JP6038902B2 - 熱圧着ボンディングの間tsvティップを保護するための保護層 - Google Patents
熱圧着ボンディングの間tsvティップを保護するための保護層 Download PDFInfo
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- JP6038902B2 JP6038902B2 JP2014513727A JP2014513727A JP6038902B2 JP 6038902 B2 JP6038902 B2 JP 6038902B2 JP 2014513727 A JP2014513727 A JP 2014513727A JP 2014513727 A JP2014513727 A JP 2014513727A JP 6038902 B2 JP6038902 B2 JP 6038902B2
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Landscapes
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Wire Bonding (AREA)
Applications Claiming Priority (3)
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| US13/150,899 US8623763B2 (en) | 2011-06-01 | 2011-06-01 | Protective layer for protecting TSV tips during thermo-compressive bonding |
| US13/150,899 | 2011-06-01 | ||
| PCT/US2012/040388 WO2012167027A2 (en) | 2011-06-01 | 2012-06-01 | Protective layer for protecting tsv tips during thermo-compressive bonding |
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| JP2014517531A JP2014517531A (ja) | 2014-07-17 |
| JP2014517531A5 JP2014517531A5 (enExample) | 2015-07-16 |
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| US8970043B2 (en) | 2011-02-01 | 2015-03-03 | Maxim Integrated Products, Inc. | Bonded stacked wafers and methods of electroplating bonded stacked wafers |
| KR101916225B1 (ko) * | 2012-04-09 | 2018-11-07 | 삼성전자 주식회사 | Tsv를 구비한 반도체 칩 및 그 반도체 칩 제조방법 |
| US8907494B2 (en) | 2013-03-14 | 2014-12-09 | International Business Machines Corporation | Electrical leakage reduction in stacked integrated circuits having through-silicon-via (TSV) structures |
| CN104810319A (zh) * | 2014-01-28 | 2015-07-29 | 中芯国际集成电路制造(上海)有限公司 | 晶圆键合的方法 |
| EP2908337B1 (en) * | 2014-02-12 | 2025-11-12 | ams AG | Semiconductor device with a thermally stable bump contact on a TSV and method of producing such a semiconductor device |
| US9793244B2 (en) * | 2014-07-11 | 2017-10-17 | Intel Corporation | Scalable package architecture and associated techniques and configurations |
| JP2016039512A (ja) * | 2014-08-08 | 2016-03-22 | キヤノン株式会社 | 電極が貫通配線と繋がったデバイス、及びその製造方法 |
| CN104502903B (zh) * | 2014-11-28 | 2017-12-29 | 成都嘉纳海威科技有限责任公司 | 一种基于tsv转接板的多波束接收sip系统 |
| WO2016154526A1 (en) * | 2015-03-26 | 2016-09-29 | Board Of Regents, The University Of Texas System | Capped through-silicon-vias for 3d integrated circuits |
| KR102649471B1 (ko) | 2016-09-05 | 2024-03-21 | 삼성전자주식회사 | 반도체 패키지 및 그의 제조 방법 |
| US11469194B2 (en) * | 2018-08-08 | 2022-10-11 | Stmicroelectronics S.R.L. | Method of manufacturing a redistribution layer, redistribution layer and integrated circuit including the redistribution layer |
| US11152333B2 (en) * | 2018-10-19 | 2021-10-19 | Micron Technology, Inc. | Semiconductor device packages with enhanced heat management and related systems |
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| US20250218903A1 (en) * | 2023-12-28 | 2025-07-03 | Adeia Semiconductor Bonding Technologies Inc. | Via reveal processing and structures |
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| US8178976B2 (en) * | 2008-05-12 | 2012-05-15 | Texas Instruments Incorporated | IC device having low resistance TSV comprising ground connection |
| US8334170B2 (en) * | 2008-06-27 | 2012-12-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method for stacking devices |
| KR20100021856A (ko) | 2008-08-18 | 2010-02-26 | 삼성전자주식회사 | 관통 전극을 갖는 반도체장치의 형성방법 및 관련된 장치 |
| US7687311B1 (en) * | 2008-11-13 | 2010-03-30 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method for producing stackable dies |
| US8097964B2 (en) | 2008-12-29 | 2012-01-17 | Texas Instruments Incorporated | IC having TSV arrays with reduced TSV induced stress |
| TWI380421B (en) | 2009-03-13 | 2012-12-21 | Advanced Semiconductor Eng | Method for making silicon wafer having through via |
| JP5563785B2 (ja) * | 2009-05-14 | 2014-07-30 | 新光電気工業株式会社 | 半導体パッケージ及びその製造方法 |
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| US8313982B2 (en) * | 2010-09-20 | 2012-11-20 | Texas Instruments Incorporated | Stacked die assemblies including TSV die |
| TWI429055B (zh) * | 2010-10-07 | 2014-03-01 | 日月光半導體製造股份有限公司 | 堆疊式封裝結構及其製造方法 |
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| US8298944B1 (en) * | 2011-06-01 | 2012-10-30 | Texas Instruments Incorporated | Warpage control for die with protruding TSV tips during thermo-compressive bonding |
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2012
- 2012-06-01 EP EP12792149.2A patent/EP2783393A4/en not_active Withdrawn
- 2012-06-01 WO PCT/US2012/040388 patent/WO2012167027A2/en not_active Ceased
- 2012-06-01 JP JP2014513727A patent/JP6038902B2/ja active Active
- 2012-06-01 CN CN201280037713.4A patent/CN103718286A/zh active Pending
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2013
- 2013-05-15 US US13/894,536 patent/US8723330B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| EP2783393A2 (en) | 2014-10-01 |
| US20130249098A1 (en) | 2013-09-26 |
| WO2012167027A3 (en) | 2013-04-25 |
| US20120306085A1 (en) | 2012-12-06 |
| WO2012167027A2 (en) | 2012-12-06 |
| CN103718286A (zh) | 2014-04-09 |
| US8723330B2 (en) | 2014-05-13 |
| US8623763B2 (en) | 2014-01-07 |
| EP2783393A4 (en) | 2016-03-23 |
| JP2014517531A (ja) | 2014-07-17 |
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