JP6160356B2 - 蒸着用マスクおよび表示装置の製造方法 - Google Patents

蒸着用マスクおよび表示装置の製造方法 Download PDF

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Publication number
JP6160356B2
JP6160356B2 JP2013168591A JP2013168591A JP6160356B2 JP 6160356 B2 JP6160356 B2 JP 6160356B2 JP 2013168591 A JP2013168591 A JP 2013168591A JP 2013168591 A JP2013168591 A JP 2013168591A JP 6160356 B2 JP6160356 B2 JP 6160356B2
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Japan
Prior art keywords
mask
movable member
vapor deposition
base material
mask body
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Expired - Fee Related
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JP2013168591A
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English (en)
Japanese (ja)
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JP2015036451A5 (enExample
JP2015036451A (ja
Inventor
健太朗 栗山
健太朗 栗山
石川　博一
博一 石川
智弘 久保
智弘 久保
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
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Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP2013168591A priority Critical patent/JP6160356B2/ja
Priority to US14/453,681 priority patent/US9761802B2/en
Publication of JP2015036451A publication Critical patent/JP2015036451A/ja
Publication of JP2015036451A5 publication Critical patent/JP2015036451A5/ja
Application granted granted Critical
Publication of JP6160356B2 publication Critical patent/JP6160356B2/ja
Expired - Fee Related legal-status Critical Current
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
JP2013168591A 2013-08-14 2013-08-14 蒸着用マスクおよび表示装置の製造方法 Expired - Fee Related JP6160356B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2013168591A JP6160356B2 (ja) 2013-08-14 2013-08-14 蒸着用マスクおよび表示装置の製造方法
US14/453,681 US9761802B2 (en) 2013-08-14 2014-08-07 Evaporation mask and method of manufacturing display unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013168591A JP6160356B2 (ja) 2013-08-14 2013-08-14 蒸着用マスクおよび表示装置の製造方法

Publications (3)

Publication Number Publication Date
JP2015036451A JP2015036451A (ja) 2015-02-23
JP2015036451A5 JP2015036451A5 (enExample) 2016-03-31
JP6160356B2 true JP6160356B2 (ja) 2017-07-12

Family

ID=52467125

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013168591A Expired - Fee Related JP6160356B2 (ja) 2013-08-14 2013-08-14 蒸着用マスクおよび表示装置の製造方法

Country Status (2)

Country Link
US (1) US9761802B2 (enExample)
JP (1) JP6160356B2 (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101813549B1 (ko) * 2011-05-06 2018-01-02 삼성디스플레이 주식회사 분할 마스크와 그 분할 마스크를 포함한 마스크 프레임 조립체의 조립장치
KR102352280B1 (ko) * 2015-04-28 2022-01-18 삼성디스플레이 주식회사 마스크 프레임 조립체 제조 장치 및 이를 이용한 마스크 프레임 조립체 제조 방법
KR102411540B1 (ko) 2015-11-06 2022-06-22 삼성디스플레이 주식회사 마스크 프레임 조립체, 그 제조 방법 및 표시 장치의 제조 방법
KR20170059526A (ko) * 2015-11-20 2017-05-31 삼성디스플레이 주식회사 마스크 프레임 조립체, 마스크 프레임 조립체 제조 방법 및 표시 장치 제조 방법
CN105607412A (zh) * 2016-01-04 2016-05-25 京东方科技集团股份有限公司 掩膜版安装框架和利用掩膜版安装框架固定掩膜版的方法
CN205420527U (zh) * 2016-03-18 2016-08-03 合肥鑫晟光电科技有限公司 一种蒸镀掩模板及显示基板
US10886128B2 (en) * 2016-03-28 2021-01-05 Hon Hai Precision Industry Co., Ltd. Method and apparatus for manufacturing vapor deposition mask
JP6722512B2 (ja) * 2016-05-23 2020-07-15 マクセルホールディングス株式会社 蒸着マスクおよびその製造方法
JP6892743B2 (ja) * 2016-06-17 2021-06-23 株式会社トプコン 製膜装置
KR101834194B1 (ko) * 2016-07-13 2018-03-05 주식회사 케이피에스 텐션마스크 프레임 어셈블리의 제조 장치 및 방법
KR102618351B1 (ko) * 2016-07-19 2023-12-28 삼성디스플레이 주식회사 패턴위치조정기구가 구비된 마스크 프레임 조립체 및 그것을 이용한 패턴 위치 조정 방법
CN106119773B (zh) * 2016-08-03 2018-10-26 京东方科技集团股份有限公司 掩膜板及其制造方法、蒸镀掩膜板组件及其制造方法
KR102696806B1 (ko) * 2016-09-22 2024-08-21 삼성디스플레이 주식회사 증착용 마스크, 표시 장치의 제조 장치 및 표시 장치의 제조 방법
CN106702318B (zh) * 2016-12-12 2018-11-23 京东方科技集团股份有限公司 掩膜框架及制造方法和掩膜板
CN106995912A (zh) * 2017-05-27 2017-08-01 京东方科技集团股份有限公司 一种用于固定掩膜版的框架
KR102668687B1 (ko) 2018-09-28 2024-05-24 삼성디스플레이 주식회사 마스크 프레임 조립체 및 그 제조방법
CN114945866A (zh) * 2020-01-15 2022-08-26 三星显示有限公司 掩模
CN111593299B (zh) * 2020-06-29 2024-05-14 京东方科技集团股份有限公司 掩膜板及其制造方法
CN113637940A (zh) * 2021-08-30 2021-11-12 重庆翰博显示科技研发中心有限公司 一种能够提高蒸镀品质的oled蒸镀用掩膜板及其应用方法
CN116162894B (zh) * 2023-02-28 2024-09-10 京东方科技集团股份有限公司 掩膜版及其制作方法
JP2024160514A (ja) * 2023-05-01 2024-11-14 株式会社ブイ・イー・ティー 蒸着マスクのためのマスクフレーム

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3431667B2 (ja) * 1993-07-17 2003-07-28 有限会社森板金製作所 クリーム半田用メタルマスクおよび枠への取付方法
JP2003039633A (ja) * 2001-08-01 2003-02-13 Ngk Spark Plug Co Ltd スクリーン印刷方法及びセラミック製配線基板の製造方法、並びにスクリーン印刷用マスク
WO2003019988A1 (en) * 2001-08-24 2003-03-06 Dai Nippon Printing Co., Ltd. Multi-face forming mask device for vacuum deposition
JP2004006257A (ja) 2002-04-26 2004-01-08 Tohoku Pioneer Corp 真空蒸着用マスク及びこれを用いて製造された有機ｅｌディスプレイパネル
JP2004247718A (ja) * 2003-01-23 2004-09-02 Yamaha Corp ホトマスクホルダーおよびホトマスク固定方法
US20040163592A1 (en) * 2003-02-20 2004-08-26 Tohoku Poineer Corporation Mask for vacuum deposition and organic EL display panel manufactured by using the same
JP2004269968A (ja) * 2003-03-10 2004-09-30 Sony Corp 蒸着用マスク
JP4860909B2 (ja) * 2004-05-25 2012-01-25 キヤノン株式会社 マスク構造体
KR100682760B1 (ko) * 2005-03-22 2007-02-15 엘지전자 주식회사 유기전계발광표시소자의 제조장치
JP2009064608A (ja) * 2007-09-05 2009-03-26 Sony Corp 蒸着用マスクおよびその製造方法ならびに表示装置の製造方法
JP2010135269A (ja) * 2008-12-08 2010-06-17 Sony Corp 蒸着用マスク
KR101107159B1 (ko) * 2009-12-17 2012-01-25 삼성모바일디스플레이주식회사 평판 표시장치의 박막 증착용 마스크 조립체
KR101853265B1 (ko) * 2011-03-15 2018-05-02 삼성디스플레이 주식회사 증착 마스크
KR101813549B1 (ko) * 2011-05-06 2018-01-02 삼성디스플레이 주식회사 분할 마스크와 그 분할 마스크를 포함한 마스크 프레임 조립체의 조립장치
JPWO2013150699A1 (ja) * 2012-04-05 2015-12-17 ソニー株式会社 マスク調整ユニット、マスク装置及びマスクの製造装置及び製造方法
WO2014176163A1 (en) * 2013-04-22 2014-10-30 Applied Materials, Inc. Actively-aligned fine metal mask

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Publication number Publication date
US9761802B2 (en) 2017-09-12
US20150050767A1 (en) 2015-02-19
JP2015036451A (ja) 2015-02-23

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