JP6271493B2 - 三次元計測装置 - Google Patents

三次元計測装置 Download PDF

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Publication number
JP6271493B2
JP6271493B2 JP2015239056A JP2015239056A JP6271493B2 JP 6271493 B2 JP6271493 B2 JP 6271493B2 JP 2015239056 A JP2015239056 A JP 2015239056A JP 2015239056 A JP2015239056 A JP 2015239056A JP 6271493 B2 JP6271493 B2 JP 6271493B2
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Japan
Prior art keywords
light
imaging
axis direction
beam splitter
incident
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JP2015239056A
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Japanese (ja)
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JP2017053832A (ja
JP2017053832A5 (enExample
Inventor
裕之 石垣
裕之 石垣
間宮　高弘
高弘 間宮
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CKD Corp
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CKD Corp
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Priority to TW105110999A priority Critical patent/TWI619927B/zh
Priority to PCT/JP2016/064465 priority patent/WO2016190151A1/ja
Priority to EP16799857.4A priority patent/EP3306264B1/en
Priority to CN201680005622.0A priority patent/CN107110640B/zh
Priority to KR1020177015655A priority patent/KR101931190B1/ko
Publication of JP2017053832A publication Critical patent/JP2017053832A/ja
Publication of JP2017053832A5 publication Critical patent/JP2017053832A5/ja
Priority to US15/820,816 priority patent/US10704888B2/en
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02029—Combination with non-interferometric systems, i.e. for measuring the object
    • G01B9/0203—With imaging systems
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02011—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal polarization variation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02018—Multipass interferometers, e.g. double-pass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02024—Measuring in transmission, i.e. light traverses the object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
    • G01B9/02078—Caused by ambiguity
    • G01B9/02079—Quadrature detection, i.e. detecting relatively phase-shifted signals
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
    • G01B9/02078—Caused by ambiguity
    • G01B9/02079—Quadrature detection, i.e. detecting relatively phase-shifted signals
    • G01B9/02081—Quadrature detection, i.e. detecting relatively phase-shifted signals simultaneous quadrature detection, e.g. by spatial phase shifting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/45—Multiple detectors for detecting interferometer signals
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
JP2015239056A 2015-05-25 2015-12-08 三次元計測装置 Active JP6271493B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
TW105110999A TWI619927B (zh) 2015-05-25 2016-04-08 Three-dimensional measuring device
EP16799857.4A EP3306264B1 (en) 2015-05-25 2016-05-16 Three-dimensional measurement device
CN201680005622.0A CN107110640B (zh) 2015-05-25 2016-05-16 三维测量装置
KR1020177015655A KR101931190B1 (ko) 2015-05-25 2016-05-16 삼차원 계측 장치
PCT/JP2016/064465 WO2016190151A1 (ja) 2015-05-25 2016-05-16 三次元計測装置
US15/820,816 US10704888B2 (en) 2015-05-25 2017-11-22 Three-dimensional measurement device

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2015105495 2015-05-25
JP2015105495 2015-05-25
JP2015177399 2015-09-09
JP2015177399 2015-09-09

Publications (3)

Publication Number Publication Date
JP2017053832A JP2017053832A (ja) 2017-03-16
JP2017053832A5 JP2017053832A5 (enExample) 2017-06-01
JP6271493B2 true JP6271493B2 (ja) 2018-01-31

Family

ID=58320729

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015239056A Active JP6271493B2 (ja) 2015-05-25 2015-12-08 三次元計測装置

Country Status (5)

Country Link
US (1) US10704888B2 (enExample)
EP (1) EP3306264B1 (enExample)
JP (1) JP6271493B2 (enExample)
KR (1) KR101931190B1 (enExample)
CN (1) CN107110640B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230096032A (ko) * 2020-10-27 2023-06-29 시케이디 가부시키가이샤 3차원 계측 장치
DE112021007144T5 (de) 2021-02-25 2023-12-07 Ckd Corporation Dreidimensionale messvorrichtung

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JP6279013B2 (ja) * 2016-05-26 2018-02-14 Ckd株式会社 三次元計測装置
JP6513619B2 (ja) * 2016-09-28 2019-05-15 Ckd株式会社 三次元計測装置
KR101860347B1 (ko) * 2016-11-29 2018-05-23 국방과학연구소 마이켈슨 간섭계의 하우징 시스템
KR102400937B1 (ko) * 2017-09-21 2022-05-24 (주)테크윙 형상 측정장치
JP7028623B2 (ja) * 2017-12-07 2022-03-02 Ckd株式会社 三次元計測装置
JP7565670B2 (ja) 2018-03-29 2024-10-11 Ckd株式会社 検査装置、ｐｔｐ包装機、及び、検査方法
JP7080718B2 (ja) * 2018-05-08 2022-06-06 株式会社ミツトヨ 光学装置及び形状測定方法
TWI770182B (zh) * 2018-05-31 2022-07-11 揚明光學股份有限公司 測量系統及測量方法
JP7192447B2 (ja) * 2018-11-30 2022-12-20 セイコーエプソン株式会社 分光カメラおよび電子機器
EP4443120A3 (en) 2020-02-13 2024-12-25 Hamamatsu Photonics K.K. Imaging unit and measurement device
US12181273B2 (en) * 2020-02-21 2024-12-31 Hamamatsu Photonics K.K. Three-dimensional measurement device
CN112739981B (zh) * 2021-02-23 2022-05-06 华为技术有限公司 一种光学系统、装置及终端
EP4141379B1 (en) * 2021-08-27 2025-10-01 Mitutoyo Corporation Method for improving a contrast of an interferogram in a polarizing fizeau interferometer
WO2023059618A1 (en) 2021-10-07 2023-04-13 Additive Monitoring Systems, Llc Structured light part quality monitoring for additive manufacturing and methods of use
CN114485476B (zh) * 2022-03-03 2024-03-15 华侨大学 一种晶圆测量设备、系统及方法
KR20240050067A (ko) 2022-10-11 2024-04-18 삼성전자주식회사 레벨 센서 및 이를 포함하는 기판 처리 장치
US12359972B2 (en) * 2022-10-17 2025-07-15 Lawrence Livermore National Security, Llc Three phase spectral interferometry
KR102705899B1 (ko) * 2023-03-13 2024-09-11 류영화 기하적 위상 광학 소자를 적용한 위상천이 방식의 위상 검출 장치

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230096032A (ko) * 2020-10-27 2023-06-29 시케이디 가부시키가이샤 3차원 계측 장치
DE112021005692T5 (de) 2020-10-27 2023-08-10 Ckd Corporation 3d-messgerät
KR102810799B1 (ko) 2020-10-27 2025-05-20 시케이디 가부시키가이샤 3차원 계측 장치
DE112021007144T5 (de) 2021-02-25 2023-12-07 Ckd Corporation Dreidimensionale messvorrichtung
US12359906B2 (en) 2021-02-25 2025-07-15 Ckd Corporation Three-dimensional measurement device

Also Published As

Publication number Publication date
US20180106590A1 (en) 2018-04-19
US10704888B2 (en) 2020-07-07
EP3306264A4 (en) 2019-02-13
JP2017053832A (ja) 2017-03-16
KR101931190B1 (ko) 2018-12-20
EP3306264B1 (en) 2022-08-03
KR20170083595A (ko) 2017-07-18
EP3306264A1 (en) 2018-04-11
CN107110640B (zh) 2019-08-13
CN107110640A (zh) 2017-08-29

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