JP5986399B2 - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法 Download PDF

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Publication number
JP5986399B2
JP5986399B2 JP2012044300A JP2012044300A JP5986399B2 JP 5986399 B2 JP5986399 B2 JP 5986399B2 JP 2012044300 A JP2012044300 A JP 2012044300A JP 2012044300 A JP2012044300 A JP 2012044300A JP 5986399 B2 JP5986399 B2 JP 5986399B2
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JP
Japan
Prior art keywords
line
region
exposure
boundary line
portions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2012044300A
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English (en)
Japanese (ja)
Other versions
JP2013182942A5 (enExample
JP2013182942A (ja
Inventor
大幹 加納
大幹 加納
大 藤村
大 藤村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2012044300A priority Critical patent/JP5986399B2/ja
Priority to US13/772,440 priority patent/US9081284B2/en
Publication of JP2013182942A publication Critical patent/JP2013182942A/ja
Publication of JP2013182942A5 publication Critical patent/JP2013182942A5/ja
Application granted granted Critical
Publication of JP5986399B2 publication Critical patent/JP5986399B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2012044300A 2012-02-29 2012-02-29 半導体装置の製造方法 Expired - Fee Related JP5986399B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012044300A JP5986399B2 (ja) 2012-02-29 2012-02-29 半導体装置の製造方法
US13/772,440 US9081284B2 (en) 2012-02-29 2013-02-21 Method of manufacturing forming conductive line pattern in boundary region

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012044300A JP5986399B2 (ja) 2012-02-29 2012-02-29 半導体装置の製造方法

Publications (3)

Publication Number Publication Date
JP2013182942A JP2013182942A (ja) 2013-09-12
JP2013182942A5 JP2013182942A5 (enExample) 2015-04-16
JP5986399B2 true JP5986399B2 (ja) 2016-09-06

Family

ID=49001948

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012044300A Expired - Fee Related JP5986399B2 (ja) 2012-02-29 2012-02-29 半導体装置の製造方法

Country Status (2)

Country Link
US (1) US9081284B2 (enExample)
JP (1) JP5986399B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6497056B2 (ja) * 2014-12-12 2019-04-10 三菱電機株式会社 液晶表示装置の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5595843A (en) * 1995-03-30 1997-01-21 Intel Corporation Layout methodology, mask set, and patterning method for phase-shifting lithography
JP3375828B2 (ja) * 1996-06-19 2003-02-10 三菱電機株式会社 半導体装置の製法および該製法に用いられるフォトマスク
KR100502797B1 (ko) * 1997-12-01 2005-10-19 삼성전자주식회사 액정 표시 장치 및 그의 제조 방법
US7256873B2 (en) * 2004-01-28 2007-08-14 Asml Netherlands B.V. Enhanced lithographic resolution through double exposure
JP5106747B2 (ja) * 2004-10-27 2012-12-26 ルネサスエレクトロニクス株式会社 パターン形成方法、半導体装置の製造方法及び露光用マスクセット
KR100763227B1 (ko) * 2006-04-04 2007-10-04 삼성전자주식회사 분리 노광 방법을 이용한 포토마스크와 그 제조 방법 및 제조 장치
JP5214904B2 (ja) * 2007-04-12 2013-06-19 ルネサスエレクトロニクス株式会社 固体撮像素子の製造方法
JP2009049161A (ja) * 2007-08-20 2009-03-05 Fujitsu Microelectronics Ltd ショット分割繋ぎ位置選択方法及びショット分割露光システム
JP2009145681A (ja) 2007-12-14 2009-07-02 Hitachi Displays Ltd 表示装置の製造方法
JP2013033870A (ja) 2011-08-02 2013-02-14 Canon Inc 半導体デバイスおよびその製造方法

Also Published As

Publication number Publication date
US9081284B2 (en) 2015-07-14
US20130221515A1 (en) 2013-08-29
JP2013182942A (ja) 2013-09-12

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