JP6263175B2 - プラズマ生成用の表面波アプリケータ - Google Patents

プラズマ生成用の表面波アプリケータ Download PDF

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Publication number
JP6263175B2
JP6263175B2 JP2015520974A JP2015520974A JP6263175B2 JP 6263175 B2 JP6263175 B2 JP 6263175B2 JP 2015520974 A JP2015520974 A JP 2015520974A JP 2015520974 A JP2015520974 A JP 2015520974A JP 6263175 B2 JP6263175 B2 JP 6263175B2
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Japan
Prior art keywords
tube
dielectric
applicator
plasma
coaxial
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JP2015520974A
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English (en)
Japanese (ja)
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JP2015530694A (ja
Inventor
ラコステ、アナ
ペレティエール、ジャック
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Universite Joseph Fourier Grenoble 1
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Universite Joseph Fourier Grenoble 1
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Publication of JP2015530694A publication Critical patent/JP2015530694A/ja
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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges
    • H05H1/4615—Microwave discharges using surface waves

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
JP2015520974A 2012-07-11 2013-07-10 プラズマ生成用の表面波アプリケータ Active JP6263175B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1256673 2012-07-11
FR1256673A FR2993428B1 (fr) 2012-07-11 2012-07-11 Applicateur d'onde de surface pour la production de plasma
PCT/EP2013/064578 WO2014009412A1 (fr) 2012-07-11 2013-07-10 Applicateur d'onde de surface pour la production de plasma

Publications (2)

Publication Number Publication Date
JP2015530694A JP2015530694A (ja) 2015-10-15
JP6263175B2 true JP6263175B2 (ja) 2018-01-17

Family

ID=46963891

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015520974A Active JP6263175B2 (ja) 2012-07-11 2013-07-10 プラズマ生成用の表面波アプリケータ

Country Status (5)

Country Link
EP (1) EP2873307B1 (fr)
JP (1) JP6263175B2 (fr)
CN (1) CN104782235B (fr)
FR (1) FR2993428B1 (fr)
WO (1) WO2014009412A1 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3042092B1 (fr) * 2015-10-05 2019-07-26 Sairem Societe Pour L'application Industrielle De La Recherche En Electronique Et Micro Ondes Dispositif elementaire de production d’un plasma avec applicateur coaxial
FR3052326B1 (fr) * 2016-06-07 2018-06-29 Thales Generateur de plasma
KR101820242B1 (ko) * 2016-08-02 2018-01-18 한국기초과학지원연구원 수냉식 표면파 플라즈마 발생장치
KR101830007B1 (ko) * 2016-11-11 2018-02-19 한국기초과학지원연구원 동축 케이블 연결형 수냉식 표면파 플라즈마 발생장치
US11564292B2 (en) * 2019-09-27 2023-01-24 Applied Materials, Inc. Monolithic modular microwave source with integrated temperature control

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS579868A (en) * 1980-06-18 1982-01-19 Toshiba Corp Surface treating apparatus with microwave plasma
FR2583250B1 (fr) * 1985-06-07 1989-06-30 France Etat Procede et dispositif d'excitation d'un plasma par micro-ondes a la resonance cyclotronique electronique
JPH0594899A (ja) * 1991-10-02 1993-04-16 Nippon Steel Corp プラズマ処理装置
JPH0685525A (ja) * 1992-08-31 1994-03-25 Kyocera Corp １／２波長アンテナ
JPH05347508A (ja) * 1992-10-30 1993-12-27 Harada Ind Co Ltd 広帯域極超短波アンテナ
JPH0729889A (ja) * 1993-07-08 1995-01-31 Anelva Corp マイクロ波プラズマ処理装置
JPH0821476B2 (ja) * 1993-09-20 1996-03-04 ニチメン電子工研株式会社 Ｅｃｒプラズマ発生装置
JPH07161491A (ja) * 1993-12-02 1995-06-23 Daido Steel Co Ltd マイクロ波プラズマ処理装置
JPH0935651A (ja) * 1995-07-20 1997-02-07 Nissin Electric Co Ltd イオン源
JPH09245997A (ja) * 1996-03-05 1997-09-19 Nissin Electric Co Ltd カバーで覆われた内壁とアンテナを持つプラズマ室
JPH1083895A (ja) * 1996-09-06 1998-03-31 Hitachi Ltd プラズマ処理装置
JPH11102799A (ja) * 1997-09-26 1999-04-13 Mitsubishi Electric Corp プラズマ発生装置
JP4089022B2 (ja) * 1998-07-22 2008-05-21 日新イオン機器株式会社 自己電子放射型ｅｃｒイオンプラズマ源
JP2000277295A (ja) * 1999-03-25 2000-10-06 Toshiba Corp プラズマ処理装置
JP2002093597A (ja) * 2000-09-14 2002-03-29 Miura Gakuen プラズマ発生用アンテナ、プラズマ処理装置、プラズマ処理方法、及び被処理物の製造方法、並びに半導体装置の製造方法
FR2840451B1 (fr) * 2002-06-04 2004-08-13 Centre Nat Rech Scient Dispositif de production d'une nappe de plasma
JP5312411B2 (ja) * 2003-02-14 2013-10-09 東京エレクトロン株式会社 プラズマ発生装置およびリモートプラズマ処理装置
JP2005116362A (ja) * 2003-10-08 2005-04-28 Toshiba Corp マイクロ波励起のプラズマ処理装置およびプラズマ処理方法
JP2005353364A (ja) * 2004-06-09 2005-12-22 Shibaura Mechatronics Corp プラズマ発生装置、プラズマ処理装置及びプラズマ処理方法
JP4761244B2 (ja) * 2005-10-20 2011-08-31 株式会社小糸製作所 放電灯及び光源装置
JP4967107B2 (ja) * 2006-02-20 2012-07-04 国立大学法人名古屋大学 マイクロ波導入器、プラズマ発生装置及びプラズマ処理装置
FR2904177B1 (fr) * 2006-07-21 2008-11-07 Centre Nat Rech Scient Dispositif et procede de production et de confinement d'un plasma.
DE102006037144B4 (de) * 2006-08-09 2010-05-20 Roth & Rau Ag ECR-Plasmaquelle
FR2938150B1 (fr) * 2008-10-30 2010-12-17 Centre Nat Rech Scient Dispositif et procede de production et/ou de confinement d'un plasma
TW201105183A (en) * 2009-07-21 2011-02-01 Delta Electronics Inc Plasma generating apparatus
FR2955451A1 (fr) * 2010-05-25 2011-07-22 Centre Nat Rech Scient Dispositif de production d'un plasma, comportant au moins un applicateur coaxial

Also Published As

Publication number Publication date
CN104782235B (zh) 2017-03-08
FR2993428A1 (fr) 2014-01-17
EP2873307B1 (fr) 2016-07-06
FR2993428B1 (fr) 2014-08-08
EP2873307A1 (fr) 2015-05-20
WO2014009412A1 (fr) 2014-01-16
CN104782235A (zh) 2015-07-15
JP2015530694A (ja) 2015-10-15

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