) * | 2007-05-25 | 2013-01-23 | 東レ株式会社 | 感光性樹脂組成物 |
TW200908839A (en) * | 2007-08-09 | 2009-02-16 | Nichigo Morton Co Ltd | Solder mask, photoresist pattern forming method and the light-emitting device thereof |
JP2009258471A (ja) * | 2008-04-18 | 2009-11-05 | Toray Ind Inc | 感光性樹脂組成物フィルムおよびそれを用いたレジスト形成方法 |
JP5402332B2 (ja) * | 2009-07-09 | 2014-01-29 | 東レ株式会社 | 感光性樹脂組成物、感光性樹脂組成物フィルムおよびそれを用いた多層配線基板 |
JP5935323B2 (ja) * | 2010-07-09 | 2016-06-15 | 東レ株式会社 | 感光性接着剤組成物、感光性接着剤フィルムおよびこれらを用いた半導体装置 |
JP5740915B2 (ja) * | 2010-10-28 | 2015-07-01 | 東レ株式会社 | フィルム積層体 |
WO2013171888A1 (ja) * | 2012-05-17 | 2013-11-21 | 太陽インキ製造株式会社 | アルカリ現像型の熱硬化性樹脂組成物、プリント配線板 |
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- 2014-06-17 WO PCT/JP2014/066078 patent/WO2015005077A1/ja active Application Filing
- 2014-06-17 CN CN201480039321.0A patent/CN105378564B/zh active Active
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JP2015018049A (ja) | 2015-01-29 |
CN105378564A (zh) | 2016-03-02 |
TWI637665B (zh) | 2018-10-01 |
WO2015005077A1 (ja) | 2015-01-15 |
TW201519708A (zh) | 2015-05-16 |
CN105378564B (zh) | 2020-02-07 |
KR102372561B1 (ko) | 2022-03-10 |
KR20160029111A (ko) | 2016-03-14 |
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