CN111206221A - 一种镀膜设备及镀膜方法 - Google Patents
一种镀膜设备及镀膜方法 Download PDFInfo
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- CN111206221A CN111206221A CN201811303299.2A CN201811303299A CN111206221A CN 111206221 A CN111206221 A CN 111206221A CN 201811303299 A CN201811303299 A CN 201811303299A CN 111206221 A CN111206221 A CN 111206221A
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- 238000000034 method Methods 0.000 title claims abstract description 43
- 239000007888 film coating Substances 0.000 title description 7
- 238000009501 film coating Methods 0.000 title description 7
- 238000001883 metal evaporation Methods 0.000 claims abstract description 339
- 238000000151 deposition Methods 0.000 claims abstract description 329
- 230000008021 deposition Effects 0.000 claims abstract description 310
- 229910052755 nonmetal Inorganic materials 0.000 claims abstract description 123
- 239000010409 thin film Substances 0.000 claims abstract description 91
- 238000000576 coating method Methods 0.000 claims abstract description 47
- 239000011248 coating agent Substances 0.000 claims abstract description 35
- 238000001704 evaporation Methods 0.000 claims description 496
- 230000008020 evaporation Effects 0.000 claims description 496
- 239000010949 copper Substances 0.000 claims description 138
- 239000000758 substrate Substances 0.000 claims description 78
- 239000010408 film Substances 0.000 claims description 61
- 229910052733 gallium Inorganic materials 0.000 claims description 51
- 229910052738 indium Inorganic materials 0.000 claims description 50
- 238000005137 deposition process Methods 0.000 claims description 20
- 229910052783 alkali metal Inorganic materials 0.000 claims description 17
- 150000001340 alkali metals Chemical class 0.000 claims description 17
- 238000012805 post-processing Methods 0.000 claims description 12
- 238000007747 plating Methods 0.000 claims description 11
- 239000007791 liquid phase Substances 0.000 claims description 6
- 229910052711 selenium Inorganic materials 0.000 claims description 6
- 150000001339 alkali metal compounds Chemical class 0.000 claims description 5
- 238000010248 power generation Methods 0.000 abstract description 11
- 238000010438 heat treatment Methods 0.000 description 22
- 238000010586 diagram Methods 0.000 description 20
- 230000000052 comparative effect Effects 0.000 description 14
- 238000002425 crystallisation Methods 0.000 description 10
- 230000008025 crystallization Effects 0.000 description 10
- 238000001816 cooling Methods 0.000 description 9
- 238000001755 magnetron sputter deposition Methods 0.000 description 9
- 238000002203 pretreatment Methods 0.000 description 9
- 239000013078 crystal Substances 0.000 description 7
- 230000007547 defect Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000000843 powder Substances 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 238000012163 sequencing technique Methods 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229910018292 Cu2In Inorganic materials 0.000 description 1
- 238000010549 co-Evaporation Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0623—Sulfides, selenides or tellurides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0694—Halides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201811303299.2A CN111206221A (zh) | 2018-11-02 | 2018-11-02 | 一种镀膜设备及镀膜方法 |
Applications Claiming Priority (1)
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CN201811303299.2A CN111206221A (zh) | 2018-11-02 | 2018-11-02 | 一种镀膜设备及镀膜方法 |
Publications (1)
Publication Number | Publication Date |
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CN111206221A true CN111206221A (zh) | 2020-05-29 |
Family
ID=70786303
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201811303299.2A Pending CN111206221A (zh) | 2018-11-02 | 2018-11-02 | 一种镀膜设备及镀膜方法 |
Country Status (1)
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CN (1) | CN111206221A (zh) |
Citations (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05234890A (ja) * | 1992-02-25 | 1993-09-10 | Fuji Electric Corp Res & Dev Ltd | 化合物半導体薄膜層の成膜方法 |
CN1950952A (zh) * | 2004-03-05 | 2007-04-18 | 索里布罗股份公司 | 对cigs工艺进行直列式过程控制的方法和装置 |
JP2007146219A (ja) * | 2005-11-28 | 2007-06-14 | Hitachi Zosen Corp | 真空蒸着装置 |
US20090215224A1 (en) * | 2008-02-21 | 2009-08-27 | Film Solar Tech Inc. | Coating methods and apparatus for making a cigs solar cell |
US20110030794A1 (en) * | 2009-08-10 | 2011-02-10 | Edward Teng | Apparatus And Method For Depositing A CIGS Layer |
JP2012012662A (ja) * | 2010-06-30 | 2012-01-19 | Fujifilm Corp | 成膜装置および太陽電池 |
CN102534491A (zh) * | 2011-10-19 | 2012-07-04 | 深圳市三海光电技术有限公司 | 高转化效率铜铟镓硒薄膜太阳能电池吸收层的制备设备及制备方法 |
JP2012184457A (ja) * | 2011-03-03 | 2012-09-27 | Sumitomo Heavy Ind Ltd | 成膜装置 |
CN102763230A (zh) * | 2010-02-22 | 2012-10-31 | 太阳能光电股份公司 | 制造半导体层的方法和装置 |
US20130224901A1 (en) * | 2012-02-26 | 2013-08-29 | Jiaxiong Wang | Production Line to Fabricate CIGS Thin Film Solar Cells via Roll-to-Roll Processes |
CN103866236A (zh) * | 2012-12-18 | 2014-06-18 | 北京汉能创昱科技有限公司 | 一种铜铟镓硒薄膜电池共蒸发线性源的布置方法 |
CN103898450A (zh) * | 2012-12-25 | 2014-07-02 | 北京汉能创昱科技有限公司 | 一种铜铟镓硒共蒸发线性源装置及其使用方法 |
CN104716217A (zh) * | 2014-09-30 | 2015-06-17 | 天津理工大学 | 一种掺钠铜铟镓硒太阳电池器件及其制备方法 |
CN105428457A (zh) * | 2015-12-08 | 2016-03-23 | 中国电子科技集团公司第十八研究所 | 一种工业化沉积cigs太阳电池吸收层的方法及设备 |
CN105720132A (zh) * | 2014-12-03 | 2016-06-29 | 中国电子科技集团公司第十八研究所 | 一种柔性衬底上制备cigs吸收层碱金属掺杂方法 |
CN105734495A (zh) * | 2014-12-26 | 2016-07-06 | 佳能特机株式会社 | 真空蒸镀装置 |
WO2016199728A1 (ja) * | 2015-06-09 | 2016-12-15 | 株式会社アルバック | 巻取式成膜装置、蒸発源ユニット、及び巻取式成膜方法 |
CN106531826A (zh) * | 2016-11-16 | 2017-03-22 | 深圳市金光能太阳能有限公司 | 铜锢稼硒薄膜太阳能电池的制备方法 |
CN207418851U (zh) * | 2017-09-22 | 2018-05-29 | 云谷(固安)科技有限公司 | 蒸发源装置 |
WO2018114376A1 (en) * | 2016-12-22 | 2018-06-28 | Flisom Ag | Linear evaporation source |
CN108269868A (zh) * | 2018-01-29 | 2018-07-10 | 北京铂阳顶荣光伏科技有限公司 | 薄膜太阳能电池 |
CN207596942U (zh) * | 2017-11-08 | 2018-07-10 | 深圳市柔宇科技有限公司 | 蒸镀装置 |
-
2018
- 2018-11-02 CN CN201811303299.2A patent/CN111206221A/zh active Pending
Patent Citations (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05234890A (ja) * | 1992-02-25 | 1993-09-10 | Fuji Electric Corp Res & Dev Ltd | 化合物半導体薄膜層の成膜方法 |
CN1950952A (zh) * | 2004-03-05 | 2007-04-18 | 索里布罗股份公司 | 对cigs工艺进行直列式过程控制的方法和装置 |
US20080254202A1 (en) * | 2004-03-05 | 2008-10-16 | Solibro Ab | Method and Apparatus for In-Line Process Control of the Cigs Process |
CN101599515A (zh) * | 2004-03-05 | 2009-12-09 | 索里布罗研究公司 | 对cigs工艺进行直列式过程控制的方法和装置 |
JP2007146219A (ja) * | 2005-11-28 | 2007-06-14 | Hitachi Zosen Corp | 真空蒸着装置 |
US20090215224A1 (en) * | 2008-02-21 | 2009-08-27 | Film Solar Tech Inc. | Coating methods and apparatus for making a cigs solar cell |
US20110030794A1 (en) * | 2009-08-10 | 2011-02-10 | Edward Teng | Apparatus And Method For Depositing A CIGS Layer |
CN102763230A (zh) * | 2010-02-22 | 2012-10-31 | 太阳能光电股份公司 | 制造半导体层的方法和装置 |
JP2012012662A (ja) * | 2010-06-30 | 2012-01-19 | Fujifilm Corp | 成膜装置および太陽電池 |
JP2012184457A (ja) * | 2011-03-03 | 2012-09-27 | Sumitomo Heavy Ind Ltd | 成膜装置 |
CN102534491A (zh) * | 2011-10-19 | 2012-07-04 | 深圳市三海光电技术有限公司 | 高转化效率铜铟镓硒薄膜太阳能电池吸收层的制备设备及制备方法 |
US20130224901A1 (en) * | 2012-02-26 | 2013-08-29 | Jiaxiong Wang | Production Line to Fabricate CIGS Thin Film Solar Cells via Roll-to-Roll Processes |
CN103866236A (zh) * | 2012-12-18 | 2014-06-18 | 北京汉能创昱科技有限公司 | 一种铜铟镓硒薄膜电池共蒸发线性源的布置方法 |
CN103898450A (zh) * | 2012-12-25 | 2014-07-02 | 北京汉能创昱科技有限公司 | 一种铜铟镓硒共蒸发线性源装置及其使用方法 |
CN104716217A (zh) * | 2014-09-30 | 2015-06-17 | 天津理工大学 | 一种掺钠铜铟镓硒太阳电池器件及其制备方法 |
CN105720132A (zh) * | 2014-12-03 | 2016-06-29 | 中国电子科技集团公司第十八研究所 | 一种柔性衬底上制备cigs吸收层碱金属掺杂方法 |
CN105734495A (zh) * | 2014-12-26 | 2016-07-06 | 佳能特机株式会社 | 真空蒸镀装置 |
WO2016199728A1 (ja) * | 2015-06-09 | 2016-12-15 | 株式会社アルバック | 巻取式成膜装置、蒸発源ユニット、及び巻取式成膜方法 |
CN105428457A (zh) * | 2015-12-08 | 2016-03-23 | 中国电子科技集团公司第十八研究所 | 一种工业化沉积cigs太阳电池吸收层的方法及设备 |
CN106531826A (zh) * | 2016-11-16 | 2017-03-22 | 深圳市金光能太阳能有限公司 | 铜锢稼硒薄膜太阳能电池的制备方法 |
WO2018114376A1 (en) * | 2016-12-22 | 2018-06-28 | Flisom Ag | Linear evaporation source |
CN207418851U (zh) * | 2017-09-22 | 2018-05-29 | 云谷(固安)科技有限公司 | 蒸发源装置 |
CN207596942U (zh) * | 2017-11-08 | 2018-07-10 | 深圳市柔宇科技有限公司 | 蒸镀装置 |
CN108269868A (zh) * | 2018-01-29 | 2018-07-10 | 北京铂阳顶荣光伏科技有限公司 | 薄膜太阳能电池 |
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Application publication date: 20200529 |