JP6064682B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP6064682B2 JP6064682B2 JP2013040907A JP2013040907A JP6064682B2 JP 6064682 B2 JP6064682 B2 JP 6064682B2 JP 2013040907 A JP2013040907 A JP 2013040907A JP 2013040907 A JP2013040907 A JP 2013040907A JP 6064682 B2 JP6064682 B2 JP 6064682B2
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- 239000004065 semiconductor Substances 0.000 title claims description 95
- 239000000758 substrate Substances 0.000 claims description 53
- 239000000463 material Substances 0.000 claims description 17
- 239000011347 resin Substances 0.000 claims description 10
- 229920005989 resin Polymers 0.000 claims description 10
- 229910000679 solder Inorganic materials 0.000 description 6
- 229910002601 GaN Inorganic materials 0.000 description 2
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000002250 progressing effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/73—Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/4847—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
- H01L2224/48472—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/4901—Structure
- H01L2224/4903—Connectors having different sizes, e.g. different diameters
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
- H01L2924/13055—Insulated gate bipolar transistor [IGBT]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
- H01L2924/13091—Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Junction Field-Effect Transistors (AREA)
Description
[第1の実施形態]
[第2の実施形態]
なお、トランジスタチップ20内に、ソース電極に接続されたアノードとドレイン電極に接続されたカソードとを有するダイオードを一体的に形成してもよい。
Claims (6)
- 主面上に第1〜第3の配線パターンが形成された基板と、
表面にゲート電極及びソース又はエミッタ電極を有し、裏面にドレイン又はコレクタ電極を有する縦型のトランジスタチップと、
一方の主面にアノード電極を有し、他方の主面にカソード電極を有する縦型のダイオードチップと、
を備え、
前記トランジスタチップは、前記表面が前記基板の前記主面と対向するように、前記基板の前記第1及び第2の配線パターン上に搭載されることにより、前記ゲート電極及び前記ソース又はエミッタ電極が、前記第1の配線パターン及び前記第2の配線パターンにそれぞれ接続されており、
前記トランジスタチップの前記ドレイン又はコレクタ電極は、ワイヤを用いて、前記基板の前記第3の配線パターンに接続されており、
前記ダイオードチップは、前記基板の前記主面と前記トランジスタチップの前記表面との間において、前記基板の前記第3の配線パターン上、かつ、前記トランジスタチップの前記ソース又はエミッタ電極下に搭載されることにより、前記アノード電極及び前記カソード電極が、前記ソース又はエミッタ電極及び前記第3の配線パターンにそれぞれ接続されている、
半導体装置。 - 前記第3の配線パターン上には、第1の絶縁膜を介して前記第1の配線パターンが形成されると共に、第2の絶縁膜を介して前記第2の配線パターンが形成されており、
前記第3の配線パターンにおける前記第2の配線パターンに対して前記第1の配線パターンと反対側の部分には、前記トランジスタチップの前記ドレイン又はコレクタ電極からの前記ワイヤとの接続のために前記第3の配線パターンが露出したトランジスタ接続部が形成されており、
前記第3の配線パターンにおける前記第1の絶縁膜と前記第2の絶縁膜との間の部分には、前記ダイオードチップの前記カソード電極との接続のために前記第3の配線パターンが露出したダイオード接続部が形成されている、
請求項1に記載の半導体装置。 - 前記第3の配線パターンにおける前記ダイオード接続部は、前記ダイオードチップを嵌め込み可能に窪んでいる、請求項2に記載の半導体装置。
- 少なくとも前記ダイオードチップの周囲は、絶縁性樹脂で覆われている、請求項1〜3の何れか1項に記載の半導体装置。
- 前記基板、前記トランジスタチップ、及び、前記ダイオードチップによって囲われた空間には、絶縁性樹脂が充填されている、請求項4に記載の半導体装置。
- 前記トランジスタチップの材料は、ワイドバンドギャップ半導体を含む、請求項1〜5の何れか1項に記載の半導体装置。
Priority Applications (1)
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JP2013040907A JP6064682B2 (ja) | 2013-03-01 | 2013-03-01 | 半導体装置 |
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JP2013040907A JP6064682B2 (ja) | 2013-03-01 | 2013-03-01 | 半導体装置 |
Publications (2)
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JP2014170799A JP2014170799A (ja) | 2014-09-18 |
JP6064682B2 true JP6064682B2 (ja) | 2017-01-25 |
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Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP6690252B2 (ja) * | 2016-01-22 | 2020-04-28 | 富士電機株式会社 | 半導体装置 |
JP7353233B2 (ja) * | 2020-05-14 | 2023-09-29 | 三菱電機株式会社 | 半導体装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08213547A (ja) * | 1995-02-08 | 1996-08-20 | Fuji Electric Co Ltd | 半導体装置 |
US5696466A (en) * | 1995-12-08 | 1997-12-09 | The Whitaker Corporation | Heterolithic microwave integrated impedance matching circuitry and method of manufacture |
JP3993461B2 (ja) * | 2002-05-15 | 2007-10-17 | 株式会社東芝 | 半導体モジュール |
JP5323895B2 (ja) * | 2011-06-23 | 2013-10-23 | 本田技研工業株式会社 | 半導体装置 |
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