JP6247106B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP6247106B2 JP6247106B2 JP2014018663A JP2014018663A JP6247106B2 JP 6247106 B2 JP6247106 B2 JP 6247106B2 JP 2014018663 A JP2014018663 A JP 2014018663A JP 2014018663 A JP2014018663 A JP 2014018663A JP 6247106 B2 JP6247106 B2 JP 6247106B2
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Description
なお、添付図面は、部分的に拡大して示している場合があり、寸法,比率などは実際と異なる場合がある。また、断面図では、各部材の断面構造を分かりやすくするために、一部のハッチングを省略している。
図1(b)に示すように、配線基板20はコア基板41を有している。
コア基板41は、例えば補強材であるガラスクロス(ガラス織布)にエポキシ樹脂を主成分とする熱硬化性の絶縁性樹脂を含浸させ硬化させた、いわゆるガラスエポキシ基板である。補強材としてはガラスクロスに限らず、例えばガラス不織布、アラミド織布、アラミド不織布、液晶ポリマ(Liquid Crystal Polymer:LCP)織布やLCP不織布を用いることができる。また、熱硬化性の絶縁性樹脂としては、エポキシ樹脂に限らず、例えばポリイミド樹脂やシアネート樹脂などの絶縁性樹脂を用いることができる。
図1(b)に示すように、配線基板20の上面20aと半導体素子31の上面31aとがほぼ同じ高さとなっている。したがって、短いボンディングワイヤ32により、半導体素子31と配線基板20に形成されたアンテナ23とを接続することができる。これにより、半導体素子31とアンテナ23との間において伝送される高周波信号の品質低下が抑制される。
なお、各図において、工程の説明に必要な符号を付し、一部の符号を省略することがある。
たとえばコア基板41となる銅張積層板に貫通孔42a,42bを形成し、電解めっきやペースト充填などの方法により貫通孔42a,42b内に貫通電極43a,43bを形成する。銅張積層板は、たとえばプリプレグの両面に銅箔を載せ、加熱加圧することで形成される。貫通孔42a,42bは、たとえばレーザ加工機やドリル機により形成される。続いて、たとえばサブトラクティブ法により、コア基板41の上面41aに配線層44を形成するとともに、コア基板41の下面41bに配線層45を形成する。配線層44,45はそれぞれアンテナを構成する配線44a,45aを含む。なお、配線層44,45を、例えばセミアディティブ法、アディティブ法により形成してもよい。
たとえばビルドアップ法により、絶縁層51,53,61,63、配線層52,54,62,64、ビア55,56,65,66を形成する。
(1)配線基板20の凹部(キャビティ)21には半導体素子31が搭載されている。配線基板20の上面20aにはアンテナ23の配線24が形成され、この配線24は電極パッド22aとボンディングワイヤ32を介して半導体素子31に接続されている。配線基板20の上面20aの配線24、半導体素子31、及びボンディングワイヤ32は、保護膜71(71a)により被覆されている。したがって、レジスト膜やキャップ等を用いることなく、配線層54,半導体素子31,ボンディングワイヤ32に対する水分等の異物の付着や酸化等を防止することができる。これにより、半導体装置10の信頼性を向上できる。
(4)配線基板20の上面20aと半導体素子31の上面31aとがほぼ同じ高さとなっている。したがって、短いボンディングワイヤ32により、半導体素子31と配線基板20に形成されたアンテナ23とを接続することができる。これにより、半導体素子31とアンテナ23との間において伝送される高周波信号の品質低下を抑制することができる。
尚、上記各実施形態は、以下の態様で実施してもよい。
・上記実施形態に対し、アンテナ23の形状を適宜変更してもよい。
したがって、図8に示す半導体装置100のように、複数の絶縁層51,53を貫通し、更にコア基板41を切削加工して凹部21を形成してもよい。このように形成した凹部(キャビティ)21によって半導体素子31の上面31aの高さを配線基板20の上面20aの高さとほぼ一致させ、短いボンディングワイヤ32によって半導体素子31と配線基板20の電極パッド22,22aとを接続し、半導体素子31とアンテナ23(配線24)とを接続することができる。
たとえば、図10(a)に示す半導体装置120のように、配線基板20の側面20cを露出する、つまり図1(b)に示す保護膜71cを省略してもよい。たとえば、複数の半導体装置を形成する構造体の上面と下面に保護膜71(71a,71b)を形成し、その構造体を個片化して複数の半導体装置を形成する。このようにして形成された半導体装置においても、上記実施形態と同様の効果が得られる。
たとえば図11に示すように、半導体装置140は、キャップ141を有している。キャップ141は、半導体素子31及びボンディングワイヤ32より外側であって、保護膜71(71a)の上面に、接着剤142によって取着されている。キャップ141は、凹状に成形された中空状に形成され、半導体素子31及びボンディングワイヤ32を覆っている。そして、アンテナ23の配線24とこれを覆う保護膜71dは、キャップ141によって覆われることなく露出している。キャップ141の材料は、耐熱性を有する樹脂であり、たとえばエポキシ系樹脂である。接着剤142は、耐熱性を有する樹脂であり、例えばエポキシ系樹脂等の熱硬化性樹脂である。なお、保護膜71の誘電率は、キャップ141や接着剤142の誘電率より低い。キャップ141と接着剤142は、外部接続端子81を形成する際のリフロー温度(例えば、240〜260℃前後)に耐え得るものである。このキャップ141は、半導体素子31やボンディングワイヤ32に対して、半導体装置140外部からの接触等を防止する。半導体素子31やボンディングワイヤ32に対する接触は、半導体素子31の損傷やボンディングワイヤ32の断線の要因となる。したがって、キャップ141により、半導体装置140の信頼性向上を図ることができる。なお、キャップ141に対して配線24が露出するため、キャップ141はアンテナ23の特性に影響しない。
20a 上面(第1面)
20b 下面(第2面)
20c 側面
22,22a 電極パッド
23 アンテナ
24 配線
21 凹部(キャビティ)
31 半導体素子
32 ボンディングワイヤ
44a,45a,52a,62a 配線
43a 貫通電極
55a,56a,65a ビア
71,71a〜71c 保護膜
71X 開口部
P1 接続パッド
Claims (7)
- 互いに対向する第1面及び第2面と、前記第1面に形成されたキャビティと、前記キャビティの周囲の前記第1面に形成された電極パッドと、前記第1面に形成された高周波用の配線とを有する配線基板と、
前記キャビティ内に搭載された半導体素子と、
前記半導体素子と前記電極パッドとを接続するボンディングワイヤと、
前記第1面、前記半導体素子、前記ボンディングワイヤ、及び前記高周波用の配線の表面に沿って、膜状に設けられた第1の保護膜と、
前記第1面に取着され、前記半導体素子と前記ボンディングワイヤを覆うキャップと、
を有し、
前記高周波用の配線は前記キャップから露出していること、
を特徴とする半導体装置。 - 前記高周波用の配線はアンテナであり、該アンテナは前記第1の保護膜により被覆されていること、
を特徴とする請求項1に記載の半導体装置。 - 前記配線基板の第1面と対向する第2面に形成された接続パッドと、
前記接続パッドを露出する開口部を有し、前記第2面を覆う第2の保護膜と、
を備えたことを特徴とする請求項1または2に記載の半導体装置。 - 前記配線基板の第1面と対向する第2面に形成された接続パッドと、
前記接続パッドを露出する開口を有し前記第2面を覆うソルダーレジスト膜と、
前記ソルダーレジスト膜を被覆する第2の保護膜と、
を備えたことを特徴とする請求項1または2に記載の半導体装置。 - 前記第1の保護膜及び前記第2の保護膜と連続し、前記配線基板の側面を覆う第3の保護膜を備えたこと、
を特徴とする請求項3または4に記載の半導体装置。 - 前記配線基板は複数の配線層を有する多層配線基板であり、
前記高周波用の配線は、前記複数の配線層の配線と接続されて高周波用のアンテナを構成すること、
を特徴とする請求項1〜5のいずれか一項に記載の半導体装置。 - 前記第1の保護膜は、パラキシリレン系樹脂、アクリル系樹脂、フッ素樹脂の何れか1つの樹脂であることを特徴とする請求項1〜6のいずれか一項に記載の半導体装置。
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