JP6000338B2 - 基板状の計測デバイス用熱遮蔽モジュール - Google Patents
基板状の計測デバイス用熱遮蔽モジュール Download PDFInfo
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- 239000000463 material Substances 0.000 claims description 23
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- 229910001220 stainless steel Inorganic materials 0.000 claims description 12
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 229910001313 Cobalt-iron alloy Inorganic materials 0.000 claims description 3
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- KGWWEXORQXHJJQ-UHFFFAOYSA-N [Fe].[Co].[Ni] Chemical compound [Fe].[Co].[Ni] KGWWEXORQXHJJQ-UHFFFAOYSA-N 0.000 claims description 3
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- 238000009413 insulation Methods 0.000 description 12
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- 239000000919 ceramic Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
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- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
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- 229910045601 alloy Inorganic materials 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/367—Cooling facilitated by shape of device
- H01L23/3675—Cooling facilitated by shape of device characterised by the shape of the housing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249923—Including interlaminar mechanical fastener
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- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Cooling Or The Like Of Electrical Apparatus (AREA)
Description
Claims (32)
- 熱遮蔽モジュールであって、
a)高熱容量材料で作製された上部と、
b)前記上部に取り付けられるとともに高熱容量材料で作製された下部であって、開口部が形成され、前記上部および前記下部の前記開口部により形成される筐体が、電子部品と前記上部および下部との間に断熱材料がない状態かつ前記筐体の内壁面に前記電子部品の一面が接触するようにして当該電子部品を受け入れる大きさに前記開口部が形成された、下部と、
c)前記上部または前記下部のいずれか一方に据え付けられる1本以上の脚部であって、前記脚部を介して、前記熱遮蔽モジュールを基板に取り付けることで、前記下部の底面と前記基板の頂面との間に間隙が形成されるように構成される、1本以上の脚部とを備える、熱遮蔽モジュール。 - 前記上部または前記下部のいずれか一方が、ステンレス鋼で作製されている、請求項1に記載の熱遮蔽モジュール。
- 前記上部の全面および前記下部の全面の両方またはいずれか一方が、低放射率表面を形成するために研磨されている、請求項1に記載の熱遮蔽モジュール。
- 前記上部の全面および前記下部の全面の両方またはいずれか一方が、低放射率材料で被覆される、請求項1に記載の熱遮蔽モジュール。
- 前記上部または前記下部の両方またはいずれか一方が、サファイアで構成されている、請求項1に記載の熱遮蔽モジュール。
- 前記上部または前記下部の両方またはいずれか一方が、ニッケル−コバルト鉄合金で構成されている、請求項1に記載の熱遮蔽モジュール。
- 前記上部または前記下部の両方またはいずれか一方が、FeNi36として一般に知られるニッケル合金鋼で構成されている、請求項1に記載の熱遮蔽モジュール。
- 前記1本以上の脚部が、ステンレス鋼で構成されている、請求項1に記載の熱遮蔽モジュール。
- 前記1本以上の脚部が、石英で構成されている、請求項1に記載の熱遮蔽モジュール。
- 前記1本以上の脚部が、前記基板の頂面と前記下部の底面との間に形成される前記間隙が、少なくとも0.25ミリメートルであるように構成される、請求項1に記載の熱遮蔽モジュール。
- 前記上部、前記下部、および前記1本以上の脚部は、前記熱遮蔽モジュールを前記基板に実装する際に、前記熱遮蔽モジュールの高さが、前記基板の頂面の上方2ミリメートルから10ミリメートルの間であるように構成される、請求項1に記載の熱遮蔽モジュール。
- 前記筐体の寸法が、前記電子部品の寸法よりも大きい、請求項1に記載の熱遮蔽モジュール。
- 前記筐体が、1ミリメートル以下の厚さを有する電子部品を受け入れる大きさに形成される、請求項1に記載の熱遮蔽モジュール。
- 電子部品モジュールであって、
高熱容量材料で作製された上部および高熱容量材料で作製された下部を含み、前記上部および前記下部により形成される筐体を有する熱遮蔽モジュールと、
前記筐体に配置された電子部品であって、前記筐体が前記電子部品と前記上部および下部との間に断熱材料がない状態かつ前記筐体の内壁面に前記電子部品の一面が接触するようにして当該電子部品を受け入れる大きさに形成される、電子部品と、
前記熱遮蔽モジュールに取り付けられる1本以上の脚部であって、前記脚部を介して、前記筐体を前記基板に取り付けることで、前記下部の底面と前記基板の頂面との間に間隙が形成されるように構成される、1本以上の脚部とを備える、電子部品モジュール。 - 前記電子部品が、1つ以上の電池を含む、請求項14に記載の電子部品モジュール。
- 前記電子部品が、中央演算処理装置(CPU)を含む、請求項14に記載の電子部品モジュール。
- 前記電子部品全体の厚さが、約1ミリメートル以下程度である、請求項14に記載の電子部品モジュール。
- 前記上部または前記下部のいずれか一方が、ステンレス鋼で作製されている、請求項14に記載の電子部品モジュール。
- 前記上部の全面および前記下部の全面の両方またはいずれか一方両方またはいずれか一方が、低放射率表面を形成するために研磨されている、請求項14に記載の電子部品モジュール。
- 前記上部の全面および前記下部の全面の両方またはいずれか一方が、低放射率材料で被覆される、請求項14に記載の電子部品モジュール。
- 前記上部または前記下部の両方またはいずれか一方が、サファイアで構成されている、請求項14に記載の電子部品モジュール。
- 前記上部または前記下部の両方またはいずれか一方が、ニッケル−コバルト鉄合金で構成されている、請求項14に記載の電子部品モジュール。
- 前記上部または前記下部の両方またはいずれか一方が、FeNi36として一般に知られるニッケル合金鋼で構成されている、請求項14に記載の電子部品モジュール。
- 前記1本以上の脚部が、ステンレス鋼で構成されている、請求項14に記載の電子部品モジュール。
- 前記1本以上の脚部が、石英で構成されている、請求項14に記載の電子部品モジュール。
- 前記1本以上の脚部が、前記基板の頂面と前記下部の底面との間に形成される前記間隙が、少なくとも0.25ミリメートルであるように構成される、請求項14に記載の電子部品モジュール。
- 前記上部、前記下部、および前記1本以上の脚部は、前記熱遮蔽モジュールを前記基板に実装する際に、前記熱遮蔽モジュールの高さが、前記基板の頂面の上方2ミリメートルから10ミリメートルの間であるように構成される、請求項14に記載の電子部品モジュール。
- 前記筐体の寸法が、前記電子部品の寸法よりも大きい、請求項14に記載の電子部品モジュール。
- 前記電子部品が、接着剤により前記筐体に固定される、請求項14に記載の電子部品モジュール。
- 基板状計測デバイスであって、
基板と、
高熱容量材料で作製された上部および高熱容量材料で作製された下部を含み、前記上部および前記下部により形成される筐体を有する熱遮蔽モジュールであって、前記筐体が、電子部品パッケージと前記上部および下部との間に断熱材料がない状態かつ前記筐体の内壁面に前記電子部品の一面が接触するようにして当該前記電子部品パッケージを受け入れる大きさに形成される、熱遮蔽モジュールと、
前記熱遮蔽モジュールに取り付けられる1本以上の脚部であって、前記脚部を介して、前記筐体を前記基板に取り付けることで、前記下部の底面と前記基板の頂面との間に間隙が形成されるように構成される、1本以上の脚部とを備える、基板状計測デバイス。 - 前記筐体の寸法が、前記電子部品パッケージの寸法よりも大きい、請求項30に記載の基板状計測デバイス。
- 前記電子部品パッケージが、接着剤により前記筐体に固定される、請求項30に記載の基板状計測デバイス。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/104,874 | 2011-05-10 | ||
US13/104,874 US8681493B2 (en) | 2011-05-10 | 2011-05-10 | Heat shield module for substrate-like metrology device |
PCT/US2012/032761 WO2012154359A1 (en) | 2011-05-10 | 2012-04-09 | Heat shield module for substrate-like metrology device |
Publications (2)
Publication Number | Publication Date |
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JP2014519193A JP2014519193A (ja) | 2014-08-07 |
JP6000338B2 true JP6000338B2 (ja) | 2016-09-28 |
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Application Number | Title | Priority Date | Filing Date |
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JP2014510315A Active JP6000338B2 (ja) | 2011-05-10 | 2012-04-09 | 基板状の計測デバイス用熱遮蔽モジュール |
Country Status (7)
Country | Link |
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US (1) | US8681493B2 (ja) |
EP (1) | EP2707895A4 (ja) |
JP (1) | JP6000338B2 (ja) |
KR (1) | KR101935070B1 (ja) |
CN (1) | CN103620735B (ja) |
TW (1) | TWI533411B (ja) |
WO (1) | WO2012154359A1 (ja) |
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US9514970B2 (en) * | 2013-01-24 | 2016-12-06 | Kla-Tencor Corporation | Methods of attaching a module on wafer substrate |
WO2018054471A1 (en) * | 2016-09-22 | 2018-03-29 | Applied Materials, Inc. | Carrier for supporting a substrate, apparatus for processing a substrate and method therefore |
KR102433436B1 (ko) * | 2018-07-04 | 2022-08-17 | 삼성전자주식회사 | 기판 처리 시스템, 기판 처리 시스템에서의 에지 링 정렬 검사 방법 및 이를 수행하기 위한 원반형 비젼 센서 |
US10916411B2 (en) | 2018-08-13 | 2021-02-09 | Tokyo Electron Limited | Sensor-to-sensor matching methods for chamber matching |
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AT368283B (de) | 1980-11-07 | 1982-09-27 | Philips Nv | Duesenplatte fuer einen tintenstrahlschreibkopf und verfahren zur herstellung einer solchen duesen- platte |
USRE32369E (en) | 1980-11-17 | 1987-03-10 | Ball Corporation | Monolithic microwave integrated circuit with integral array antenna |
JPS6073325A (ja) | 1983-09-30 | 1985-04-25 | Toshiba Corp | 半導体圧力センサ |
US4656454A (en) | 1985-04-24 | 1987-04-07 | Honeywell Inc. | Piezoresistive pressure transducer with elastomeric seals |
JPH0792340B2 (ja) * | 1989-07-21 | 1995-10-09 | 松下電工株式会社 | 炉内温度モニタ装置 |
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JP2014519193A (ja) | 2014-08-07 |
CN103620735B (zh) | 2017-06-09 |
KR20140031297A (ko) | 2014-03-12 |
KR101935070B1 (ko) | 2019-01-03 |
EP2707895A4 (en) | 2015-08-12 |
TW201246469A (en) | 2012-11-16 |
US20120287574A1 (en) | 2012-11-15 |
EP2707895A1 (en) | 2014-03-19 |
WO2012154359A1 (en) | 2012-11-15 |
CN103620735A (zh) | 2014-03-05 |
US8681493B2 (en) | 2014-03-25 |
TWI533411B (zh) | 2016-05-11 |
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