JP6272175B2 - 光学素子 - Google Patents
光学素子 Download PDFInfo
- Publication number
- JP6272175B2 JP6272175B2 JP2014157237A JP2014157237A JP6272175B2 JP 6272175 B2 JP6272175 B2 JP 6272175B2 JP 2014157237 A JP2014157237 A JP 2014157237A JP 2014157237 A JP2014157237 A JP 2014157237A JP 6272175 B2 JP6272175 B2 JP 6272175B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- optical element
- film
- stopper layer
- etching stopper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000003287 optical effect Effects 0.000 title claims description 40
- 238000005530 etching Methods 0.000 claims description 68
- 239000011521 glass Substances 0.000 claims description 66
- 239000000758 substrate Substances 0.000 claims description 58
- 239000010408 film Substances 0.000 claims description 56
- 239000006059 cover glass Substances 0.000 claims description 54
- 238000003384 imaging method Methods 0.000 claims description 33
- 239000010409 thin film Substances 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 26
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 11
- 239000012788 optical film Substances 0.000 claims description 10
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 6
- DWYMPOCYEZONEA-UHFFFAOYSA-L fluoridophosphate Chemical class [O-]P([O-])(F)=O DWYMPOCYEZONEA-UHFFFAOYSA-L 0.000 claims description 6
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 claims description 5
- 238000000206 photolithography Methods 0.000 claims description 5
- 229910019142 PO4 Inorganic materials 0.000 claims description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 3
- 239000010452 phosphate Substances 0.000 claims description 3
- 239000011651 chromium Substances 0.000 description 24
- 238000012986 modification Methods 0.000 description 12
- 230000004048 modification Effects 0.000 description 12
- 239000000243 solution Substances 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 9
- 239000010949 copper Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 238000005520 cutting process Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 238000000059 patterning Methods 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 5
- 238000001771 vacuum deposition Methods 0.000 description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910001420 alkaline earth metal ion Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 239000005365 phosphate glass Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Engineering & Computer Science (AREA)
- Solid State Image Pick-Up Elements (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Optical Filters (AREA)
- Surface Treatment Of Glass (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014157237A JP6272175B2 (ja) | 2014-07-31 | 2014-07-31 | 光学素子 |
| TW104108339A TWI682190B (zh) | 2014-03-19 | 2015-03-16 | 光學元件 |
| TW104108341A TWI636559B (zh) | 2014-07-31 | 2015-03-16 | 光學元件 |
| KR1020150038192A KR101988934B1 (ko) | 2014-03-19 | 2015-03-19 | 광학 소자 |
| CN201510121666.7A CN104932048A (zh) | 2014-03-19 | 2015-03-19 | 光学元件 |
| CN201520157237.0U CN204666855U (zh) | 2014-03-19 | 2015-03-19 | 光学元件 |
| CN201510122107.8A CN105093371B (zh) | 2014-07-31 | 2015-03-19 | 光学元件 |
| KR1020150083351A KR101985813B1 (ko) | 2014-07-31 | 2015-06-12 | 광학 소자 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014157237A JP6272175B2 (ja) | 2014-07-31 | 2014-07-31 | 光学素子 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2016033632A JP2016033632A (ja) | 2016-03-10 |
| JP6272175B2 true JP6272175B2 (ja) | 2018-01-31 |
Family
ID=54574221
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014157237A Active JP6272175B2 (ja) | 2014-03-19 | 2014-07-31 | 光学素子 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6272175B2 (zh) |
| KR (1) | KR101985813B1 (zh) |
| CN (1) | CN105093371B (zh) |
| TW (1) | TWI636559B (zh) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018200980A (ja) * | 2017-05-29 | 2018-12-20 | ソニーセミコンダクタソリューションズ株式会社 | 撮像装置および固体撮像素子、並びに電子機器 |
| CN116583619A (zh) * | 2020-12-02 | 2023-08-11 | 东海光学株式会社 | 光学薄膜的制造方法和光学薄膜 |
| TWI808479B (zh) | 2021-07-16 | 2023-07-11 | 大立光電股份有限公司 | 透鏡組、光學裝置與電子裝置 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5942749B2 (ja) * | 1979-07-11 | 1984-10-17 | 株式会社東芝 | 多層膜のエツチング方法 |
| JPS5630107A (en) * | 1979-08-21 | 1981-03-26 | Canon Inc | Color filter |
| JP2002372763A (ja) * | 2001-04-10 | 2002-12-26 | Mitsubishi Electric Corp | 赤外線カメラ用光学窓およびそれを用いた赤外線カメラ並びに赤外線カメラ用光学窓の製造方法 |
| JP3998234B2 (ja) * | 2001-11-09 | 2007-10-24 | キヤノン株式会社 | 撮像装置 |
| US20040071889A1 (en) * | 2002-08-07 | 2004-04-15 | Hoya Corporation | Method of producing an antireflection-coated substrate |
| JP4594703B2 (ja) | 2004-11-19 | 2010-12-08 | オリンパス株式会社 | 固体撮像素子ユニット |
| JP2007183366A (ja) * | 2006-01-05 | 2007-07-19 | Pentax Corp | 防塵性光透過性部材及びその用途、並びにその部材を具備する撮像装置 |
| JP2007242877A (ja) * | 2006-03-08 | 2007-09-20 | Sony Corp | 固体撮像素子 |
| JP2008258367A (ja) * | 2007-04-04 | 2008-10-23 | Matsushita Electric Ind Co Ltd | 固体撮像素子、固体撮像装置およびその製造方法 |
| JPWO2011055726A1 (ja) | 2009-11-04 | 2013-03-28 | 旭硝子株式会社 | 近赤外線カットフィルタ |
| TWI440969B (zh) * | 2009-12-22 | 2014-06-11 | Hon Hai Prec Ind Co Ltd | 遮光元件陣列之製造方法 |
| JP5663925B2 (ja) * | 2010-03-31 | 2015-02-04 | ソニー株式会社 | 固体撮像装置、および、その製造方法、電子機器 |
| JP2013012506A (ja) * | 2011-06-28 | 2013-01-17 | Sony Corp | 固体撮像素子の製造方法、固体撮像素子、電子機器の製造方法、および電子機器。 |
| KR20140089441A (ko) * | 2011-10-24 | 2014-07-14 | 아사히 가라스 가부시키가이샤 | 광학 필터와 그의 제조 방법, 및 촬상 장치 |
| CN204536583U (zh) * | 2014-03-19 | 2015-08-05 | 豪雅冠得股份有限公司 | 光学元件 |
-
2014
- 2014-07-31 JP JP2014157237A patent/JP6272175B2/ja active Active
-
2015
- 2015-03-16 TW TW104108341A patent/TWI636559B/zh active
- 2015-03-19 CN CN201510122107.8A patent/CN105093371B/zh active Active
- 2015-06-12 KR KR1020150083351A patent/KR101985813B1/ko active IP Right Grant
Also Published As
| Publication number | Publication date |
|---|---|
| TW201605033A (zh) | 2016-02-01 |
| JP2016033632A (ja) | 2016-03-10 |
| KR101985813B1 (ko) | 2019-06-05 |
| TWI636559B (zh) | 2018-09-21 |
| CN105093371A (zh) | 2015-11-25 |
| KR20160016581A (ko) | 2016-02-15 |
| CN105093371B (zh) | 2019-06-21 |
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