JP6002261B2 - 光照射装置 - Google Patents

光照射装置 Download PDF

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Publication number
JP6002261B2
JP6002261B2 JP2015048881A JP2015048881A JP6002261B2 JP 6002261 B2 JP6002261 B2 JP 6002261B2 JP 2015048881 A JP2015048881 A JP 2015048881A JP 2015048881 A JP2015048881 A JP 2015048881A JP 6002261 B2 JP6002261 B2 JP 6002261B2
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JP
Japan
Prior art keywords
light
irradiation
lens unit
guide member
ultraviolet light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2015048881A
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English (en)
Japanese (ja)
Other versions
JP2016170233A (ja
Inventor
和孝 紫藤
和孝 紫藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Candeo Optronics Corp
Original Assignee
Hoya Candeo Optronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Candeo Optronics Corp filed Critical Hoya Candeo Optronics Corp
Priority to JP2015048881A priority Critical patent/JP6002261B2/ja
Priority to KR1020160019572A priority patent/KR101899107B1/ko
Priority to CN201610102841.2A priority patent/CN105974741B/zh
Priority to TW105106818A priority patent/TWI604280B/zh
Publication of JP2016170233A publication Critical patent/JP2016170233A/ja
Application granted granted Critical
Publication of JP6002261B2 publication Critical patent/JP6002261B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Engineering & Computer Science (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
JP2015048881A 2015-03-11 2015-03-11 光照射装置 Active JP6002261B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2015048881A JP6002261B2 (ja) 2015-03-11 2015-03-11 光照射装置
KR1020160019572A KR101899107B1 (ko) 2015-03-11 2016-02-19 광 조사 장치
CN201610102841.2A CN105974741B (zh) 2015-03-11 2016-02-25 光照射装置
TW105106818A TWI604280B (zh) 2015-03-11 2016-03-04 Light irradiation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015048881A JP6002261B2 (ja) 2015-03-11 2015-03-11 光照射装置

Publications (2)

Publication Number Publication Date
JP2016170233A JP2016170233A (ja) 2016-09-23
JP6002261B2 true JP6002261B2 (ja) 2016-10-05

Family

ID=56983594

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015048881A Active JP6002261B2 (ja) 2015-03-11 2015-03-11 光照射装置

Country Status (4)

Country Link
JP (1) JP6002261B2 (zh)
KR (1) KR101899107B1 (zh)
CN (1) CN105974741B (zh)
TW (1) TWI604280B (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017217345B4 (de) * 2017-09-28 2019-12-24 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Optischer Strahlformer
JP6549690B2 (ja) * 2017-12-28 2019-07-24 Ｈｏｙａ Ｃａｎｄｅｏ Ｏｐｔｒｏｎｉｃｓ株式会社 光照射装置
JP7007963B2 (ja) * 2018-03-16 2022-01-25 Hoya株式会社 光照射装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5949306U (ja) * 1982-09-27 1984-04-02 クラリオン株式会社 光反射枠
US5625738A (en) * 1994-06-28 1997-04-29 Corning Incorporated Apparatus for uniformly illuminating a light valve
JP3947365B2 (ja) 2001-04-17 2007-07-18 株式会社Ｓｏｋｕｄｏ エッジ露光装置
ES2378067T3 (es) * 2002-05-08 2012-04-04 Phoseon Technology, Inc. Fuente de luz de estado sólido de alta eficacia y métodos de uso y fabricación
JP4090273B2 (ja) 2002-05-23 2008-05-28 株式会社Ｓｏｋｕｄｏ エッジ露光装置
JP4302373B2 (ja) * 2002-07-25 2009-07-22 浜松ホトニクス株式会社 導光装置
CN1823301B (zh) * 2003-05-29 2011-03-16 珀金埃尔默股份有限公司 集成的内嵌式撞击和曝光的系统
US7417715B2 (en) * 2005-07-13 2008-08-26 Asml Netherlands B.V. Stage apparatus, lithographic apparatus and device manufacturing method using two patterning devices
JP2007194583A (ja) 2005-12-21 2007-08-02 Ａｒｋ Ｔｅｃｈ株式会社 周辺露光用光源装置
CN101354534B (zh) * 2007-07-27 2011-07-06 中芯国际集成电路制造(上海)有限公司 光刻胶的涂布方法及光刻图形的形成方法
CN100576089C (zh) * 2008-02-27 2009-12-30 芯硕半导体（中国）有限公司 具有超高强度led光源的无掩膜直写光刻机
JP2010014797A (ja) * 2008-07-01 2010-01-21 Nsk Ltd マスクレス露光装置
JP2010014796A (ja) * 2008-07-01 2010-01-21 Nsk Ltd マスクレス露光装置
CN101498897B (zh) * 2008-12-17 2011-11-30 上海微电子装备有限公司 边缘曝光装置及其控制方法
JP2011090055A (ja) * 2009-10-20 2011-05-06 Sony Corp 露光装置及び露光方法
JP2011150916A (ja) * 2010-01-22 2011-08-04 Toshiba Lighting & Technology Corp 照明器具
JP5731063B2 (ja) * 2011-04-08 2015-06-10 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、プログラマブル・パターニングデバイス、及びリソグラフィ方法
CN103034062B (zh) * 2011-09-29 2014-11-26 中芯国际集成电路制造(北京)有限公司 用于晶片边缘曝光的方法、光学模块和自动聚焦系统

Also Published As

Publication number Publication date
KR101899107B1 (ko) 2018-09-17
KR20160110097A (ko) 2016-09-21
JP2016170233A (ja) 2016-09-23
CN105974741A (zh) 2016-09-28
TWI604280B (zh) 2017-11-01
TW201633012A (zh) 2016-09-16
CN105974741B (zh) 2018-04-10

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