JP6121639B1 - 巻取式成膜装置及び巻取式成膜方法 - Google Patents

巻取式成膜装置及び巻取式成膜方法 Download PDF

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Publication number
JP6121639B1
JP6121639B1 JP2016563493A JP2016563493A JP6121639B1 JP 6121639 B1 JP6121639 B1 JP 6121639B1 JP 2016563493 A JP2016563493 A JP 2016563493A JP 2016563493 A JP2016563493 A JP 2016563493A JP 6121639 B1 JP6121639 B1 JP 6121639B1
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Prior art keywords
film
line
evaporation
film forming
nozzle
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Japanese (ja)
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JPWO2016199728A1 (ja
Inventor
貴啓 廣野
貴啓 廣野
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Ulvac Inc
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Ulvac Inc
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP2016563493A 2015-06-09 2016-06-06 巻取式成膜装置及び巻取式成膜方法 Active JP6121639B1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015116435 2015-06-09
JP2015116435 2015-06-09
PCT/JP2016/066789 WO2016199728A1 (ja) 2015-06-09 2016-06-06 巻取式成膜装置、蒸発源ユニット、及び巻取式成膜方法

Publications (2)

Publication Number Publication Date
JP6121639B1 true JP6121639B1 (ja) 2017-04-26
JPWO2016199728A1 JPWO2016199728A1 (ja) 2017-06-22

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ID=57504196

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JP2016563493A Active JP6121639B1 (ja) 2015-06-09 2016-06-06 巻取式成膜装置及び巻取式成膜方法

Country Status (5)

Country Link
JP (1) JP6121639B1 (ko)
KR (1) KR102023258B1 (ko)
CN (1) CN107406969B (ko)
TW (1) TWI619824B (ko)
WO (1) WO2016199728A1 (ko)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111206224A (zh) * 2018-11-02 2020-05-29 北京铂阳顶荣光伏科技有限公司 沉积腔室、镀膜设备及镀膜方法
CN111206219A (zh) * 2018-11-02 2020-05-29 北京铂阳顶荣光伏科技有限公司 沉积腔室、镀膜设备及镀膜方法
CN111206203A (zh) * 2018-11-02 2020-05-29 北京铂阳顶荣光伏科技有限公司 沉积腔室、镀膜设备及镀膜方法
CN111206221A (zh) * 2018-11-02 2020-05-29 北京铂阳顶荣光伏科技有限公司 一种镀膜设备及镀膜方法
CN111206207A (zh) * 2018-11-02 2020-05-29 北京铂阳顶荣光伏科技有限公司 沉积腔室、镀膜设备及镀膜方法
CN111206205A (zh) * 2018-11-02 2020-05-29 北京铂阳顶荣光伏科技有限公司 沉积腔室、镀膜设备及镀膜方法
CN111206220A (zh) * 2018-11-02 2020-05-29 北京铂阳顶荣光伏科技有限公司 一种镀膜设备及镀膜方法
CN110042345B (zh) * 2019-04-30 2021-03-16 武汉华星光电半导体显示技术有限公司 一种蒸发源装置
US11746035B2 (en) * 2019-07-11 2023-09-05 Nippon Electric Glass Co., Ltd. Manufacturing method and manufacturing device of glass roll
CN115279937A (zh) * 2019-12-26 2022-11-01 株式会社爱发科 薄膜制造装置
CN111334758A (zh) * 2020-04-03 2020-06-26 Tcl华星光电技术有限公司 蒸发源装置
CN111676454B (zh) * 2020-08-04 2023-09-05 光驰科技(上海)有限公司 一种节省真空镀膜室内空间的蒸发源配置结构及其设计方法
CN114481034B (zh) * 2022-01-04 2022-12-16 重庆金美新材料科技有限公司 一种复合金属箔的制备方法、设备和系统

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04247872A (ja) * 1990-08-27 1992-09-03 Leybold Ag 帯状のサブストレートを連続的にコーティングする装置
JP2006274308A (ja) * 2005-03-28 2006-10-12 Fuji Photo Film Co Ltd 蛍光体シート製造装置
JP2007039809A (ja) * 2005-08-03 2007-02-15 Applied Materials Gmbh & Co Kg 基板をコーティングするための蒸発装置
JP2009235545A (ja) * 2008-03-28 2009-10-15 Toray Ind Inc 金属酸化物薄膜形成装置ならびに金属酸化物薄膜付きシートの製造方法
JP2013234364A (ja) * 2012-05-09 2013-11-21 Mitsubishi Plastics Inc ガスバリア性フィルムの製造方法
JP2014025150A (ja) * 2011-03-15 2014-02-06 Sharp Corp 蒸着装置、蒸着方法、及び有機ｅｌ表示装置の製造方法
JP2014517146A (ja) * 2011-04-29 2014-07-17 アプライド マテリアルズ インコーポレイテッド 反応性堆積プロセスのためのガスシステム
WO2014207088A1 (en) * 2013-06-28 2014-12-31 Applied Materials, Inc. Evaporation apparatus with gas supply

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5242500A (en) * 1990-08-27 1993-09-07 Leybold Aktiengesellschaft Apparatus for the continuous coating of band-type substrate
JP4336869B2 (ja) * 2001-11-27 2009-09-30 日本電気株式会社 真空成膜装置、真空成膜方法および電池用電極の製造方法
JP2003277915A (ja) * 2002-03-26 2003-10-02 Matsushita Electric Ind Co Ltd 薄膜の製造方法及び製造装置

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04247872A (ja) * 1990-08-27 1992-09-03 Leybold Ag 帯状のサブストレートを連続的にコーティングする装置
JP2006274308A (ja) * 2005-03-28 2006-10-12 Fuji Photo Film Co Ltd 蛍光体シート製造装置
JP2007039809A (ja) * 2005-08-03 2007-02-15 Applied Materials Gmbh & Co Kg 基板をコーティングするための蒸発装置
JP2009235545A (ja) * 2008-03-28 2009-10-15 Toray Ind Inc 金属酸化物薄膜形成装置ならびに金属酸化物薄膜付きシートの製造方法
JP2014025150A (ja) * 2011-03-15 2014-02-06 Sharp Corp 蒸着装置、蒸着方法、及び有機ｅｌ表示装置の製造方法
JP2014517146A (ja) * 2011-04-29 2014-07-17 アプライド マテリアルズ インコーポレイテッド 反応性堆積プロセスのためのガスシステム
JP2013234364A (ja) * 2012-05-09 2013-11-21 Mitsubishi Plastics Inc ガスバリア性フィルムの製造方法
WO2014207088A1 (en) * 2013-06-28 2014-12-31 Applied Materials, Inc. Evaporation apparatus with gas supply

Also Published As

Publication number Publication date
KR20170095361A (ko) 2017-08-22
JPWO2016199728A1 (ja) 2017-06-22
CN107406969A (zh) 2017-11-28
TWI619824B (zh) 2018-04-01
TW201710530A (zh) 2017-03-16
CN107406969B (zh) 2020-06-19
WO2016199728A1 (ja) 2016-12-15
KR102023258B1 (ko) 2019-09-19

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