JP6038794B2 - 電子顕微鏡法用に構成された、高電圧下で放射する電子銃 - Google Patents

電子顕微鏡法用に構成された、高電圧下で放射する電子銃 Download PDF

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JP6038794B2
JP6038794B2 JP2013528751A JP2013528751A JP6038794B2 JP 6038794 B2 JP6038794 B2 JP 6038794B2 JP 2013528751 A JP2013528751 A JP 2013528751A JP 2013528751 A JP2013528751 A JP 2013528751A JP 6038794 B2 JP6038794 B2 JP 6038794B2
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electron
tip
electron gun
carbon
corresponds
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JP2013541150A5 (https=
JP2013541150A (ja
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モンティオ マルク
モンティオ マルク
ウードゥリエール フロラン
ウードゥリエール フロラン
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サントル ナシオナル ドゥ ラ ルシェルシェサイアンティフィク（セエヌエールエス）
サントル ナシオナル ドゥ ラ ルシェルシェサイアンティフィク（セエヌエールエス）
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/48—Electron guns
    • H01J29/485—Construction of the gun or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/30—Cold cathodes, e.g. field-emissive cathode
    • H01J1/304—Field-emissive cathodes
    • H01J1/3042—Field-emissive cathodes microengineered, e.g. Spindt-type
    • H01J1/3044—Point emitters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/021—Electron guns using a field emission, photo emission, or secondary emission electron source
    • H01J3/022—Electron guns using a field emission, photo emission, or secondary emission electron source with microengineered cathode, e.g. Spindt-type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00—Electrodes common to discharge tubes
    • H01J2201/30—Cold cathodes
    • H01J2201/304—Field emission cathodes
    • H01J2201/30403—Field emission cathodes characterised by the emitter shape
    • H01J2201/30407—Microengineered point emitters
    • H01J2201/30411—Microengineered point emitters conical shaped, e.g. Spindt type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00—Electrodes common to discharge tubes
    • H01J2201/30—Cold cathodes
    • H01J2201/304—Field emission cathodes
    • H01J2201/30403—Field emission cathodes characterised by the emitter shape
    • H01J2201/30407—Microengineered point emitters
    • H01J2201/30415—Microengineered point emitters needle shaped
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00—Electrodes common to discharge tubes
    • H01J2201/30—Cold cathodes
    • H01J2201/304—Field emission cathodes
    • H01J2201/30403—Field emission cathodes characterised by the emitter shape
    • H01J2201/30426—Coatings on the emitter surface, e.g. with low work function materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00—Electrodes common to discharge tubes
    • H01J2201/30—Cold cathodes
    • H01J2201/304—Field emission cathodes
    • H01J2201/30403—Field emission cathodes characterised by the emitter shape
    • H01J2201/30434—Nanotubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00—Electrodes common to discharge tubes
    • H01J2201/30—Cold cathodes
    • H01J2201/304—Field emission cathodes
    • H01J2201/30446—Field emission cathodes characterised by the emitter material
    • H01J2201/30453—Carbon types
    • H01J2201/30469—Carbon nanotubes (CNTs)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06308—Thermionic sources
    • H01J2237/06316—Schottky emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06341—Field emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Cold Cathode And The Manufacture (AREA)
JP2013528751A 2010-09-17 2011-09-16 電子顕微鏡法用に構成された、高電圧下で放射する電子銃 Active JP6038794B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1003696A FR2965102B1 (fr) 2010-09-17 2010-09-17 Canon a electrons emettant sous haute tension, destine notamment a la microscopie electronique
FR1003696 2010-09-17
PCT/FR2011/052135 WO2012035277A1 (fr) 2010-09-17 2011-09-16 Canon à électrons émettant sous haute tension, destiné notamment à la microscopie électronique

Publications (3)

Publication Number Publication Date
JP2013541150A JP2013541150A (ja) 2013-11-07
JP2013541150A5 JP2013541150A5 (https=) 2014-11-06
JP6038794B2 true JP6038794B2 (ja) 2016-12-07

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JP2013528751A Active JP6038794B2 (ja) 2010-09-17 2011-09-16 電子顕微鏡法用に構成された、高電圧下で放射する電子銃

Country Status (5)

Country Link
US (1) US9048057B2 (https=)
EP (1) EP2617049B1 (https=)
JP (1) JP6038794B2 (https=)
FR (1) FR2965102B1 (https=)
WO (1) WO2012035277A1 (https=)

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* Cited by examiner, † Cited by third party
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US10692692B2 (en) * 2015-05-27 2020-06-23 Kla-Tencor Corporation System and method for providing a clean environment in an electron-optical system
US10832885B2 (en) * 2015-12-23 2020-11-10 Massachusetts Institute Of Technology Electron transparent membrane for cold cathode devices
CN119985408B (zh) * 2025-01-21 2025-12-26 国家纳米科学中心 一种基于碳纳米管电子源的超高时空分辨成像方法及成像系统

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JP3353768B2 (ja) * 1999-12-17 2002-12-03 日本電気株式会社 ナノチューブの加工方法
US7879308B1 (en) * 2000-03-17 2011-02-01 University Of Central Florida Research Foundation, Inc. Multiwall carbon nanotube field emitter fabricated by focused ion beam technique
JP3453378B2 (ja) * 2002-01-08 2003-10-06 科学技術振興事業団 鋭端多層カーボンナノチューブ放射状集合体とその製造方法
JP3832402B2 (ja) * 2002-08-12 2006-10-11 株式会社日立製作所 カーボンナノチューブを有する電子源とそれを用いた電子顕微鏡および電子線描画装置
DE10362116B4 (de) * 2003-09-17 2008-08-28 Carl Zeiss Nts Gmbh Verfahren zur Präparation einer Probe für elektronenmikroskopische Untersuchungen, sowie dabei verwendeter Greifer
US7465210B2 (en) * 2004-02-25 2008-12-16 The Regents Of The University Of California Method of fabricating carbide and nitride nano electron emitters
JP4751635B2 (ja) * 2005-04-13 2011-08-17 株式会社日立ハイテクノロジーズ 磁界重畳型電子銃
JP2007055856A (ja) * 2005-08-25 2007-03-08 Dialight Japan Co Ltd 炭素膜、電子放出源および電界放射型照明ランプ
US20080242401A1 (en) * 2005-09-09 2008-10-02 Wms Gaming Inc. Wagering Game System with Bistable Lcd Display
JP4977399B2 (ja) * 2005-11-10 2012-07-18 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP2007242253A (ja) * 2006-03-06 2007-09-20 Hitachi High-Technologies Corp 先鋭化カーボンナノチューブ及びそれを用いた電子源
CN100573783C (zh) * 2006-04-05 2009-12-23 清华大学 碳纳米管场发射电子源的制造方法
CN101051595B (zh) * 2006-04-05 2010-11-10 清华大学 碳纳米管场发射电子源
JP5102968B2 (ja) * 2006-04-14 2012-12-19 株式会社日立ハイテクノロジーズ 導電性針およびその製造方法
JP2008041289A (ja) * 2006-08-02 2008-02-21 Hitachi High-Technologies Corp 電界放出型電子銃およびそれを用いた電子線応用装置
JP2008047309A (ja) * 2006-08-11 2008-02-28 Hitachi High-Technologies Corp 電界放出型電子銃、およびその運転方法
US7847273B2 (en) * 2007-03-30 2010-12-07 Eloret Corporation Carbon nanotube electron gun
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JP2009146705A (ja) * 2007-12-13 2009-07-02 Sumitomo Electric Ind Ltd 電子放出素子、電子源、電子線装置、及び電子放出素子の製造方法
US8252115B2 (en) * 2008-04-02 2012-08-28 Raytheon Company System and method for growing nanotubes with a specified isotope composition via ion implantation using a catalytic transmembrane
CN101559939B (zh) * 2008-04-18 2011-05-04 清华大学 碳纳米管制备方法
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Also Published As

Publication number Publication date
EP2617049A1 (fr) 2013-07-24
US9048057B2 (en) 2015-06-02
US20130234025A1 (en) 2013-09-12
EP2617049B1 (fr) 2018-10-10
WO2012035277A1 (fr) 2012-03-22
FR2965102B1 (fr) 2016-12-16
JP2013541150A (ja) 2013-11-07
FR2965102A1 (fr) 2012-03-23

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