JP5976532B2 - 有機電界発光素子用重合体及びそれを用いた有機電界発光素子 - Google Patents
有機電界発光素子用重合体及びそれを用いた有機電界発光素子 Download PDFInfo
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- JP5976532B2 JP5976532B2 JP2012501724A JP2012501724A JP5976532B2 JP 5976532 B2 JP5976532 B2 JP 5976532B2 JP 2012501724 A JP2012501724 A JP 2012501724A JP 2012501724 A JP2012501724 A JP 2012501724A JP 5976532 B2 JP5976532 B2 JP 5976532B2
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- 238000004544 sputter deposition Methods 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical class C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 1
- NQRYJNQNLNOLGT-UHFFFAOYSA-N tetrahydropyridine hydrochloride Natural products C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 1
- KTQYWNARBMKMCX-UHFFFAOYSA-N tetraphenylene Chemical group C1=CC=C2C3=CC=CC=C3C3=CC=CC=C3C3=CC=CC=C3C2=C1 KTQYWNARBMKMCX-UHFFFAOYSA-N 0.000 description 1
- GVIJJXMXTUZIOD-UHFFFAOYSA-N thianthrene Chemical compound C1=CC=C2SC3=CC=CC=C3SC2=C1 GVIJJXMXTUZIOD-UHFFFAOYSA-N 0.000 description 1
- IBBLKSWSCDAPIF-UHFFFAOYSA-N thiopyran Chemical compound S1C=CC=C=C1 IBBLKSWSCDAPIF-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 150000003852 triazoles Chemical group 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- PGXOVVAJURGPLL-UHFFFAOYSA-N trinaphthylene Chemical group C1=CC=C2C=C3C4=CC5=CC=CC=C5C=C4C4=CC5=CC=CC=C5C=C4C3=CC2=C1 PGXOVVAJURGPLL-UHFFFAOYSA-N 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- 125000005580 triphenylene group Chemical group 0.000 description 1
- YGPLLMPPZRUGTJ-UHFFFAOYSA-N truxene Chemical compound C1C2=CC=CC=C2C(C2=C3C4=CC=CC=C4C2)=C1C1=C3CC2=CC=CC=C21 YGPLLMPPZRUGTJ-UHFFFAOYSA-N 0.000 description 1
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Description
ここで、Rは水素原子、C1〜C20のアルキル基、C1〜C20のアルコキシ基、C6〜C30のアリール基、C6〜C30のアリールオキシ基、C7〜C36のアリールアルキル基、C7〜C36のアリールアルキルオキシ基、C3〜C30のヘテロアリール基、C3〜C30のヘテロアリールオキシ基、又はC3〜C30のシクロアルキル基であり、同一であっても異なっていてもよい。Yは単結合、C1〜C20のアルキレン基、C6〜C30のアリーレン基、C3〜C30のヘテロアリーレン基、CO、COO、又はOである。ZはN位置換のインドロカルバゾリル基であり、Wは電荷輸送性基であるが、Zと同じであることはない。m及びnは存在モル比を表わし、全繰り返し単位を100モル%としたとき、mは0〜95モル%、nは5〜100モル%である。lは平均の繰り返し数を表わし、2〜10000である。
ここで、R、Y及びZは一般式(1)と同意である。pは一般式(1)のlと同意である。
[(Uw)m-(Uz)n]l (1A)
また、これらの基は置換基を有していても良く、置換基を有する場合、前記炭素数は置換基も含めて計算するものとする。その置換基としては、性能を阻害するものでなければ特に限定するものではないが、C1〜C4のアルキル基、フェニル基、ピリジル基、カルバゾリル基であることが好ましい。
発光層における発光材料は、蛍光発光材料としては以下に示すような化合物が使用可能である。
スキーム(13)に従い化合物(A−1)から化合物(A−2)を合成し、次いで重合体(P−1)を合成する。
1H−NMR(400MHz、CDCl3):δ(ppm);8.725(1H、d、8Hz)、8.083(1H、br d、8Hz)、8.066(1H、d、8Hz)、7.861(1H、dd、10、16Hz)、7.832(1H、br d、8Hz)、7.657(2H、t、8Hz)、7.598(2H、d、8Hz)、7.542(1H、t、8Hz)、7.448(1H、t、8Hz)、7.398(2H、m)、7.315(3H、m)、5.671(1H、d、16Hz)、5.664(1H、d、10Hz)
FD−MSスペクトル:358(M+、base)
実施例1で得た重合体(P−1)の素子評価を行った。まず、溶媒洗浄、UVオゾン処理した膜厚150nmからなるITO付ガラス基板に、正孔注入層としてポリ(3,4−エチレンジオキシチオフェン)/ポリスチレンスルホン酸(PEDOT/PSS):(エイチ・シー・シュタルク株式会社製、商品名:クレビオスPCH8000)を膜厚25nmで製膜した。次に、合成した重合体(P−1)をTHFに溶解して0.4wt%溶液に調製し、スピンコート法により正孔輸送層として20nmを製膜した。次に、真空蒸着装置を用いて、発光層ドーパントとしてトリス(2−(p−トリル)ピリジン)イリジウム(III)を、発光層ホストとして4,4’−ビス(9H−カルバゾル−9−イル)ビフェニルを用い、ドーパント濃度が0.6wt%となるように共蒸着し、40nm発光層を製膜した。その後、真空蒸着装置を用いて、トリス(8−ヒドロキシキノリネート)アルミニウム(Alq3)を35nm、陰極としてLiF/Alを膜厚170nmで製膜し、この素子をグローブボックス内で封止することにより有機電界発光素子を作製した。
化合物(A−2)を重合させる際、開始剤であるAIBN量を0.12g、溶媒のベンゼン量を15mlに変更した以外は、実施例1と同様にして重合体(P−2)を得た。このポリマーのMwは20,000、分子量分布2.2であった。また、ポリマーのTgは214℃であった。素子評価は、実施例2と同様に行った。
スキーム(14)に従い化合物(A−1)から化合物(A−3)を合成し、次いで重合体(P−3)を合成する。
1H−NMR(400MHz、CDCl3):δ(ppm);8.141(1H、d、8Hz)、8.121(1H、br d、8Hz)、8.066(1H、br d、8Hz)、7.655(2H、m)、7.588(2H、d、8Hz)、7.542(1H、t、8Hz)、7.449(4H、m)、7.24−7.37(6H、m)、7.072(1H、ddd、2、7、8Hz)、6.729(1H、dd、11、18Hz)、6.136(2H、s)、5.754(1H、dd、1、18Hz)、5.250(1H、dd、1、11Hz)
FD−MSスペクトル:448(M+、base)
スキーム(15)に従い化合物(A−4)を合成し、次いで重合体(P−4)を合成する。
1H−NMR(400MHz、CDCl3):δ(ppm);8.171(1H、d、8Hz)、8.152(1H、dd、8、1Hz)、7.54−7.72(6H、m)、7.51−7.54(2H、m)、7.16−7.35(1H、7H、m)、6.807(1H、dd、17、11)、6.803(1H、dt、1、8Hz)、6.056(1H、d、8Hz)、5.811(1H、d、17Hz)、5.329(1H、d、11Hz)
FD−MSスペクトル:434(M+、base)
スキーム(16)に従い化合物(A−5)を合成し、次いで重合体(P−5)を合成する。
1H−NMR(400MHz、CDCl3)、δ(ppm);8.165(1H、d、8Hz)、8.148(1H、dt、7、1Hz)、7.702(2H、br d、8Hz)、7.58−7.67(6H、m)、7.529(1H、tt、7、2Hz)、7.28−7.36(5H、m)、7.225(1H、ddd、8、7、1Hz)、6.930(1H、dd、18、11Hz)、6.817(1H、ddd、8、7、1Hz)、6.126(
1H、br d、8Hz)、5.931(1H、dd、18、1Hz)、5.434(1H、dd、11、1Hz)
FD−MSスペクトル:434(M+、base)
スキーム(17)に従い化合物(A−7)を合成し、次いで重合体(P−6)を合成する。
1H−NMR(400MHz、CDCl3)、δ(ppm);8.171(1H、d、9Hz)、8.149(1H、dd、8、2 Hz)、7.55−7.66(8H、m)、7.469(1H、dt、8、2Hz)、7.28−7.38(5H、m)、7.222(1H、ddd、8、7、1Hz)、6.808(1H、dd、11,18Hz)、6.789(ddd、8、7、1Hz)5.940(1H、dd、8、1Hz)、5.831(1H、dd、18、1Hz)、5.355(1H、d、11Hz)
FD−MSスペクトル:434(M+、base)
スキーム(18)に従い4−(ジフェニルアミノ)ベンズアルデヒドから化合物(B−6)をを合成し、次いで重合体(EP−1)を合成する。
1H−NMR(400MHz、CDCl3):δ(ppm);7.287(2H、d、8Hz)、7.237(2H、d、8Hz)、7.249(2H、t、8Hz)、7.090(4H、d、8Hz)、7.016(4H、t、8Hz)、6.661(1H、dd、11、18Hz)5.637(1H、dd、1、18Hz)、5.155(1H、dd、1、11Hz)
FD−MSスペクトル:271(M+、base)
モノマーとして、4−(N−カルバジル)メチルスチレンを用いる以外は実施例1と同様な方法で重合、後処理を実施した。得られた4−(N−カルバジル)メチルスチレン重合体(重合体(EP−2))のMwは11,000、分子量分布2.0であった。また、ポリマーのTgは148℃であった。素子評価は、実施例2と同様に行った。
化合物(A−2)と合成例6で得た化合物(B−6)を共重合させて共重合体(CP−1)を合成した。具体的にはスキーム(19)に示すように、化合物(A−2)0.36g(1.0mmol)、化合物(B−6)0.07g(0.25mmol)をベンゼン20mlに溶解し、触媒としてAIBN4.7mgを添加し、窒素置換後70℃、16時間反応させた。反応液を希釈後、アセトニトリルを用いて再沈殿精製させた。
精製したポリマー分を回収し、これを再度アセトニトリルに投入して繰り返しリスラリーすることにより、重合体(CP−1)を0.14g得た。得られた重合体は、GPC、TGA及びDSCで同定した。Mwは、GPC(THF)のポリスチレン換算で9,000、分子量分布2.2であった。重合体(CP−1)について、化合物(A−2)及び化合物(B−6)由来の繰り返し単位の比を1H−NMRで測定したところ、(A−2)/(B-6)=72/28(mol/mol)であった。また、DSCより求めたTgは、193℃であった。
実施例8で得た重合体(CP−1)の素子評価は、まず溶媒洗浄、UVオゾン処理した膜厚150nmからなるITO付ガラス基板に、正孔注入層としてポリ(3,4−エチレンジオキシチオフェン)/ポリスチレンスルホン酸(PEDOT/PSS):(エイチ・シー・シュタルク株式会社製、商品名:クレビオスPCH8000)を膜厚40nmで製膜した。次に、合成した重合体(CP−1)をテトラヒドロフランに溶解して0.4wt%溶液に調製し、スピンコート法により正孔輸送層として20nmを製膜した。次に、真空蒸着装置を用いて、発光層ドーパントとしてトリス(2−(p−トリル)ピリジン)イリジウム(III)、発光層ホストとして、4,4’−ビス(9H−カルバゾル−9−イル)ビフェニルを用い、ドーパント濃度が0.6wt%となるように共蒸着し、発光層として40nmを製膜した。その後、真空蒸着装置を用いて、Alq3を25nm、陰極としてLiF/Alを膜厚170nmで製膜し、この素子をグローブボックス内で封止することにより有機電界発光素子を作製した。
開始剤であるAIBN量を2.0mgに変更した以外は、実施例8と同様にして共重合体(CP−2)を得た。このポリマーのMwは24,000、分子量分布2.3であり、(A−2)/(B−6)は72/28(mol/mol)であり、Tgは194℃であった。素子評価は、実施例9と同様に行った。
スキーム(20)に従い重合体(CP−3)を合成する。
スキーム(21)に従い、重合体(EP−3)を合成する。
Claims (7)
- 基板上に積層された陽極層及び陰極層の間に有機層を有する有機電界発光素子であって、該有機層の少なくとも一層に、主鎖を構成する繰り返し単位中に、下記一般式(1)で表される繰り返し単位を有する有機電界発光素子用重合体を含有することを特徴とする有機電界発光素子。
- 一般式(1)において、mは0モル%である請求項1に記載の有機電界発光素子。
- 一般式(1)において、mは5〜95モル%、nは5〜95モル%である請求項1に記載の有機電界発光素子。
- 重量平均分子量が1000〜1000000である請求項1に記載の有機電界発光素子。
- 有機電界発光素子用重合体を含有する有機層が正孔輸送層である請求項1〜6のいずれかに記載の有機電界発光素子。
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JP2010069585 | 2010-03-25 | ||
JP2010069585 | 2010-03-25 | ||
PCT/JP2011/052536 WO2011105204A1 (ja) | 2010-02-26 | 2011-02-07 | 有機電界発光素子用重合体及びそれを用いた有機電界発光素子 |
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EP (1) | EP2540749B1 (ja) |
JP (1) | JP5976532B2 (ja) |
KR (1) | KR101740227B1 (ja) |
CN (1) | CN102781979B (ja) |
TW (1) | TWI506120B (ja) |
WO (1) | WO2011105204A1 (ja) |
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US10050205B2 (en) | 2015-12-28 | 2018-08-14 | Samsung Electronics Co., Ltd. | Polymer, organic light-emitting device material including the same, and organic light-emitting device including the organic light-emitting device material |
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KR102183737B1 (ko) * | 2018-02-28 | 2020-11-27 | 주식회사 엘지화학 | 중합체, 이를 포함하는 코팅 조성물 및 이를 이용한 유기 발광 소자 |
TW201946309A (zh) | 2018-03-23 | 2019-12-01 | 日商日鐵化學材料股份有限公司 | 有機電致發光元件用聚合物及有機電致發光元件 |
WO2020262855A1 (ko) | 2019-06-28 | 2020-12-30 | 주식회사 엘지화학 | 중합체, 이를 포함하는 코팅 조성물 및 이를 이용한 유기 발광 소자 |
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US8945726B2 (en) | 2015-02-03 |
EP2540749A4 (en) | 2013-09-04 |
CN102781979A (zh) | 2012-11-14 |
US20120313513A1 (en) | 2012-12-13 |
TW201202386A (en) | 2012-01-16 |
WO2011105204A1 (ja) | 2011-09-01 |
KR20130008562A (ko) | 2013-01-22 |
TWI506120B (zh) | 2015-11-01 |
EP2540749A1 (en) | 2013-01-02 |
JPWO2011105204A1 (ja) | 2013-06-20 |
KR101740227B1 (ko) | 2017-05-26 |
EP2540749B1 (en) | 2016-01-06 |
CN102781979B (zh) | 2015-07-08 |
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