JP6060319B2 - 膜厚制御装置、膜厚制御方法および成膜装置 - Google Patents

膜厚制御装置、膜厚制御方法および成膜装置 Download PDF

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Publication number
JP6060319B2
JP6060319B2 JP2016534107A JP2016534107A JP6060319B2 JP 6060319 B2 JP6060319 B2 JP 6060319B2 JP 2016534107 A JP2016534107 A JP 2016534107A JP 2016534107 A JP2016534107 A JP 2016534107A JP 6060319 B2 JP6060319 B2 JP 6060319B2
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rate
unit
film thickness
filter
vapor deposition
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Japanese (ja)
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JPWO2016009626A1 (ja
Inventor
小林　義和
義和 小林
伊藤　敦
敦 伊藤
治郎 猿渡
治郎 猿渡
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Ulvac Inc
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Ulvac Inc
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/52—Means for observation of the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B17/00—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations
    • G01B17/02—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations for measuring thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B17/00—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations
    • G01B17/02—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations for measuring thickness
    • G01B17/025—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations for measuring thickness for measuring thickness of coating

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  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
JP2016534107A 2014-07-15 2015-07-10 膜厚制御装置、膜厚制御方法および成膜装置 Active JP6060319B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014144891 2014-07-15
JP2014144891 2014-07-15
PCT/JP2015/003491 WO2016009626A1 (ja) 2014-07-15 2015-07-10 膜厚制御装置、膜厚制御方法および成膜装置

Publications (2)

Publication Number Publication Date
JP6060319B2 true JP6060319B2 (ja) 2017-01-11
JPWO2016009626A1 JPWO2016009626A1 (ja) 2017-04-27

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JP2016534107A Active JP6060319B2 (ja) 2014-07-15 2015-07-10 膜厚制御装置、膜厚制御方法および成膜装置

Country Status (4)

Country Link
JP (1) JP6060319B2 (zh)
KR (1) KR102035143B1 (zh)
CN (1) CN106471152B (zh)
WO (1) WO2016009626A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11275975B2 (en) * 2017-10-05 2022-03-15 Applied Materials, Inc. Fault detection classification
JP7064407B2 (ja) * 2018-08-31 2022-05-10 キヤノントッキ株式会社 成膜装置及び成膜装置の制御方法
JP7036864B2 (ja) * 2020-05-26 2022-03-15 株式会社アルバック 測定異常検出装置、および、測定異常検出方法
CN113106409A (zh) * 2021-04-20 2021-07-13 湖北华鑫光电有限公司 一种膜厚控制装置及其镀膜方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000008164A (ja) * 1998-06-25 2000-01-11 Toray Ind Inc 薄膜付基材の製造方法および製造装置
WO2009038085A1 (ja) * 2007-09-21 2009-03-26 Ulvac, Inc. 薄膜形成装置、膜厚測定方法、膜厚センサー
JP2013011545A (ja) * 2011-06-30 2013-01-17 Ulvac Japan Ltd 蒸着装置、膜厚測定方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010196082A (ja) 2009-02-23 2010-09-09 Canon Inc 真空蒸着装置
JP5791431B2 (ja) * 2011-08-30 2015-10-07 三菱日立パワーシステムズ株式会社 膜厚測定装置及び膜厚測定方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000008164A (ja) * 1998-06-25 2000-01-11 Toray Ind Inc 薄膜付基材の製造方法および製造装置
WO2009038085A1 (ja) * 2007-09-21 2009-03-26 Ulvac, Inc. 薄膜形成装置、膜厚測定方法、膜厚センサー
JP2013011545A (ja) * 2011-06-30 2013-01-17 Ulvac Japan Ltd 蒸着装置、膜厚測定方法

Also Published As

Publication number Publication date
KR102035143B1 (ko) 2019-10-22
JPWO2016009626A1 (ja) 2017-04-27
CN106471152A (zh) 2017-03-01
WO2016009626A1 (ja) 2016-01-21
KR20160147009A (ko) 2016-12-21
CN106471152B (zh) 2019-07-26

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