JP6110159B2 - 複合部材及びその製造方法 - Google Patents
複合部材及びその製造方法 Download PDFInfo
- Publication number
- JP6110159B2 JP6110159B2 JP2013033473A JP2013033473A JP6110159B2 JP 6110159 B2 JP6110159 B2 JP 6110159B2 JP 2013033473 A JP2013033473 A JP 2013033473A JP 2013033473 A JP2013033473 A JP 2013033473A JP 6110159 B2 JP6110159 B2 JP 6110159B2
- Authority
- JP
- Japan
- Prior art keywords
- dam
- adhesive
- composite
- joint surface
- adhesive layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Jigs For Machine Tools (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013033473A JP6110159B2 (ja) | 2013-02-22 | 2013-02-22 | 複合部材及びその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013033473A JP6110159B2 (ja) | 2013-02-22 | 2013-02-22 | 複合部材及びその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014165267A JP2014165267A (ja) | 2014-09-08 |
| JP2014165267A5 JP2014165267A5 (enExample) | 2016-03-03 |
| JP6110159B2 true JP6110159B2 (ja) | 2017-04-05 |
Family
ID=51615631
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013033473A Active JP6110159B2 (ja) | 2013-02-22 | 2013-02-22 | 複合部材及びその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6110159B2 (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10688750B2 (en) | 2017-10-03 | 2020-06-23 | Applied Materials, Inc. | Bonding structure of E chuck to aluminum base configuration |
| US10847402B2 (en) | 2018-04-02 | 2020-11-24 | Applied Materials, Inc. | Bond protection around porous plugs |
| US11380572B2 (en) | 2019-05-24 | 2022-07-05 | Applied Materials, Inc. | Substrate support carrier with improved bond layer protection |
| US11456161B2 (en) | 2018-06-04 | 2022-09-27 | Applied Materials, Inc. | Substrate support pedestal |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6463938B2 (ja) * | 2014-10-08 | 2019-02-06 | 日本特殊陶業株式会社 | 静電チャック |
| KR102176064B1 (ko) * | 2017-11-10 | 2020-11-09 | 주식회사 아이앤티 | 정전척 제조방법 및 정전척 |
| JP7210192B2 (ja) * | 2018-08-30 | 2023-01-23 | 日本特殊陶業株式会社 | 保持装置の製造方法 |
| KR20220018053A (ko) * | 2019-06-12 | 2022-02-14 | 램 리써치 코포레이션 | 플라즈마 프로세싱 챔버 컴포넌트들을 위한 실란트 (sealant) 코팅 |
| KR102341865B1 (ko) * | 2021-05-13 | 2021-12-21 | 고광노 | 수리가 용이한 정전척 |
| KR102418014B1 (ko) * | 2021-08-27 | 2022-07-07 | 주식회사 동탄이엔지 | 홀이 구비되는 필름형 본딩층을 포함하는 정전척 및 정전척의 제조 방법 |
| KR102592339B1 (ko) * | 2022-08-09 | 2023-10-23 | 주식회사 동탄이엔지 | 다공성 필터가 구비되는 정전척의 제조 방법 |
| KR102914890B1 (ko) * | 2024-08-14 | 2026-01-20 | 주식회사 예리코코리아 | 정전척의 본딩 방법 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1065047A (ja) * | 1996-08-20 | 1998-03-06 | Tokuyama Corp | 半導体素子搭載用パッケージの製造方法 |
| JP5143184B2 (ja) * | 2010-05-07 | 2013-02-13 | 日本碍子株式会社 | ウエハー載置装置の製造方法 |
-
2013
- 2013-02-22 JP JP2013033473A patent/JP6110159B2/ja active Active
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10688750B2 (en) | 2017-10-03 | 2020-06-23 | Applied Materials, Inc. | Bonding structure of E chuck to aluminum base configuration |
| US11192323B2 (en) | 2017-10-03 | 2021-12-07 | Applied Materials, Inc. | Bonding structure of e chuck to aluminum base configuration |
| US11794441B2 (en) | 2017-10-03 | 2023-10-24 | Applied Materials, Inc. | Bonding structure of e chuck to aluminum base configuration |
| US10847402B2 (en) | 2018-04-02 | 2020-11-24 | Applied Materials, Inc. | Bond protection around porous plugs |
| US11456161B2 (en) | 2018-06-04 | 2022-09-27 | Applied Materials, Inc. | Substrate support pedestal |
| US12537173B2 (en) | 2018-06-04 | 2026-01-27 | Applied Materials, Inc. | Substrate support pedestal |
| US11380572B2 (en) | 2019-05-24 | 2022-07-05 | Applied Materials, Inc. | Substrate support carrier with improved bond layer protection |
| US11651987B2 (en) | 2019-05-24 | 2023-05-16 | Applied Materials, Inc. | Substrate support carrier with improved bond layer protection |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2014165267A (ja) | 2014-09-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6110159B2 (ja) | 複合部材及びその製造方法 | |
| JP6077301B2 (ja) | 静電チャック | |
| US10410897B2 (en) | Electrostatic chuck | |
| JP6463938B2 (ja) | 静電チャック | |
| CN104952779B (zh) | 静电吸盘 | |
| JP5762632B2 (ja) | 構造化された焼結結合層の製造方法及び構造化された焼結結合層を備えている半導体素子 | |
| CN101207945B (zh) | 加热装置 | |
| JP5394186B2 (ja) | 半導体製造装置用部品 | |
| JP2011061049A (ja) | 静電チャック | |
| JP6228031B2 (ja) | 試料保持具およびこれを用いたプラズマエッチング装置 | |
| JP6325424B2 (ja) | 静電チャック | |
| JP2018006737A (ja) | 保持装置および保持装置の製造方法 | |
| WO2019131611A1 (ja) | セラミック装置 | |
| JP4331983B2 (ja) | ウェハ支持部材およびその製造方法 | |
| JPH1126631A (ja) | 半導体装置とその製造方法 | |
| JP2009176928A (ja) | 静電チャックおよびその製造方法 | |
| JP6483533B2 (ja) | 試料保持具およびこれを用いたプラズマエッチング装置 | |
| JP3336240B2 (ja) | 半導体素子実装基板 | |
| JP2019161134A (ja) | 保持装置の製造方法および保持装置 | |
| JP6667386B2 (ja) | 保持装置 | |
| JP6449802B2 (ja) | 半導体製造用部品 | |
| JP6054696B2 (ja) | 静電チャック | |
| JP6856334B2 (ja) | ヒータ | |
| JP6882040B2 (ja) | 保持装置 | |
| JP2003234451A (ja) | 半導体装置およびその製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160115 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20160115 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20161125 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20161220 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170131 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170214 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170309 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 6110159 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |