CN107110640B - 三维测量装置 - Google Patents

三维测量装置 Download PDF

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Publication number
CN107110640B
CN107110640B CN201680005622.0A CN201680005622A CN107110640B CN 107110640 B CN107110640 B CN 107110640B CN 201680005622 A CN201680005622 A CN 201680005622A CN 107110640 B CN107110640 B CN 107110640B
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China
Prior art keywords
light
unit
incident
axis direction
beam splitter
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CN201680005622.0A
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Chinese (zh)
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CN107110640A (zh
Inventor
石垣裕之
间宫高弘
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CKD Corp
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CKD Corp
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Priority claimed from PCT/JP2016/064465 external-priority patent/WO2016190151A1/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02029—Combination with non-interferometric systems, i.e. for measuring the object
    • G01B9/0203—With imaging systems
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02011—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal polarization variation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02018—Multipass interferometers, e.g. double-pass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02024—Measuring in transmission, i.e. light traverses the object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
    • G01B9/02078—Caused by ambiguity
    • G01B9/02079—Quadrature detection, i.e. detecting relatively phase-shifted signals
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
    • G01B9/02078—Caused by ambiguity
    • G01B9/02079—Quadrature detection, i.e. detecting relatively phase-shifted signals
    • G01B9/02081—Quadrature detection, i.e. detecting relatively phase-shifted signals simultaneous quadrature detection, e.g. by spatial phase shifting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/45—Multiple detectors for detecting interferometer signals
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
CN201680005622.0A 2015-05-25 2016-05-16 三维测量装置 Active CN107110640B (zh)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2015-105495 2015-05-25
JP2015105495 2015-05-25
JP2015-177399 2015-09-09
JP2015177399 2015-09-09
JP2015239056A JP6271493B2 (ja) 2015-05-25 2015-12-08 三次元計測装置
JP2015-239056 2015-12-08
PCT/JP2016/064465 WO2016190151A1 (ja) 2015-05-25 2016-05-16 三次元計測装置

Publications (2)

Publication Number Publication Date
CN107110640A CN107110640A (zh) 2017-08-29
CN107110640B true CN107110640B (zh) 2019-08-13

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201680005622.0A Active CN107110640B (zh) 2015-05-25 2016-05-16 三维测量装置

Country Status (5)

Country Link
US (1) US10704888B2 (enExample)
EP (1) EP3306264B1 (enExample)
JP (1) JP6271493B2 (enExample)
KR (1) KR101931190B1 (enExample)
CN (1) CN107110640B (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
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JP6279013B2 (ja) * 2016-05-26 2018-02-14 Ckd株式会社 三次元計測装置
JP6513619B2 (ja) * 2016-09-28 2019-05-15 Ckd株式会社 三次元計測装置
KR101860347B1 (ko) * 2016-11-29 2018-05-23 국방과학연구소 마이켈슨 간섭계의 하우징 시스템
KR102400937B1 (ko) * 2017-09-21 2022-05-24 (주)테크윙 형상 측정장치
JP7028623B2 (ja) * 2017-12-07 2022-03-02 Ckd株式会社 三次元計測装置
JP7565670B2 (ja) 2018-03-29 2024-10-11 Ckd株式会社 検査装置、ｐｔｐ包装機、及び、検査方法
JP7080718B2 (ja) * 2018-05-08 2022-06-06 株式会社ミツトヨ 光学装置及び形状測定方法
TWI770182B (zh) * 2018-05-31 2022-07-11 揚明光學股份有限公司 測量系統及測量方法
JP7192447B2 (ja) * 2018-11-30 2022-12-20 セイコーエプソン株式会社 分光カメラおよび電子機器
EP4443120A3 (en) 2020-02-13 2024-12-25 Hamamatsu Photonics K.K. Imaging unit and measurement device
US12181273B2 (en) * 2020-02-21 2024-12-31 Hamamatsu Photonics K.K. Three-dimensional measurement device
JP7300432B2 (ja) * 2020-10-27 2023-06-29 Ckd株式会社 三次元計測装置
CN112739981B (zh) * 2021-02-23 2022-05-06 华为技术有限公司 一种光学系统、装置及终端
JP7442145B2 (ja) 2021-02-25 2024-03-04 Ckd株式会社 三次元計測装置
EP4141379B1 (en) * 2021-08-27 2025-10-01 Mitutoyo Corporation Method for improving a contrast of an interferogram in a polarizing fizeau interferometer
WO2023059618A1 (en) 2021-10-07 2023-04-13 Additive Monitoring Systems, Llc Structured light part quality monitoring for additive manufacturing and methods of use
CN114485476B (zh) * 2022-03-03 2024-03-15 华侨大学 一种晶圆测量设备、系统及方法
KR20240050067A (ko) 2022-10-11 2024-04-18 삼성전자주식회사 레벨 센서 및 이를 포함하는 기판 처리 장치
US12359972B2 (en) * 2022-10-17 2025-07-15 Lawrence Livermore National Security, Llc Three phase spectral interferometry
KR102705899B1 (ko) * 2023-03-13 2024-09-11 류영화 기하적 위상 광학 소자를 적용한 위상천이 방식의 위상 검출 장치

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JPH11211417A (ja) * 1998-01-22 1999-08-06 Nikon Corp 光波干渉測定方法および装置
JP2000074618A (ja) * 1998-08-27 2000-03-14 Fuji Xerox Co Ltd 干渉計測方法および干渉計測装置
JP2000310518A (ja) * 1999-04-27 2000-11-07 Olympus Optical Co Ltd ３次元形状測定装置
CN1766519A (zh) * 2004-10-26 2006-05-03 株式会社三丰 单块正交探测器
CN1826518A (zh) * 2003-06-19 2006-08-30 麻省理工学院 用于相位测量的系统和方法
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JP2007093288A (ja) * 2005-09-27 2007-04-12 Matsushita Electric Ind Co Ltd 光計測装置及び光計測方法
JP2010164389A (ja) * 2009-01-14 2010-07-29 Canon Inc 調整方法
JP2013238850A (ja) * 2012-04-20 2013-11-28 Tohoku Univ 多機能画像取得装置およびケスタープリズム
CN103961059A (zh) * 2013-01-24 2014-08-06 日立视听媒体股份有限公司 光断层观察装置以及光断层观察方法
CN104359862A (zh) * 2014-11-06 2015-02-18 佛山市南海区欧谱曼迪科技有限责任公司 一种基于光外差干涉术的共聚焦扫描显微成像方法及系统

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JP3426552B2 (ja) * 2000-02-18 2003-07-14 株式会社ミツトヨ 形状計測装置
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Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11211417A (ja) * 1998-01-22 1999-08-06 Nikon Corp 光波干渉測定方法および装置
JP2000074618A (ja) * 1998-08-27 2000-03-14 Fuji Xerox Co Ltd 干渉計測方法および干渉計測装置
JP2000310518A (ja) * 1999-04-27 2000-11-07 Olympus Optical Co Ltd ３次元形状測定装置
CN1826518A (zh) * 2003-06-19 2006-08-30 麻省理工学院 用于相位测量的系统和方法
CN1766519A (zh) * 2004-10-26 2006-05-03 株式会社三丰 单块正交探测器
JP2006308594A (ja) * 2005-04-29 2006-11-09 Agilent Technol Inc 低い非線形誤差の変位測定干渉計
JP2007093288A (ja) * 2005-09-27 2007-04-12 Matsushita Electric Ind Co Ltd 光計測装置及び光計測方法
JP2010164389A (ja) * 2009-01-14 2010-07-29 Canon Inc 調整方法
JP2013238850A (ja) * 2012-04-20 2013-11-28 Tohoku Univ 多機能画像取得装置およびケスタープリズム
CN103961059A (zh) * 2013-01-24 2014-08-06 日立视听媒体股份有限公司 光断层观察装置以及光断层观察方法
CN104359862A (zh) * 2014-11-06 2015-02-18 佛山市南海区欧谱曼迪科技有限责任公司 一种基于光外差干涉术的共聚焦扫描显微成像方法及系统

Also Published As

Publication number Publication date
US20180106590A1 (en) 2018-04-19
US10704888B2 (en) 2020-07-07
EP3306264A4 (en) 2019-02-13
JP2017053832A (ja) 2017-03-16
KR101931190B1 (ko) 2018-12-20
EP3306264B1 (en) 2022-08-03
KR20170083595A (ko) 2017-07-18
EP3306264A1 (en) 2018-04-11
JP6271493B2 (ja) 2018-01-31
CN107110640A (zh) 2017-08-29

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