JP6124641B2 - 波面収差計測方法、波面収差計測装置および光学素子の製造方法 - Google Patents

波面収差計測方法、波面収差計測装置および光学素子の製造方法 Download PDF

Info

Publication number
JP6124641B2
JP6124641B2 JP2013063405A JP2013063405A JP6124641B2 JP 6124641 B2 JP6124641 B2 JP 6124641B2 JP 2013063405 A JP2013063405 A JP 2013063405A JP 2013063405 A JP2013063405 A JP 2013063405A JP 6124641 B2 JP6124641 B2 JP 6124641B2
Authority
JP
Japan
Prior art keywords
wavefront
differential
test object
calculating
wavefront aberration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2013063405A
Other languages
English (en)
Japanese (ja)
Other versions
JP2014190705A (ja
JP2014190705A5 (enExample
Inventor
正磨 加藤
正磨 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2013063405A priority Critical patent/JP6124641B2/ja
Priority to DE201410004005 priority patent/DE102014004005A1/de
Priority to US14/224,285 priority patent/US9557241B2/en
Publication of JP2014190705A publication Critical patent/JP2014190705A/ja
Publication of JP2014190705A5 publication Critical patent/JP2014190705A5/ja
Application granted granted Critical
Publication of JP6124641B2 publication Critical patent/JP6124641B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Spectroscopy & Molecular Physics (AREA)
JP2013063405A 2013-03-26 2013-03-26 波面収差計測方法、波面収差計測装置および光学素子の製造方法 Active JP6124641B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2013063405A JP6124641B2 (ja) 2013-03-26 2013-03-26 波面収差計測方法、波面収差計測装置および光学素子の製造方法
DE201410004005 DE102014004005A1 (de) 2013-03-26 2014-03-19 Verfahren und Vorrichtung zur Wellenfrontmessung und Herstellverfahren für ein optisches Element
US14/224,285 US9557241B2 (en) 2013-03-26 2014-03-25 Wavefront aberration measuring method, wavefront aberration measuring apparatus and optical element manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013063405A JP6124641B2 (ja) 2013-03-26 2013-03-26 波面収差計測方法、波面収差計測装置および光学素子の製造方法

Publications (3)

Publication Number Publication Date
JP2014190705A JP2014190705A (ja) 2014-10-06
JP2014190705A5 JP2014190705A5 (enExample) 2016-05-19
JP6124641B2 true JP6124641B2 (ja) 2017-05-10

Family

ID=51519868

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013063405A Active JP6124641B2 (ja) 2013-03-26 2013-03-26 波面収差計測方法、波面収差計測装置および光学素子の製造方法

Country Status (3)

Country Link
US (1) US9557241B2 (enExample)
JP (1) JP6124641B2 (enExample)
DE (1) DE102014004005A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109506897A (zh) * 2017-09-15 2019-03-22 东大光电股份有限公司 波前量测系统

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104238284B (zh) * 2014-09-25 2016-08-17 中国科学院光电技术研究所 一种基于光栅泰伯效应的检焦方法
JP6838075B2 (ja) * 2015-12-12 2021-03-03 ザ セクレタリー，デパートメント オブ エレクトロニクス アンド インフォメーション テクノロジー（ディーイーアイティーワイ） 薄膜における表面プロファイル及び／または厚さ測定値をモニターするためのシステム、装置、及び方法
WO2020073346A1 (zh) * 2018-10-11 2020-04-16 广州博冠光电科技股份有限公司 一种基于数字激光全息快速检测透镜中心偏的装置及方法
JP7277101B2 (ja) 2018-10-11 2023-05-18 キヤノン株式会社 収差推定方法、収差推定装置、プログラムおよび記憶媒体
CN109900201B (zh) * 2019-03-12 2020-10-16 中国科学院上海光学精密机械研究所 光栅剪切干涉光学成像系统波像差检测方法
CN109900200B (zh) * 2019-03-12 2020-10-16 中国科学院上海光学精密机械研究所 基于光栅剪切干涉的光学成像系统的波像差检测方法
CN111665023B (zh) * 2020-06-24 2021-10-12 中国科学院西安光学精密机械研究所 一种望远镜畸变测量装置及方法
EP4242621B1 (en) * 2020-12-10 2025-01-15 Mitsubishi Electric Corporation Wavefront measurement device and wavefront measurement method
CN115436025B (zh) * 2022-09-28 2025-05-13 中国科学院上海光学精密机械研究所 基于光栅剪切干涉的光学系统数值孔径的测量方法
CN117537937B (zh) * 2024-01-05 2024-04-16 国科大杭州高等研究院 一种抑制差分波前传感技术非线性的指向控制系统

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2831428B2 (ja) * 1990-03-20 1998-12-02 オリンパス光学工業株式会社 非球面形状測定機
JPH04155225A (ja) * 1990-10-17 1992-05-28 Ando Electric Co Ltd レーザダイオードの放射特性測定装置
US5898501A (en) * 1996-07-25 1999-04-27 Nikon Corporation Apparatus and methods for measuring wavefront aberrations of a microlithography projection lens
CN100346150C (zh) * 2000-12-28 2007-10-31 株式会社尼康 成象状态调节法、曝光法及设备以及器件制造方法
JP2009004711A (ja) * 2007-06-25 2009-01-08 Canon Inc 計測装置、露光装置及びデバイス製造方法
JP5351976B2 (ja) * 2008-12-09 2013-11-27 ザイゴ コーポレーション 二重グレーチング横方向シアリング波面センサ
JP5008650B2 (ja) 2008-12-25 2012-08-22 キヤノン株式会社 屈折率分布計測方法及び屈折率分布計測装置
JP5008763B2 (ja) * 2010-12-03 2012-08-22 キヤノン株式会社 屈折率分布計測方法、屈折率分布計測装置および光学素子の製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109506897A (zh) * 2017-09-15 2019-03-22 东大光电股份有限公司 波前量测系统
CN109506897B (zh) * 2017-09-15 2020-10-16 东大光电股份有限公司 波前量测系统

Also Published As

Publication number Publication date
DE102014004005A1 (de) 2014-10-02
JP2014190705A (ja) 2014-10-06
US20140293275A1 (en) 2014-10-02
US9557241B2 (en) 2017-01-31

Similar Documents

Publication Publication Date Title
JP6124641B2 (ja) 波面収差計測方法、波面収差計測装置および光学素子の製造方法
JP5021054B2 (ja) 屈折率分布計測方法および屈折率分布計測装置
JP5008650B2 (ja) 屈折率分布計測方法及び屈折率分布計測装置
JP5008763B2 (ja) 屈折率分布計測方法、屈折率分布計測装置および光学素子の製造方法
CN101495833B (zh) 确定光学表面的实际形状偏离理想形状的偏差的方法和装置
JP4968965B2 (ja) 屈折率分布の計測方法および計測装置
US8508725B2 (en) Refractive index distribution measuring method and apparatus using position measurement and a reference object
JP2019090819A (ja) 回折光学素子及び測定方法
JP6364551B2 (ja) 干渉計
US8786863B2 (en) Transmitted wavefront measuring method, refractive-index distribution measuring method, and transmitted wavefront measuring apparatus that calculate a frequency distribution and obtain a transmitted wavefront of the object based on a primary frequency spectrum in the frequency distribution
JP2014190705A5 (enExample)
US9255879B2 (en) Method of measuring refractive index distribution, method of manufacturing optical element, and measurement apparatus of refractive index distribution
US9784570B2 (en) Polarization-based coherent gradient sensing systems and methods
JP2011089804A (ja) 干渉計
JP5575161B2 (ja) 屈折率分布計測方法および屈折率分布計測装置
JP6385779B2 (ja) 光学的距離計測装置
JP2019510214A (ja) 三次元インターフェロメータ及び電界の位相を決定する方法
US10365164B2 (en) Optical system phase acquisition method and optical system evaluation method
WO2017159387A1 (ja) 観察装置および観察方法
CN117782535A (zh) 高精度、大动态范围的横向剪切干涉像差检测方法及装置
JP2016200461A (ja) 屈折率計測方法、屈折率計測装置、光学素子の製造方法
US20100110445A1 (en) Slit aperture for diffraction range finding system and method for using the slit aperture to form a focused image
JP6320093B2 (ja) 屈折率分布計測方法、屈折率分布計測装置、光学素子の製造方法、プログラム、および、記憶媒体
JP3634327B2 (ja) 光波長分散空間干渉断層画像化装置
JP2021181900A (ja) 波面計測装置、波面計測方法、並びに、光学系および光学素子の製造方法

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160318

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20160318

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20170222

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20170307

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20170404

R151 Written notification of patent or utility model registration

Ref document number: 6124641

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151