JP6006516B2 - 有機材料の精製装置 - Google Patents

有機材料の精製装置 Download PDF

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Publication number
JP6006516B2
JP6006516B2 JP2012082487A JP2012082487A JP6006516B2 JP 6006516 B2 JP6006516 B2 JP 6006516B2 JP 2012082487 A JP2012082487 A JP 2012082487A JP 2012082487 A JP2012082487 A JP 2012082487A JP 6006516 B2 JP6006516 B2 JP 6006516B2
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Japan
Prior art keywords
cylinder
organic material
organic
axial direction
refiner
Prior art date
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Expired - Fee Related
Application number
JP2012082487A
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English (en)
Japanese (ja)
Other versions
JP2013209352A (ja
Inventor
雅温 伊藤
雅温 伊藤
泰憲 門井
泰憲 門井
芳賀　亮
亮 芳賀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Idemitsu Kosan Co Ltd
Original Assignee
Idemitsu Kosan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Idemitsu Kosan Co Ltd filed Critical Idemitsu Kosan Co Ltd
Priority to JP2012082487A priority Critical patent/JP6006516B2/ja
Priority to KR1020147027856A priority patent/KR101710768B1/ko
Priority to PCT/JP2013/051713 priority patent/WO2013145833A1/ja
Priority to CN201380027451.8A priority patent/CN104349826A/zh
Priority to TW102106740A priority patent/TW201338855A/zh
Publication of JP2013209352A publication Critical patent/JP2013209352A/ja
Application granted granted Critical
Publication of JP6006516B2 publication Critical patent/JP6006516B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/311—Purifying organic semiconductor materials

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Electroluminescent Light Sources (AREA)
JP2012082487A 2012-03-30 2012-03-30 有機材料の精製装置 Expired - Fee Related JP6006516B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2012082487A JP6006516B2 (ja) 2012-03-30 2012-03-30 有機材料の精製装置
KR1020147027856A KR101710768B1 (ko) 2012-03-30 2013-01-28 유기 재료의 정제 장치
PCT/JP2013/051713 WO2013145833A1 (ja) 2012-03-30 2013-01-28 有機材料の精製装置
CN201380027451.8A CN104349826A (zh) 2012-03-30 2013-01-28 有机材料的提纯装置
TW102106740A TW201338855A (zh) 2012-03-30 2013-02-26 有機材料之精製裝置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012082487A JP6006516B2 (ja) 2012-03-30 2012-03-30 有機材料の精製装置

Publications (2)

Publication Number Publication Date
JP2013209352A JP2013209352A (ja) 2013-10-10
JP6006516B2 true JP6006516B2 (ja) 2016-10-12

Family

ID=49259119

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012082487A Expired - Fee Related JP6006516B2 (ja) 2012-03-30 2012-03-30 有機材料の精製装置

Country Status (5)

Country Link
JP (1) JP6006516B2 (zh)
KR (1) KR101710768B1 (zh)
CN (1) CN104349826A (zh)
TW (1) TW201338855A (zh)
WO (1) WO2013145833A1 (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140104230A (ko) * 2013-02-20 2014-08-28 롬엔드하스전자재료코리아유한회사 승화정제장치용 내부관
US10069070B2 (en) 2014-02-14 2018-09-04 Ilsoled Co., Ltd. Method and apparatus for purifying organic material by using ionic liquid
KR101547096B1 (ko) 2015-01-27 2015-08-24 한국생산기술연구원 이온성 액체를 이용한 유기소재 정제방법 및 정제장치
JP6096144B2 (ja) * 2014-03-26 2017-03-15 出光興産株式会社 搬送治具、装填方法、および精製方法
US10167393B2 (en) 2014-07-28 2019-01-01 Dow Global Technologies Llc Poly(vinyl acetate) dispersion, and a paint formulation comprising thereof
JPWO2018207763A1 (ja) * 2017-05-12 2020-03-12 出光興産株式会社 有機材料の精製装置
JPWO2018207764A1 (ja) * 2017-05-12 2020-03-12 出光興産株式会社 有機材料の精製装置
KR102005471B1 (ko) * 2017-09-20 2019-07-30 주식회사 엘지화학 유기 발광 소자의 재료로 사용되는 유기 물질 정제방법
WO2019116651A1 (ja) * 2017-12-14 2019-06-20 コニカミノルタ株式会社 含窒素複素環化合物の製造方法
CN108854136B (zh) * 2018-07-20 2021-02-26 合肥欧莱迪光电技术有限公司 一种开启式净化高真空可视有机小分子提纯专用设备
KR102279747B1 (ko) * 2019-02-01 2021-07-19 오영래 용액 증류 시스템
CN112090106B (zh) * 2020-09-15 2021-07-27 中国地质大学（武汉） 一种试剂提纯装置以及利用该装置提纯氟化氢铵或氟化铵的方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100781241B1 (ko) * 2000-11-23 2007-12-03 엘지전자 주식회사 유기물 정제 방법
JP2003095992A (ja) * 2001-09-25 2003-04-03 Sanyo Electric Co Ltd 昇華精製方法
JP2005511864A (ja) 2001-12-15 2005-04-28 エスケーシー カンパニー，リミテッド 有機電界発光材料の精製装置及び精製方法
JP4536435B2 (ja) * 2003-06-30 2010-09-01 パナソニック株式会社 送信方法及び送信装置
JP2005313069A (ja) * 2004-04-28 2005-11-10 Toray Ind Inc 昇華精製装置及び昇華精製方法
KR101025046B1 (ko) * 2009-04-15 2011-03-25 (주)위델소재 승화 정제 장치 및 그 장치를 이용한 승화 정제 방법
JP5585977B2 (ja) 2009-09-01 2014-09-10 キヤノントッキ株式会社 昇華精製装置
KR101129449B1 (ko) * 2011-05-23 2012-03-26 (주)씨에스엘쏠라 분리형 유기재료의 승화 정제용 내부관

Also Published As

Publication number Publication date
KR20150002644A (ko) 2015-01-07
CN104349826A (zh) 2015-02-11
TW201338855A (zh) 2013-10-01
JP2013209352A (ja) 2013-10-10
WO2013145833A1 (ja) 2013-10-03
KR101710768B1 (ko) 2017-02-27

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